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公开(公告)号：US11314167B2
公开(公告)日：2022-04-26
申请号：US16382654
申请日：2019-04-12
发明人： Yosuke Murakami , Zenichi Hamaya
摘要： Provided is an apparatus which is advantageous in view of reduction of consumption of a replacement gas. An apparatus for forming a pattern on a substrate using a mold includes a gas supply unit, a positioning unit and a controller. The controller controls a gas supply unit and a positioning unit and, causes second contact between a second shot region different from a first shot region and the mold after first contact between a first shot region having a material supplied thereon among the plurality of shot regions and the mold and controls the positioning unit so that a second gap which is the distance at the time of changing a relative position between the mold and the substrate in a surface direction from the first shot region to the second shot region is shorter than a first gap which is the distance at the time of gas supply.
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2.发明申请公开(公告)号：US20200285146A1
公开(公告)日：2020-09-10
申请号：US16794537
申请日：2020-02-19
发明人： Yosuke Murakami
摘要： An imprint system includes a replica mold manufacturing apparatus which manufactures a replica mold of a master mold by performing a first imprint process using the master mold, an imprint apparatus which performs a second imprint process using the replica mold, and a controller which controls a first imprint condition that is an imprint condition of the first imprint process and a second imprint condition that is an imprint condition of the second imprint process. The controller corrects the first imprint condition based on an overlay state between a pattern formed on a shot region by the second imprint process and the shot region.
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公开(公告)号：US10663858B2
公开(公告)日：2020-05-26
申请号：US15423613
申请日：2017-02-03
摘要： An imprint apparatus that forms a pattern of an imprint material on a substrate-side pattern region of a substrate by using a mold. The imprint apparatus includes a light irradiation unit configured to irradiate the imprint material with light having a first wavelength for curing, and a heating unit configured to heat a partial region of the substrate, the partial region corresponding to the substrate-side pattern region, by irradiating the substrate with light that has passed through the mold and has a second wavelength different from the light having the first wavelength. The heating unit is configured to heat the partial region to deform the substrate-side pattern region by forming an uneven temperature distribution on the substrate-side pattern region by irradiation of the light having the second wavelength with an uneven illumination distribution.
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公开(公告)号：US09892949B2
公开(公告)日：2018-02-13
申请号：US15372515
申请日：2016-12-08
IPC分类号： B41L35/14 , H01L21/68 , G03F7/00 , B82Y10/00 , B82Y40/00 , B29C59/02 , B29C59/16 , B29C35/08 , H01L21/027 , H01L21/324 , H01L21/67 , H01L21/683 , H01L21/66 , H01L23/544 , B29K101/00 , B29L9/00 , B29L31/34
CPC分类号： H01L21/682 , B29C35/0805 , B29C59/026 , B29C59/16 , B29C2035/0822 , B29K2101/00 , B29L2009/00 , B29L2031/34 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0271 , H01L21/324 , H01L21/67115 , H01L21/6715 , H01L21/6838 , H01L22/20 , H01L23/544
摘要： An imprint apparatus forms a pattern of an imprint material on a substrate by using a mold. A substrate holding unit holds the substrate by a suction force between the substrate and a holding surface and includes a first suction unit for sucking a rear surface of a first region of the substrate with a first suction force and a second suction unit for sucking a rear surface of a second region of the substrate with a second suction force. A deformation mechanism deforms a shape of the first region in a direction along the holding surface when forming the pattern of the imprint material on the first region. An adjusting unit adjusts the first and second suction forces. The first suction force is less than the second in at least a portion of a period during the deforming of the shape of the first region by the deformation mechanism.
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公开(公告)号：US20170282419A1
公开(公告)日：2017-10-05
申请号：US15473477
申请日：2017-03-29
CPC分类号： B29C43/52 , B29C43/021 , B29K2905/08 , G03F7/0002
摘要： An imprint apparatus for forming a pattern of an imprint material on a process area of a substrate by using a mold including a patterned portion includes a heating unit. The heating unit heats the substrate such that a difference in shape between the process area and the patterned portion is reduced and heats the mold such that a difference in temperature between the mold and the heated substrate is reduced.
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6.发明申请IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD FOR PRODUCING ARTICLE 审中-公开IMPRINT APPARATUS，IMPRINT METHOD，AND METHOD FOR PRODUCING ARTICLE公开(公告)号：US20160363874A1
公开(公告)日：2016-12-15
申请号：US15173339
申请日：2016-06-03
CPC分类号： G03F9/7042 , G03F7/0002
摘要： An imprint apparatus includes a substrate holding unit. A generation unit generates heating distribution data indicating distribution of a heat value to be applied to a region to be processed. A heating unit gives heat to the region to be processed to deform the region. An obtaining unit which obtains first information defined based on a difference of shapes of the region and a pattern portion of the mold, and second information about a deformation amount of the region. The second information is obtained, by trying deformation of the region to be processed by the heating unit while the substrate holding unit attracts the substrate. A patterning unit forms the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated, in which the generation unit generates the heating distribution data based on the obtained first and second information.
摘要翻译： 压印装置包括基板保持单元。 一代单元产生指示要施加到待处理区域的热值分布的加热分布数据。 加热单元向要处理的区域发热以使该区域变形。 获取单元，其获得基于区域的形状和模具的图案部分的差异定义的第一信息，以及关于区域的变形量的第二信息。 通过在衬底保持单元吸引衬底的同时尝试由加热单元处理的区域的变形来获得第二信息。 图案形成单元在加热单元根据所生成的加热分布数据使加热单元变形的同时形成图案，其中生成单元基于获得的第一和第二信息生成加热分布数据。
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7.发明申请IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE 有权IMPRINT APPARATUS，AND METHOD OF MANUFACTURING ARTICLE公开(公告)号：US20150091199A1
公开(公告)日：2015-04-02
申请号：US14491014
申请日：2014-09-19
发明人： Yosuke Murakami
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B29L2031/772
摘要： The present invention provides an imprint apparatus for molding an imprint material on a target region on a substrate using a mold to form a pattern on the target region, the apparatus comprising a heater configured to deform the target region by heating the substrate, a measurement device configured to measure an overlay state between the target region and the mold, and a controller configured to control the heater such that the overlay state falls within a tolerance.
摘要翻译： 本发明提供了一种压印装置，用于使用模具在基板上的目标区域上模制压印材料，以在目标区域上形成图案，该装置包括：加热器，其被配置为通过加热基板而使目标区域变形;测量装置 被配置为测量目标区域和模具之间的覆盖状态，以及控制器，被配置为控制加热器，使得覆盖状态落在公差之内。
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公开(公告)号：US20200249569A1
公开(公告)日：2020-08-06
申请号：US16852718
申请日：2020-04-20
摘要： An imprint method for forming a pattern of an imprint material on a substrate-side pattern region of a substrate by using a mold. The method includes deforming a partial region of the substrate, the partial region corresponding to the substrate-side pattern region, by irradiating the substrate with light that has passed through the mold and has a first wavelength different from light having a second wavelength that is used for curing the imprint material, and curing the imprint material by irradiating the light having the second wavelength in a state in which the substrate-side pattern region is deformed and the mold is contacted with the imprint material. The step of deforming includes forming an uneven temperature distribution on the substrate-side pattern region by irradiation of the light having the first wavelength with an uneven illumination distribution.
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公开(公告)号：US20200073277A1
公开(公告)日：2020-03-05
申请号：US16552507
申请日：2019-08-27
发明人： Masahiro Ogura , Hisashi Namba , Ken Katsuta , Yosuke Murakami , Yasuaki Otoguro
IPC分类号： G03G15/04 , G03G15/043 , G02B26/12 , G03G21/16
摘要： An optical scanning apparatus includes a light source, a deflector, an optical member, a supporting portion, a casing, a cover member, a first air current deflecting portion configured to deflect, to a direction from the bottom toward the cover member, an air current generated by rotation of the rotatable polygonal mirror and flowing along a longitudinal direction of the optical member; and a second air current deflecting portion provided on the cover member and configured to deflect, to a direction crossing the longitudinal direction, the air current deflected by the first air current deflecting portion and flowing in the longitudinal direction.
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公开(公告)号：US10359696B2
公开(公告)日：2019-07-23
申请号：US14515927
申请日：2014-10-16
摘要： The present invention provides an imprint apparatus which performs an imprint process of forming a pattern on a substrate by using a mold, the apparatus comprising a heating unit configured to heat a region to be imprinted on the substrate, thereby deforming the region, and a processing unit configured to determine, as a region to be imprinted first, one region out of a first region and second region to be imprinted, and determine the other region as a region to be imprinted subsequently, wherein an influence on the other region in a case where the heating unit deforms the one region is smaller than an influence on the one region in a case where the heating unit deforms the other region.
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