-
公开(公告)号：US20210350047A1
公开(公告)日：2021-11-11
申请号：US17382572
申请日：2021-07-22
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tosiya Asano , Junichi Seki , Yuichiro Oguchi
IPC: G06F30/20
Abstract: A simulation method of predicting a behavior of a curable composition in a process of bringing a plurality of droplets of the curable composition arranged on a first member and a second member into contact with each other and forming a film of the curable composition on the first member is disclosed. The method includes defining a computational grid formed by a plurality of computational elements so that a plurality of droplets of the curable composition fall within one computational element, and obtaining the behavior of the curable composition in each computational element in accordance with a model corresponding to a state of the curable composition in each computational element.
-
公开(公告)号：US20200086534A1
公开(公告)日：2020-03-19
申请号：US16569765
申请日：2019-09-13
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tetsuji Okada , Tosiya Asano , Yosuke Murakami
Abstract: The present invention provides an imprint method of forming a pattern of an imprint material on a substrate by using a mold, the method including obtaining, before bringing the mold and the imprint material into contact with each other, a correction parameter for correcting deformation of a pattern of the mold caused by bringing the mold and the imprint material on the substrate into contact with each other, and reducing the deformation of the pattern of the mold by moving at least one of the mold and the substrate by a moving unit configured to relatively move the mold and the substrate in a direction parallel to a surface of the substrate in accordance with the correction parameter in a state in which the mold and the imprint material on the substrate are in contact with each other.
-
公开(公告)号：US20170242346A1
公开(公告)日：2017-08-24
申请号：US15428488
申请日：2017-02-09
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tetsuji Okada , Tosiya Asano , Naoki Maruyama
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/0002 , G03F7/709
Abstract: The present invention provides a lithography apparatus which performs a process of forming a pattern on a substrate, the apparatus comprising a processing device configured to perform the process, an actuator configured to exert an action to the processing device, a detector configured to detect vibrations of a support for supporting the processing device, and a controller configured to control the actuator, wherein the controller is configured to perform an estimation of vibration transferred from the processing device to the detector, and control the actuator based on vibration obtained by the estimation and vibration detected by the detector.
-
公开(公告)号：US20230112689A1
公开(公告)日：2023-04-13
申请号：US17963510
申请日：2022-10-11
Applicant: CANON KABUSHIKI KAISHA
Inventor： Masahiro Tamura , Tosiya Asano , Atsushi Kimura
Abstract: An imprint apparatus that performs an imprint process of forming a pattern of an imprint material on a substrate using a mold, the apparatus including a control unit configured to control a mold driving unit and a substrate driving unit, and the imprint process including curing the imprint material, and releasing the mold from the cured imprint material, wherein the control unit includes a compensator configured to feedback-control driving of at least one of the mold driving unit and the substrate driving unit such that a positional relationship between the mold and the substrate in the releasing is maintained at a positional relationship between the mold and the substrate in the curing, and makes a gain of the compensator in the releasing smaller than a gain of the compensator in a step of the imprint process other than the releasing.
-
公开(公告)号：US11314165B2
公开(公告)日：2022-04-26
申请号：US16591962
申请日：2019-10-03
Applicant: CANON KABUSHIKI KAISHA
Inventor： Setsuo Yoshida , Tosiya Asano
Abstract: The present invention provides a forming apparatus that forms a composition on a substrate using a mold including a contact region to be brought into contact with the composition, comprising: a deformation unit configured to deform the contact region; and a controller configured to perform, for each of a first shot region and a second shot region on the substrate, a process of bringing the contact region and the composition on the substrate into contact with each other while controlling the deformation of the contact region, wherein an area where the mold faces the substrate during the process is different between the first and second shot regions, and wherein the controller is configured to change, between the first and second shot regions, a process condition for bringing the contact region and the composition into contact with each other.
-
Patent Agency Ranking
公开(公告)号：US20180319075A1
公开(公告)日：2018-11-08
申请号：US15970269
申请日：2018-05-03
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tosiya Asano
CPC classification number: B29C59/02 , B29C59/002
Abstract: An imprint apparatus performs an imprint process of forming a pattern on a substrate by bringing a mold into contact with an imprint material on the substrate and curing the imprint material. The apparatus includes a detector configured to detect an arrangement relationship between the substrate and the mold, and an adjuster configured to adjust the arrangement relationship based on an output from the detector. The adjuster adjusts the arrangement relationship in a state in which a vibration is applied to an imprint material between the substrate and the mold, and then further adjusts the arrangement relationship in a state in which the vibration is not applied to the imprint material between the substrate and the mold.
-
公开(公告)号：US20170246657A1
公开(公告)日：2017-08-31
申请号：US15436411
申请日：2017-02-17
Applicant: CANON KABUSHIKI KAISHA
Inventor： Wataru Tamura , Noriyasu Hasegawa , Tosiya Asano , Setsuo Yoshida
IPC: B05D3/12 , H01L21/027 , H01L21/67 , B05C11/02
CPC classification number: B05D3/12 , B05C11/02 , G03F7/0002 , G03F9/7042 , H01L21/0274 , H01L21/6715
Abstract: An imprinting apparatus can form a pattern of an imprint material supplied to a substrate with a mold. The imprinting apparatus includes a substrate holding unit configured to hold the substrate, a mold holding unit configured to hold the mold, and a control unit configured to control the mold holding unit that changes an inclination of the mold while the mold is kept in contact with the imprint material based on a position in a surface direction of the substrate where the mold contacts the imprint material, in such a way as to reduce a relative inclination between the mold and the substrate that may occur if the substrate holding unit inclines when the mold is brought into contact with the imprint material.
-
公开(公告)号：US20160238954A1
公开(公告)日：2016-08-18
申请号：US15019038
申请日：2016-02-09
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tosiya Asano , Takahiro Yoshida
CPC classification number: G03F9/7034 , B29C43/04 , B29C43/58 , B29C2043/5808 , B29C2043/5833 , G03F7/0002
Abstract: The present invention provides an imprint apparatus which forms a pattern in an imprint material on a shot region of a substrate by using a mold, the apparatus comprising a stage that can move while holding the substrate, and a control unit configured to control relative positions of the mold and the shot region so as to reduce a shift in the relative positions caused by tilting the stage when bringing the mold and the imprint material into contact with each other, based on a contacting force of bringing the mold and the imprint material into contact with each other, and a distance from a reference position of the substrate to the shot region.
Abstract translation: 本发明提供了一种压印装置，其通过使用模具在基板的射出区域上形成压印材料中的图案，该装置包括可以在保持基板的同时移动的台阶，以及控制单元，其被配置为控制相对位置 模具和喷射区域，以便基于使模具和压印材料接触的接触力，减少当使模具和压印材料彼此接触时使平台倾斜引起的相对位置的偏移 并且与基板的基准位置到拍摄区域的距离。
-
公开(公告)号：US12079551B2
公开(公告)日：2024-09-03
申请号：US16893994
申请日：2020-06-05
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tosiya Asano , Junichi Seki , Yuichiro Oguchi
IPC: G06F30/23 , G06F113/08 , G03F7/00
CPC classification number: G06F30/23 , G03F7/0002 , G06F2113/08
Abstract: The present invention provides a simulation method of predicting a behavior of a curable composition in a process of bringing a plurality of droplets of the curable composition arranged on a first member into contact with a second member and forming a film of the curable composition in a space between the first member and the second member, wherein for each of the plurality of droplets of the curable composition, a distance from a representative point of the droplet to a point on a contour of the droplet is obtained so as to match the area of the inner region of the contour to an area of the droplet obtained from a volume of the droplet and a distance between the first member and the second member in accordance with a change of the distance between the first member and the second member.
-
公开(公告)号：US09977346B2
公开(公告)日：2018-05-22
申请号：US15428488
申请日：2017-02-09
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tetsuji Okada , Tosiya Asano , Naoki Maruyama
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/0002 , G03F7/709
Abstract: The present invention provides a lithography apparatus which performs a process of forming a pattern on a substrate, the apparatus comprising a processing device configured to perform the process, an actuator configured to exert an action to the processing device, a detector configured to detect vibrations of a support for supporting the processing device, and a controller configured to control the actuator, wherein the controller is configured to perform an estimation of vibration transferred from the processing device to the detector, and control the actuator based on vibration obtained by the estimation and vibration detected by the detector.
-
-
-
-
-
-
-
-
-
Search Results
24
records
(took 0.027 seconds)
