公开(公告)号：US20180308683A1

公开(公告)日：2018-10-25

申请号：US15753032

申请日：2016-08-10

申请人： CENTRAL GLASS COMPANY, LIMITED

发明人： Takashi SAIO ,  Yuzo OKUMURA ,  Yuki FUKUI ,  Hiroki FUKAZAWA ,  Tomohiro TAKATA ,  Soichi KUMON ,  Kazuyuki ABE ,  Shota WATANABE ,  Masayoshi IMACHI

IPC分类号： H01L21/02 ,  H01L21/67 ,  C11D3/16

CPC分类号： H01L21/02057 ,  B08B3/00 ,  C11D3/162 ,  H01L21/304 ,  H01L21/6704

摘要： To provide a water-repellent protective film-forming liquid chemical used in a process of cleaning a wafer by means of a cleaning machine whose liquid contact member contains a vinyl chloride resin. A liquid chemical is used, which includes an alkoxysilane represented by the following general formula [1]; at least one kind selected from the group consisting of a sulfonic acid represented by the following general formula [2], an anhydride of the sulfonic acid, a salt of the sulfonic acid and a sulfonic acid derivative represented by the following general formula [3]; and a diluent solvent containing at least one kind selected from the group consisting of a hydrocarbon, an ether and a thiol. (R1)aSi(H)b(OR2)4-a-b  [1] R3—S(═O)2OH  [2] R3—S(═O)2O—Si(H)3-c(R4)c  [3]