公开(公告)号：US20190196336A1

公开(公告)日：2019-06-27

申请号：US16227101

申请日：2018-12-20

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

Inventor： Raluca TIRON ,  Guillaume CLAVEAU ,  Ahmed GHARBI ,  Laurent PAIN ,  Xavier CHEVALIER ,  Christophe NAVARRO ,  Anne PAQUET

IPC: G03F7/40 ,  G03F7/00 ,  H01L21/027 ,  H01L21/02 ,  G03F7/20

CPC classification number: G03F7/405 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0002 ,  G03F7/70008 ,  H01L21/02118 ,  H01L21/0271 ,  H01L21/0273

Abstract: A method for forming a chemical guiding structure intended for self-assembly of a block copolymer by chemoepitaxy, where the method includes forming on a substrate a functionalisation layer made of a first polymer material having a first chemical affinity with respect to the block copolymer; forming on the substrate guiding patterns made of a second polymer material having a second chemical affinity with respect to the block copolymer, different from the first chemical affinity, and wherein the guiding to patterns have a critical dimension of less than 12.5 nm and are formed by means of a mask comprising spacers.