公开(公告)号：US20150056895A1

公开(公告)日：2015-02-26

申请号：US13973639

申请日：2013-08-22

Applicant: Cabot Microelectronics Corporation

Inventor： George Fotou ,  Achla Khanna ,  Robert Vacassy

IPC: B24B37/24 ,  B24D11/00

CPC classification number: B24B37/24 ,  B24D11/001

Abstract: The invention provides a polishing pad for chemical-mechanical polishing comprising a porous polymeric material, wherein the polishing pad comprises closed pores and wherein the polishing pad has a void volume fraction of 70% or more. Also disclosed is a method for preparing the aforesaid polishing pad and a method of polishing a substrate by use of theaforesaid polishing pad.

Abstract translation: 本发明提供了一种用于化学机械抛光的抛光垫，其包括多孔聚合物材料，其中该抛光垫包括封闭孔，并且其中抛光垫具有70％或更多的空隙体积分数。 还公开了制备上述抛光垫的方法和使用上述抛光垫对基材进行抛光的方法。

公开(公告)号：US09463551B2

公开(公告)日：2016-10-11

申请号：US14459452

申请日：2014-08-14

Applicant: Cabot Microelectronics Corporation

Inventor： Robert Vacassy ,  George Fotou

IPC: B24B37/24 ,  B24B37/22 ,  B24B37/04 ,  C08J9/00 ,  H01L21/306 ,  C08J9/12

CPC classification number: B24B37/24 ,  B24B37/042 ,  B24B37/22 ,  C08J9/122 ,  C08J2201/032 ,  C08J2203/06 ,  C08J2205/044 ,  C08J2205/052 ,  C08J2207/00 ,  C08J2300/22 ,  C08J2300/26 ,  C08J2375/04

Abstract: Disclosed is a polishing pad for chemical-mechanical polishing. The polishing pad has a porous interface and a substantially non-porous bulk core. Also disclosed are related apparatus and methods for using and preparing the polishing pad.

Abstract translation: 公开了一种用于化学机械抛光的抛光垫。 抛光垫具有多孔界面和基本上无孔的块体。 还公开了用于使用和制备抛光垫的相关装置和方法。