CENTRIFUGAL CLEANING APPARATUS WITH PLATFORM-REVERSIBLE ROTOR FOR ADDITIVELY MANUFACTURED OBJECTS

    公开(公告)号:US20230339184A1

    公开(公告)日:2023-10-26

    申请号:US18303788

    申请日:2023-04-20

    Applicant: Carbon, Inc.

    CPC classification number: B29C64/35 B33Y40/20 B33Y10/00

    Abstract: A centrifugal separator for separating residual resin from additively manufactured objects, the objects carried on a build surface of a build platform on which the objects were additively manufactured. The separator includes: an outer vessel; a rotor in the vessel, the rotor defining a center axis of rotation; a drive assembly operatively associated with the rotor; and a plurality of build platform mount assemblies operatively associated with the rotor, each mount assembly configured to receive one of the build platforms in (i) a first orientation in which the build surfaces face toward the axis of rotation, and (ii) a second orientation in which the build surfaces face away from the axis of rotation.

    SYSTEMS AND METHODS FOR SURFACE TEXTURING OBJECTS DURING ADDITIVE MANUFACTURING

    公开(公告)号:US20220305731A1

    公开(公告)日:2022-09-29

    申请号:US17655865

    申请日:2022-03-22

    Applicant: Carbon, Inc.

    Abstract: Surface texturing of objects during additive manufacturing, including systems and methods thereof. For example, a method of surface texturing a three-dimensional (3D) object during additive manufacturing of the object: (a) irradiating a resin segment with patterned light at a build plane to polymerize said resin and grow said 3D object, then (b) advancing said object away from said build plane to bring a new segment of said resin in contact with said growing 3D object and establish a new build plane, and then repeating steps (a) through (b) until said 3D object is formed. For resin segments that correspond to portions of said 3D object to which surface texture is applied, said irradiating step is carried out by sequentially irradiating each resin segment with: (i) a first sub-exposure pattern and (ii) a second sub-exposure pattern, one of which is modified to include a texture pattern on a surface thereof.

Patent Agency Ranking