公开(公告)号：US20140262751A1

公开(公告)日：2014-09-18

申请号：US13803371

申请日：2013-03-14

申请人： Cardinal CG Company

发明人： Keith J. Burrows ,  Christopher L. Gruber ,  Klaus H.W. Hartig

IPC分类号： H01J37/32

CPC分类号： H01J37/32449 ,  C23C14/0042 ,  C23C14/54 ,  C23C14/542 ,  C23C14/544 ,  H01J37/3244 ,  H01J37/32972 ,  H01J37/34

摘要： A gas manifold for delivery gas to a sputtering chamber is provided with ports to accommodate plasma emission monitors to monitor plasma information in the sputtering chamber to provide feedback control. The collimators of the plasma emission monitors is exposed to gas flow and thus coating of the monitor is greatly reduced.

摘要翻译： 用于将气体输送到溅射室的气体歧管设置有端口以容纳等离子体发射监测器以监测溅射室中的等离子体信息以提供反馈控制。 等离子体发射监测器的准直器暴露于气流，因此显着性的涂层大大降低。

公开(公告)号：US09633823B2

公开(公告)日：2017-04-25

申请号：US13803371

申请日：2013-03-14

申请人： Cardinal CG Company

发明人： Keith J. Burrows ,  Christopher L. Gruber ,  Klaus H. W. Hartig

IPC分类号： C23C14/35 ,  H01J37/32 ,  C23C14/54 ,  C23C14/00 ,  H01J37/34

CPC分类号： H01J37/32449 ,  C23C14/0042 ,  C23C14/54 ,  C23C14/542 ,  C23C14/544 ,  H01J37/3244 ,  H01J37/32972 ,  H01J37/34

摘要： A gas manifold for delivery gas to a sputtering chamber is provided with ports to accommodate plasma emission monitors to monitor plasma information in the sputtering chamber to provide feedback control. The collimators of the plasma emission monitors is exposed to gas flow and thus coating of the monitor is greatly reduced.