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公开(公告)号：US11720028B2
公开(公告)日：2023-08-08
申请号：US17511234
申请日：2021-10-26
申请人： Carl Zeiss SMT GmbH
CPC分类号： G03F7/7015 , G03F7/70133
摘要： A measurement illumination optical unit guides illumination light into an object field of a projection exposure apparatus for EUV lithography. The illumination optical unit has a field facet mirror with a plurality of field facets and a pupil facet mirror with a plurality of pupil facets. The latter serve for overlaid imaging in the object field of field facet images of the field facets. A field facet imaging channel of the illumination light is guided via any one field facet and any one pupil facet. A field stop specifies a field boundary of an illumination field in the object plane. The illumination field has a greater extent along one field dimension than any one of the field facet images. At least some of the field facets include tilt actuators which help guide the illumination light into the illumination field via various field facets and one and the same pupil facet.
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2.发明授权公开(公告)号：US11448968B2
公开(公告)日：2022-09-20
申请号：US17019931
申请日：2020-09-14
申请人： Carl Zeiss SMT GmbH
发明人： Hubert Holderer , Klaus Abele , Björn Liebaug
IPC分类号： G03F7/20
摘要： A beam-forming and illuminating system for a lithography system, such an EUV lithography system, includes an optical element and an adjusting device. The adjusting device is configured so that, during a heat-up phase of the beam-forming and illuminating system, the adjusting device measures a field position and/or a pupil position of the beam-forming and illuminating system and adjusts the orientation and/or position of the optical element based on the measured field position and/or pupil position to keep the optical element in a desired position.
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公开(公告)号：US08902401B2
公开(公告)日：2014-12-02
申请号：US13712576
申请日：2012-12-12
申请人： Carl Zeiss SMT GmbH
发明人： Bernhard Gellrich , Jens Kugler , Thomas Ittner , Stefan Hembacher , Karl-Heinz Schimitzek , Payam Tayebati , Hubert Holderer
CPC分类号： G03F7/70341 , G03F7/70891
摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.
摘要翻译： 特别是用于微光刻的光学成像装置包括用于接收具有投影图案的掩模的掩模装置，具有光学元件组的投影装置，用于接收基板的基板装置和浸没区。 光学元件组适于将投影图案投影到基板上并且包括具有浸没元件的多个光学元件，基板在工作期间至少临时定位到该浸没元件。 在操作期间，浸没区域位于浸没元件和基底之间，并且至少暂时填充浸渍介质。 提供一种热衰减装置，该热衰减装置适于减少浸入式介质引起的浸没元件的温度分布内的波动。
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公开(公告)号：US11048172B2
公开(公告)日：2021-06-29
申请号：US16704677
申请日：2019-12-05
申请人： Carl Zeiss SMT GmbH
发明人： Juergen Baier , Daniel Runde , Matthias Manger , Ulrich Mueller , Joerg Lichtenthaeler , André Orthen , Joachim Welker , Markus Holz , Hubert Holderer
摘要： The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.
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公开(公告)号：US09810996B2
公开(公告)日：2017-11-07
申请号：US14531109
申请日：2014-11-03
申请人： Carl Zeiss SMT GmbH
发明人： Bernhard Gellrich , Jens Kugler , Thomas Ittner , Stefan Hembacher , Karl-Heinz Schimitzek , Payam Tayebati , Hubert Holderer
CPC分类号： G03F7/70341 , G03F7/70891
摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.
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公开(公告)号：US20220057717A1
公开(公告)日：2022-02-24
申请号：US17511234
申请日：2021-10-26
申请人： Carl Zeiss SMT GmbH
IPC分类号： G03F7/20
摘要： A measurement illumination optical unit guides illumination light into an object field of a projection exposure apparatus for EUV lithography. The illumination optical unit has a field facet mirror with a plurality of field facets and a pupil facet mirror with a plurality of pupil facets. The latter serve for overlaid imaging in the object field of field facet images of the field facets. A field facet imaging channel of the illumination light is guided via any one field facet and any one pupil facet. A field stop specifies a field boundary of an illumination field in the object plane. The illumination field has a greater extent along one field dimension than any one of the field facet images. At least some of the field facets include tilt actuators which help guide the illumination light into the illumination field via various field facets and one and the same pupil facet.
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公开(公告)号：US20200348602A1
公开(公告)日：2020-11-05
申请号：US16933595
申请日：2020-07-20
申请人： Carl Zeiss SMT GmbH
发明人： Johannes Ruoff , Hubert Holderer
IPC分类号： G03F7/20
摘要： An imaging optical unit for EUV microlithography is configured so that, when used in an optical system for EUV microlithography, relatively high EUV throughput and high imaging quality can achieved.
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公开(公告)号：US20180181007A1
公开(公告)日：2018-06-28
申请号：US15800606
申请日：2017-11-01
申请人： Carl Zeiss SMT GmbH
发明人： Bernhard Gellrich , Jens Kugler , Thomas Ittner , Stefan Hembacher , Karl-Heinz Schimitzek , Payam Tayebati , Hubert Holderer
IPC分类号： G03F7/20
摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.
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公开(公告)号：US20150109591A1
公开(公告)日：2015-04-23
申请号：US14531109
申请日：2014-11-03
申请人： Carl Zeiss SMT GmbH
发明人： Bernhard Gellrich , Jens Kugler , Thomas Ittner , Stefan Hembacher , Karl-Heinz Schimitzek , Payam Tayebati , Hubert Holderer
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70891
摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.
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公开(公告)号：US11422470B2
公开(公告)日：2022-08-23
申请号：US16933595
申请日：2020-07-20
申请人： Carl Zeiss SMT GmbH
发明人： Johannes Ruoff , Hubert Holderer
IPC分类号： G03F7/20
摘要： An imaging optical unit for EUV microlithography is configured so that, when used in an optical system for EUV microlithography, relatively high EUV throughput and high imaging quality can achieved.
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