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    SYSTEM AND PROJECTION EXPOSURE APPARATUS
    1.
    发明公开
    SYSTEM AND PROJECTION EXPOSURE APPARATUS 审中-公开

    公开(公告)号：US20230408934A1

    公开(公告)日：2023-12-21

    申请号：US18365479

    申请日：2023-08-04

    申请人： Carl Zeiss SMT GmbH

    发明人： Marwene Nefzi ,  Jens Kugler

    IPC分类号： G03F7/00 ,  F16F15/04 ,  F16F15/03

    CPC分类号： G03F7/709 ,  F16F15/046 ,  F16F2222/06 ,  F16F2228/063 ,  F16F2228/08 ,  F16F15/03

    摘要： A system for a projection exposure apparatus which comprises a first component, a second component, and a decoupling device configured to decouple the second component in more than one degree of freedom from mechanical excitations of the first component. The decoupling device comprises first decoupling elements which have a positive stiffness. The decoupling device also comprises second decoupling elements, which have a negative stiffness. The decoupling device further comprises a third component, which is arranged between the first and second components.

    OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
    3.
    发明申请
    OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 审中-公开
    光学元件曝光过程

    公开(公告)号：US20150168846A1

    公开(公告)日：2015-06-18

    申请号：US14560756

    申请日：2014-12-04

    申请人： Carl Zeiss SMT GmbH

    发明人： Tilman Schwertner ,  Ulrich Bingel ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Jens Kugler ,  Dirk Schaffer ,  Bernhard Gellrich

    IPC分类号： G03F7/20 ,  G02B27/00

    CPC分类号： G03F7/7015 ,  G02B27/0006 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70883 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  Y10T29/49

    摘要： An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.

    摘要翻译： 公开了一种包括第一光学元件模块和密封装置的光学元件单元。 第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。 第一部件类型是光学元件，第二部件类型与第一部件类型不同。 密封装置将第一模块空间分隔成第一空间和第二空间，并至少在第一方向上基本上防止物质从第一空间和第二空间中的一个进入第一空间和 第二个空间。 第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。 第二模块组件至少部分地接触第二空间。

    EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS
    5.
    发明申请
    EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS 有权
    投影镜头的曝光装置和测量装置

    公开(公告)号：US20130120723A1

    公开(公告)日：2013-05-16

    申请号：US13682474

    申请日：2012-11-20

    申请人： Carl Zeiss SMT GmbH

    发明人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/70591 ,  G03F7/70691 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

    摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

    摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。

    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
    6.
    发明申请
    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION 有权

    公开(公告)号：US20130114057A1

    公开(公告)日：2013-05-09

    申请号：US13712576

    申请日：2012-12-12

    申请人： CARL ZEISS SMT GMBH

    发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/70891

    摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

    SUPPORTING AN OPTICAL ELEMENT
    8.
    发明申请
    SUPPORTING AN OPTICAL ELEMENT 有权

    公开(公告)号：US20210181644A1

    公开(公告)日：2021-06-17

    申请号：US17181548

    申请日：2021-02-22

    申请人： Carl Zeiss SMT GmbH

    发明人： Jens Kugler ,  Bernhard Geuppert ,  Alexander Kharitonov

    IPC分类号： G03F7/20 ,  G01B11/00 ,  G02B7/02

    摘要： An optical arrangement for use in an optical imaging device includes an optical element unit and a detection device and/or an actuating device. The optical element unit includes at least one optical element. The detection device determines in a plurality of M degrees of freedom in each case a detection value which is representative of a relative position or orientation of an element reference of the optical element in relation to a primary reference of the detection device in the respective degree of freedom. The detection device includes a plurality of N detection units, each of which outputs a detection signal which is representative of a distance and/or a displacement of the detection unit in relation to a secondary reference assigned to the optical element and the respective detection unit.