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    OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
    3.
    发明申请
    OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 审中-公开
    光学元件曝光过程

    公开(公告)号：US20150168846A1

    公开(公告)日：2015-06-18

    申请号：US14560756

    申请日：2014-12-04

    申请人： Carl Zeiss SMT GmbH

    发明人： Tilman Schwertner ,  Ulrich Bingel ,  Guido Limbach ,  Julian Kaller ,  Hans-Juergen Scherle ,  Jens Kugler ,  Dirk Schaffer ,  Bernhard Gellrich

    IPC分类号： G03F7/20 ,  G02B27/00

    CPC分类号： G03F7/7015 ,  G02B27/0006 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70883 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  Y10T29/49

    摘要： An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.

    摘要翻译： 公开了一种包括第一光学元件模块和密封装置的光学元件单元。 第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。 第一部件类型是光学元件，第二部件类型与第一部件类型不同。 密封装置将第一模块空间分隔成第一空间和第二空间，并至少在第一方向上基本上防止物质从第一空间和第二空间中的一个进入第一空间和 第二个空间。 第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。 第二模块组件至少部分地接触第二空间。

    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
    4.
    发明申请
    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION 有权

    公开(公告)号：US20130114057A1

    公开(公告)日：2013-05-09

    申请号：US13712576

    申请日：2012-12-12

    申请人： CARL ZEISS SMT GMBH

    发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/70891

    摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
    5.
    发明申请
    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION 审中-公开

    公开(公告)号：US20180181007A1

    公开(公告)日：2018-06-28

    申请号：US15800606

    申请日：2017-11-01

    申请人： Carl Zeiss SMT GmbH

    发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    IPC分类号： G03F7/20

    摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

    Optical projection system
    7.
    发明授权
    Optical projection system 有权
    光学投影系统

    公开(公告)号：US09557653B2

    公开(公告)日：2017-01-31

    申请号：US14792837

    申请日：2015-07-07

    申请人： Carl Zeiss SMT GmbH

    发明人： Johannes Rau ,  Armin Schoeppach ,  Bernhard Gellrich ,  Jens Kugler ,  Martin Mahlmann ,  Bernhard Geuppert ,  Thomas Petasch ,  Gerhard Fuerter

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20 ,  G02B7/02 ,  G02B7/22 ,  G02B7/00 ,  G02B17/08

    CPC分类号： G03F7/7015 ,  G02B7/00 ,  G02B7/008 ,  G02B7/021 ,  G02B7/028 ,  G02B7/22 ,  G02B17/08 ,  G02B17/0804 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70883

    摘要： An optical projection unit includes first and second optical element modules. The first optical element module includes a first housing unit and a first optical element received within the first housing unit and having an optically used first region defining a first optical axis. The second optical element module is located adjacent to the first optical element module and includes a second optical element which defines a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is laterally offset and/or inclined with respect to the first housing axis. The first housing axis is substantially collinear with the second optical axis.

    摘要翻译： 光学投影单元包括第一和第二光学元件模块。 第一光学元件模块包括第一壳体单元和容纳在第一壳体单元内的第一光学元件，并且具有限定第一光轴的光学使用的第一区域。 第二光学元件模块位于第一光学元件模块附近并且包括限定光学投影单元的第二光轴的第二光学元件。 第一壳体单元具有中心的第一壳体轴线和围绕第一壳体轴线在圆周方向上延伸的外壁。 第一光轴相对于第一壳体轴线横向偏移和/或倾斜。 第一壳体轴线与第二光轴基本共线。

    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
    8.
    发明申请
    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION 有权

    公开(公告)号：US20150109591A1

    公开(公告)日：2015-04-23

    申请号：US14531109

    申请日：2014-11-03

    申请人： Carl Zeiss SMT GmbH

    发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70341 ,  G03F7/70891

    摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

    SUPPORT OF AN OPTICAL UNIT
    10.
    发明申请
    SUPPORT OF AN OPTICAL UNIT 有权

    公开(公告)号：US20220283509A1

    公开(公告)日：2022-09-08

    申请号：US17664278

    申请日：2022-05-20

    申请人： Carl Zeiss SMT GmbH

    发明人： Boaz Pnini ,  Jens Kugler ,  Bernhard Gellrich

    IPC分类号： G03F7/20

    摘要： An arrangement for use in a microlithographic optical imaging device includes an optical unit and a supporting structure for supporting the optical unit. The optical unit includes an optical element, a carrier structure for carrying the optical element, and an active actuating device. The optical element is supported on the carrier structure via of the active actuating device. The active actuating device is configured to adjust the optical element during normal operation of the optical imaging device in a maximum movement range, which is predefined by the normal operation of the optical imaging device, with respect to a first reference assigned to the imaging device. The active actuating device is configured so that the maximum movement range is completely covered by actuating movements of the active actuating device with an actuating accuracy predefined by the normal operation of the optical imaging device.