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公开(公告)号：US11326872B2
公开(公告)日：2022-05-10
申请号：US17151017
申请日：2021-01-15
申请人： Carl Zeiss SMT GmbH
IPC分类号： G01B11/24 , G01B9/02001 , G01M11/00 , G03F7/20 , G01B9/02
摘要： A method and a device for characterizing the surface shape of an optical element. In the method, in at least one interferogram measurement carried out by an interferometric test arrangement, a test wave reflected at the optical element is caused to be superimposed with a reference wave not reflected at the optical element. In this case, the figure of the optical element is determined on the basis of at least two interferogram measurements using electromagnetic radiation having in each case linear input polarization or in each case circular input polarization, wherein the input polarizations for the two interferogram measurements differ from one another.
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公开(公告)号：US20180095258A1
公开(公告)日：2018-04-05
申请号：US15654766
申请日：2017-07-20
申请人： Carl Zeiss SMT GmbH
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： A method of providing a catadioptric projection includes: providing a first partial objective for imaging an object field onto a first real intermediate image; providing a second partial objective for imaging the first real intermediate image onto a second real intermediate image, in which the second partial objective includes a concave mirror; providing a third partial objective for imaging the second intermediate image onto an image field, the third partial objective including an aperture stop; providing a first folding mirror and a second folding mirror; and providing an antireflection coating onto a surface of at least one lens that is directly adjacent to the concave mirror or that is separate from the concave mirror by a single lens, in which the antireflection coating is designed to have reflectivity of less than 0.2% for a wavelength between 150 nm and 250 nm and for an angle-of-incidence range between 0° and 30°.
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公开(公告)号：US09726870B2
公开(公告)日：2017-08-08
申请号：US15002492
申请日：2016-01-21
申请人： Carl Zeiss SMT GmbH
CPC分类号： G02B17/0892 , G02B1/11 , G02B17/08 , G02B17/0896 , G03F7/70 , G03F7/70225 , G03F7/70275
摘要： A projection objective for microlithography for imaging an object field onto an image field includes: a first partial objective for imaging the object field onto a first real intermediate image; a second partial objective for imaging the first intermediate image onto a second real intermediate image; a third partial objective for imaging the second intermediate image onto the image field, the third partial objective including an aperture; and a first folding mirror for deflecting radiation toward a concave mirror and a second folding mirror for deflecting the radiation from the concave mirror toward the image plane; in which the projection objective is an immersion projection objective in which during operation an immersion liquid is situated between a last lens surface and an image plane, and at least one surface of at least one lens in the second partial objective has an antireflection coating including at least six layers.
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4.发明授权Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit 有权包括这种成像光学单元的用于投影光刻的成像光学单元和投影曝光设备公开(公告)号：US09291751B2
公开(公告)日：2016-03-22
申请号：US13919500
申请日：2013-06-17
申请人： Carl Zeiss SMT GmbH
CPC分类号： G02B5/0891 , G02B17/0663 , G03F7/70091 , G03F7/70233
摘要： An imaging optical unit (7) serves for imaging an object field (4) in an object plane (5) into an image field (8) in an image plane (9). The imaging optical unit (7) has a plurality of components (M1 to M6, GI) which guide imaging light (3). The imaging optical unit (7) is embodied as a pupil-obscured system. The imaging optical unit (7) has at least one mirror (GI) for grazing incidence of the imaging light (3). The result is an imaging optical unit having a handleable combination of low imaging aberrations and compact construction.
摘要翻译： 成像光学单元（7）用于将物平面（5）中的物场（4）成像为图像平面（9）中的图像场（8）。 成像光学单元（7）具有引导成像光（3）的多个成分（M1〜M6，GI）。 成像光学单元（7）被实现为瞳孔遮蔽系统。 成像光学单元（7）具有至少一个用于掠入射成像光（3）的反射镜（GI）。 其结果是具有低成像像差和紧凑结构的可处理组合的成像光学单元。
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公开(公告)号：US10545323B2
公开(公告)日：2020-01-28
申请号：US16222512
申请日：2018-12-17
申请人： Carl Zeiss SMT GmbH
摘要： A projection optical unit for EUV projection lithography has a plurality of mirrors for imaging an object field into an image field with illumination light. At least one of the mirrors is an NI mirror and at least one of the mirrors is a GI mirror. A mirror dimension Dx of the at least one NI mirror in a plane of extent (xz) perpendicular to a plane of incidence (yz) satisfies the following relationship: 4 LLWx/IWPVmax
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公开(公告)号：US10042146B2
公开(公告)日：2018-08-07
申请号：US15654766
申请日：2017-07-20
申请人： Carl Zeiss SMT GmbH
摘要： A method of providing a catadioptric projection includes: providing a first partial objective for imaging an object field onto a first real intermediate image; providing a second partial objective for imaging the first real intermediate image onto a second real intermediate image, in which the second partial objective includes a concave mirror; providing a third partial objective for imaging the second intermediate image onto an image field, the third partial objective including an aperture stop; providing a first folding mirror and a second folding mirror; and providing an antireflection coating onto a surface of at least one lens that is directly adjacent to the concave mirror or that is separate from the concave mirror by a single lens, in which the antireflection coating is designed to have reflectivity of less than 0.2% for a wavelength between 150 nm and 250 nm and for an angle-of-incidence range between 0° and 30°.
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7.发明申请公开(公告)号：US20180095259A1
公开(公告)日：2018-04-05
申请号：US15783482
申请日：2017-10-13
申请人： Carl Zeiss SMT GmbH
发明人： Thomas Schicketanz , Toralf Gruner
CPC分类号： G02B17/0892 , G02B13/14 , G02B17/08 , G02B17/0896 , G03F1/26 , G03F7/702 , G03F7/70225 , G03F7/70258 , G03F7/70266 , G03F7/70275 , G03F7/70308 , G03F7/70316 , G03F7/70441 , G03F7/70791
摘要： A catadioptric projection objective has a multiplicity of lenses and at least one concave mirror, and also two deflection mirrors in order to separate a partial beam path running from the object field to the concave mirror from the partial beam path running from the concave mirror to the image field. The deflection mirrors are tilted relative to the optical axis of the projection objective about tilting axes running parallel to a first direction (x-direction). The first deflection mirror is arranged in optical proximity to a first field plane and the second deflection mirror is arranged in optical proximity to a second field plane, which is optically conjugate with respect to the first field plane. A displacement device for the synchronous displacement of the deflection mirrors is provided. The deflection mirrors have different local distributions of their reflection properties in first and second reflection regions, respectively.
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公开(公告)号：US09639005B2
公开(公告)日：2017-05-02
申请号：US14179692
申请日：2014-02-13
申请人： Carl Zeiss SMT GmbH
发明人： Johannes Ruoff , Thomas Schicketanz
CPC分类号： G03F7/70233 , G02B17/06 , G02B17/0663 , G03F7/7015 , G03F7/70566
摘要： An imaging catoptric optical unit has at least four mirror, which image an object field in an object plane into an image field in an image plane. A first chief ray plane of the optical unit is prescribed by propagation of a chief ray of a central object field point during the reflection at one of the mirrors. A second chief ray plane of the optical unit is prescribed by propagation of the chief ray of the central object field point during the reflection at one of the other mirrors. The two chief ray planes include an angle that differs from 0. In an alternative or additional aspect, the imaging optical unit, considered via the image field, has a maximum diattenuation of 10% or a diattenuation that prefers a tangential polarization of the imaging light for a respectively considered illumination angle. The result of both aspects is an imaging optical unit in which bothersome polarization influences are reduced during the reflection of imaging light at the mirrors of the imaging optical unit.
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9.发明申请公开(公告)号：US20150062725A1
公开(公告)日：2015-03-05
申请号：US14522917
申请日：2014-10-24
申请人： Carl Zeiss SMT GmbH
发明人： Thomas Schicketanz , Toralf Gruner
CPC分类号： G02B17/0892 , G02B13/14 , G02B17/08 , G02B17/0896 , G03F1/26 , G03F7/702 , G03F7/70225 , G03F7/70258 , G03F7/70266 , G03F7/70275 , G03F7/70308 , G03F7/70316 , G03F7/70441 , G03F7/70791
摘要： A catadioptric projection objective has a multiplicity of lenses and at least one concave mirror, and also two deflection mirrors in order to separate a partial beam path running from the object field to the concave mirror from the partial beam path running from the concave mirror to the image field. The deflection mirrors are tilted relative to the optical axis of the projection objective about tilting axes running parallel to a first direction (x-direction). The first deflection mirror is arranged in optical proximity to a first field plane and the second deflection mirror is arranged in optical proximity to a second field plane, which is optically conjugate with respect to the first field plane. A displacement device for the synchronous displacement of the deflection mirrors is provided. The deflection mirrors have different local distributions of their reflection properties in first and second reflection regions, respectively.
摘要翻译： 反射折射投射物镜具有多个透镜和至少一个凹面镜，以及两个偏转镜，以便将从物镜场延伸的部分光束路径与从凹面镜到 图像字段。 偏转镜相对于投影物镜的光轴相对于平行于第一方向（x方向）延伸的倾斜轴线倾斜。 第一偏转镜被布置成光接近第一场平面，并且第二偏转镜布置成光学接近于相对于第一场平面光学共轭的第二场平面。 提供了用于偏转镜的同步位移的位移装置。 偏转镜在第一反射区域和第二反射区域中的反射特性分别具有不同的局部分布。
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公开(公告)号：US10520827B2
公开(公告)日：2019-12-31
申请号：US16241462
申请日：2019-01-07
申请人： Carl Zeiss SMT GmbH
摘要： An optical system, in particular for a microlithographic projection exposure apparatus, with at least one mirror (200) which has an optically effective surface and, for electromagnetic radiation of a predefined operating wavelength impinging on the optically effective surface at an angle of incidence of at least 65° relative to the respective surface normal, has a reflectivity of at least 0.5. The mirror has a reflection layer (210) and a compensation layer (220) which is arranged above this reflection layer (210) in the direction of the optically effective surface. The compensation layer (220), for an intensity distribution generated in a pupil plane or a field plane of the optical system during operation thereof, reduces the difference between the maximum and the minimum intensity value by at least 20% compared to an analogous structure without the compensation layer.
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