公开(公告)号：US20180196362A1

公开(公告)日：2018-07-12

申请号：US15912722

申请日：2018-03-06

申请人： Carl Zeiss SMT GmbH

发明人： Vitaliy Shklover ,  Michael Schall ,  Johannes Kraus ,  Oliver Gloeckl ,  Jeffrey Erxmeyer ,  Horst Feldermann ,  Konstantin Forcht ,  Ute Heinemeyer

IPC分类号： G03F7/20 ,  G02B1/115

摘要： In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein a first layer comprising a low refractive index inorganic fluoride compound is arranged on the substrate, a layer comprising an inorganic oxide-containing compound is arranged as a layer the most distant from the substrate, and at least two further layers each comprising an inorganic fluoride compound or an inorganic oxide-containing compound are arranged alternately between the first and the most distant layers.