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    OPTICAL ELEMENT
    2.
    发明申请
    OPTICAL ELEMENT 审中-公开

    公开(公告)号：US20180196362A1

    公开(公告)日：2018-07-12

    申请号：US15912722

    申请日：2018-03-06

    申请人： Carl Zeiss SMT GmbH

    发明人： Vitaliy Shklover ,  Michael Schall ,  Johannes Kraus ,  Oliver Gloeckl ,  Jeffrey Erxmeyer ,  Horst Feldermann ,  Konstantin Forcht ,  Ute Heinemeyer

    IPC分类号： G03F7/20 ,  G02B1/115

    摘要： In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein a first layer comprising a low refractive index inorganic fluoride compound is arranged on the substrate, a layer comprising an inorganic oxide-containing compound is arranged as a layer the most distant from the substrate, and at least two further layers each comprising an inorganic fluoride compound or an inorganic oxide-containing compound are arranged alternately between the first and the most distant layers.

    Method for in-situ dynamic protection of a surface and optical assembly
    3.
    发明授权
    Method for in-situ dynamic protection of a surface and optical assembly 有权

    公开(公告)号：US11681236B2

    公开(公告)日：2023-06-20

    申请号：US17373020

    申请日：2021-07-12

    申请人： Carl Zeiss SMT GmbH

    发明人： Vitaliy Shklover ,  Jeffrey Erxmeyer

    IPC分类号： G03F7/20 ,  G03F7/00

    CPC分类号： G03F7/70958 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70983

    摘要： In situ dynamic protection of an optical element surface against degradation includes disposing the optical element in an interior of an optical assembly for the FUV/VUV wavelength range and supplying at least one volatile fluorine-containing compound (A, B) to the interior for dynamic deposition of a fluorine-containing protective layer on the surface. The protective layer (7) is deposited on the surface layer by layer via a molecular layer deposition process. The compound includes a fluorine-containing reactant (A) supplied to the interior in a pulsed manner. A further reactant (B) is supplied to the interior also in a pulsed manner. An associated optical assembly includes an interior in which a surface is disposed, and at least one metering apparatus (123) that supplies a reactant to the interior. The metering apparatus provides a pulsed supply of the compound as a reactant (A, B) for layer by layer molecular layer deposition.

    OPTICAL COMPONENT AND OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOGRAPHY
    5.
    发明公开
    OPTICAL COMPONENT AND OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOGRAPHY 审中-公开

    公开(公告)号：US20230384687A1

    公开(公告)日：2023-11-30

    申请号：US18321244

    申请日：2023-05-22

    申请人： Carl Zeiss SMT GmbH

    发明人： Jeffrey Erxmeyer ,  Martin Hermann ,  Nils Lundt ,  Conrad Wolke

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70316

    摘要： An optical component comprises a first layer system exhibiting a first wavelength-dependent reflectivity curve when electromagnetic radiation impinges thereon, and at least one second layer system exhibiting a second wavelength-dependent reflectivity curve when electromagnetic radiation impinges thereon. The first layer system and the second layer system are arranged on different optical surfaces. The wavelength dependencies of the first and the second reflectivity curve at least partially compensate one another so that the relative deviation from a desired reflectivity curve which is linear or constant with respect to the wavelength is no more than 5% within the specified wavelength range for a resultant summated reflectivity for the first layer system and the at least one second layer system. An optical system, such as a microlithography projection exposure apparatus, can include such an optical component.