Process for cleaning optical elements for the ultraviolet wavelength range

    公开(公告)号:US11256182B2

    公开(公告)日:2022-02-22

    申请号:US16665615

    申请日:2019-10-28

    IPC分类号: G03F7/20 G02B5/08 G02B27/00

    摘要: Proposed for cleaning optical elements for the ultraviolet wavelength range having at least one metal-containing layer on a surface is a process that includes: —supplying activated hydrogen to the surface having the metal-containing layer; subsequently supplying inert gas having an H2O volume fraction of below 5 ppm, preferably below 1 ppm, particularly preferably below 0.2 ppm. To this end, an optical system (1) includes a housing (122), a supply line (161) of activated hydrogen, a supply line (162) of inert gas having an H2O volume fraction of below 5 ppm and a discharge line (163) for pumping gas out of the housing.

    BEAM SPLITTER FOR ACHIEVING GRAZING INCIDENCE OF LIGHT

    公开(公告)号:US20210349325A1

    公开(公告)日:2021-11-11

    申请号:US17385032

    申请日:2021-07-26

    发明人: Konstantin Forcht

    摘要: The disclosure relates to an optical system, in particular for microscopy, which includes a beam splitter having a light entrance surface and a light exit surface, wherein the beam splitter absorbs. For a specified operating wavelength range of the optical system, less than 20% of electromagnetic radiation is incident on the light entrance surface. The beam splitter is arranged in the optical system such that the angles of incidence which occur during operation of the optical system at the light entrance surface and/or at the light exit surface, with reference to the respective surface normal, are at least 70°.

    Reflective optical element
    4.
    发明授权

    公开(公告)号:US11099308B2

    公开(公告)日:2021-08-24

    申请号:US15940006

    申请日:2018-03-29

    摘要: A reflective optical element, in particular for a DUV or VUV operating wavelength range, includes a substrate, a dielectric layer system and a metallic coating between the substrate and the dielectric layer system. The dielectric layer system (26) includes a layer (L) of material having a lower refractive index n1 at the operating wavelength, a layer (H) of material having a higher refractive index n2 at the operating wavelength and a layer (M) of material having a refractive index n3 at the operating wavelength, where n1

    OPTICAL ELEMENT
    5.
    发明申请
    OPTICAL ELEMENT 审中-公开

    公开(公告)号:US20180196362A1

    公开(公告)日:2018-07-12

    申请号:US15912722

    申请日:2018-03-06

    IPC分类号: G03F7/20 G02B1/115

    摘要: In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein a first layer comprising a low refractive index inorganic fluoride compound is arranged on the substrate, a layer comprising an inorganic oxide-containing compound is arranged as a layer the most distant from the substrate, and at least two further layers each comprising an inorganic fluoride compound or an inorganic oxide-containing compound are arranged alternately between the first and the most distant layers.

    Reflective optical element
    6.
    发明授权

    公开(公告)号:US11520087B2

    公开(公告)日:2022-12-06

    申请号:US17145879

    申请日:2021-01-11

    IPC分类号: G02B5/08

    摘要: Reflective optical element with extended service life for VUV wavelengths includes a substrate (41) and a metal layer (49) thereon. At least one metal fluoride layer (43) on the metal layer faces away from the substrate and at least one oxide layer (45) on the metal fluoride layer faces away from the substrate. The thicknesses of the layers on the metal layer facing away from the substrate are selected so that the electrical field of a standing wave, formed when a relevant wavelength is reflected, has a minimum in the region of the oxide layer. In addition, the relevant wavelength is selected so that, from a minimum VUV wavelength range to the relevant wavelengths, the integral over the extinction coefficients of the material of the at least one oxide layer is between 15% and 47% of the corresponding integral from the minimum wavelengths to a maximum wavelength.

    BEAM SPLITTER FOR ACHIEVING GRAZING INCIDENCE OF LIGHT

    公开(公告)号:US20180364492A1

    公开(公告)日:2018-12-20

    申请号:US16113585

    申请日:2018-08-27

    发明人: Konstantin Forcht

    摘要: The disclosure relates to an optical system, in particular for microscopy, which includes a beam splitter having a light entrance surface and a light exit surface, wherein the beam splitter absorbs. For a specified operating wavelength range of the optical system, less than 20% of electromagnetic radiation is incident on the light entrance surface. The beam splitter is arranged in the optical system such that the angles of incidence which occur during operation of the optical system at the light entrance surface and/or at the light exit surface, with reference to the respective surface normal, are at least 70°.

    Catadioptric lens and optical system comprising such a lens

    公开(公告)号:US11561381B2

    公开(公告)日:2023-01-24

    申请号:US16544135

    申请日:2019-08-19

    摘要: A catadioptric lens includes at least two optical elements arranged along an optical axis. Both optical elements are configured as a mirror having a substrate and a highly reflective coating applied to an interface of the substrate. The highly reflective coating extends from the interface of the substrate along a surface normal. At least one of the highly reflective coatings has one or a plurality of layers. The optical total layer thickness of the one layer of the plurality of layers increases radially from the inner area outward.

    Catadioptric lens and optical system comprising such a lens

    公开(公告)号:US11520130B2

    公开(公告)日:2022-12-06

    申请号:US16544135

    申请日:2019-08-19

    摘要: A catadioptric lens includes at least two optical elements arranged along an optical axis. Both optical elements are configured as a mirror having a substrate and a highly reflective coating applied to an interface of the substrate. The highly reflective coating extends from the interface of the substrate along a surface normal. At least one of the highly reflective coatings has one or a plurality of layers. The optical total layer thickness of the one layer of the plurality of layers increases radially from the inner area outward.