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1.发明授权公开(公告)号：US10031423B2
公开(公告)日：2018-07-24
申请号：US15650533
申请日：2017-07-14
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
IPC分类号： G03F7/20 , G02B5/08 , G21K1/06 , G02B27/00 , G02B7/18 , G03B27/54 , G02B3/00 , G02B17/06 , B82Y10/00
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
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2.发明授权公开(公告)号：US09746778B2
公开(公告)日：2017-08-29
申请号：US15070872
申请日：2016-03-15
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
IPC分类号： G03F7/20 , G02B7/18 , G02B5/08 , G02B27/00 , G21K1/06 , B82Y10/00 , G02B17/06 , G02B3/00 , G03B27/54
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
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3.发明授权公开(公告)号：US10684551B2
公开(公告)日：2020-06-16
申请号：US16392220
申请日：2019-04-23
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
IPC分类号： G03F7/20 , G02B5/08 , G02B7/18 , G02B27/00 , G03B27/54 , G02B5/00 , B82Y10/00 , G02B17/06 , G21K1/06 , G02B3/00
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
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4.发明申请公开(公告)号：US20190310555A1
公开(公告)日：2019-10-10
申请号：US16392220
申请日：2019-04-23
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
IPC分类号： G03F7/20 , G03B27/54 , G02B5/08 , G02B5/00 , G02B17/06 , B82Y10/00 , G02B3/00 , G21K1/06 , G02B27/00 , G02B7/18
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
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5.发明申请公开(公告)号：US20180299784A1
公开(公告)日：2018-10-18
申请号：US16013687
申请日：2018-06-20
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
IPC分类号： G03F7/20 , G21K1/06 , G02B5/08 , G02B7/18 , G02B27/00 , G02B3/00 , G02B17/06 , G03B27/54 , B82Y10/00
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
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6.发明授权EUV exposure apparatus with reflective elements having reduced influence of temperature variation 有权具有降低的温度变化影响的反射元件的EUV曝光装置公开(公告)号：US09316929B2
公开(公告)日：2016-04-19
申请号：US13754720
申请日：2013-01-30
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
IPC分类号： G03F7/20 , B82Y10/00 , G02B5/08 , G02B7/18 , G02B17/06 , G02B27/00 , G21K1/06 , G02B3/00 , G02B5/00 , G03B27/54
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
摘要翻译： 具有至少两个反射光学元件的EUV光刻投影曝光系统的投影透镜，每个反射光学元件均包括主体和反射表面，用于在掩模版上投影到基板上的图像场上，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括具有温度依赖的热膨胀系数的材料，其在相应的零交叉温度下为零，并且其中零交叉温度之间的差的绝对值更多 超过6K。
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7.发明授权公开(公告)号：US10317802B2
公开(公告)日：2019-06-11
申请号：US16013687
申请日：2018-06-20
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
IPC分类号： G03F7/20 , B82Y10/00 , G02B5/08 , G02B7/18 , G02B17/06 , G02B27/00 , G21K1/06 , G02B3/00 , G03B27/54 , G02B5/00
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
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8.发明申请公开(公告)号：US20170315449A1
公开(公告)日：2017-11-02
申请号：US15650533
申请日：2017-07-14
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
IPC分类号： G03F7/20 , G02B5/08 , G02B7/18 , G02B27/00 , G21K1/06 , G02B3/00 , G02B17/06 , G03B27/54 , B82Y10/00
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
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9.发明申请EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFLUENCE OF TEMPERATURE VARIATION 审中-公开具有降低温度变化影响的反射元件的EUV曝光装置公开(公告)号：US20160195818A1
公开(公告)日：2016-07-07
申请号：US15070872
申请日：2016-03-15
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
摘要翻译： 具有至少两个反射光学元件的EUV光刻投影曝光系统的投影透镜，每个反射光学元件均包括主体和反射表面，用于在掩模版上投影到基板上的图像场上，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括具有温度依赖的热膨胀系数的材料，其在相应的零交叉温度下为零，并且其中零交叉温度之间的差的绝对值更多 超过6K。
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公开(公告)号：US20130141707A1
公开(公告)日：2013-06-06
申请号：US13754720
申请日：2013-01-30
发明人： Norman Baer , Ulrich Loering , Oliver Natt , Gero Wittich , Timo Laufer , Peter Kuerz , Guido Limbach , Stefan Hembacher , Holger Walter , Yim-Bun-Patrick Kwan , Markus Hauf , Franz-Josef Stickel , Jan Van Schoot
CPC分类号： G03F7/7015 , B82Y10/00 , G02B3/00 , G02B5/08 , G02B5/0816 , G02B5/0891 , G02B7/1815 , G02B17/0647 , G02B27/0043 , G03B27/542 , G03F7/702 , G03F7/70233 , G03F7/70316 , G03F7/70825 , G03F7/70891 , G03F7/70958 , G21K1/062 , G21K2201/061 , G21K2201/064
摘要： A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
摘要翻译： 具有至少两个反射光学元件的EUV光刻投影曝光系统的投影透镜，每个反射光学元件均包括主体和反射表面，用于在掩模版上投影到基板上的图像场上，如果投影透镜曝光 EUV光的功率，其中至少两个反射光学元件的主体包括具有温度依赖的热膨胀系数的材料，其在相应的零交叉温度下为零，并且其中零交叉温度之间的差的绝对值更多 超过6K。
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