公开(公告)号：US20140311379A1

公开(公告)日：2014-10-23

申请号：US14361240

申请日：2012-11-19

申请人： CENTRAL GLASS COMPANY, LIMITED

发明人： Atsushi Ryokawa ,  Shuhei Yamada ,  Masahiro Fujitani ,  Soichi Kumon ,  Masanori Saito ,  Takashi Saio ,  Shinobu Arata ,  Yosuke Hashimoto

IPC分类号： H01L21/02

CPC分类号： H01L21/02282 ,  C09D5/00 ,  H01L21/02057 ,  H01L21/02068

摘要： A method for preparing a liquid chemical for forming a water-repellant protective film, the liquid chemical having a solvent and an agent for forming a water-repellant protective film, the liquid chemical being for forming a water-repellent protective film at least on surfaces of recessed portions of an uneven pattern of a wafer having the uneven pattern at its surface, the method including: a first refinement step for eliminating the elements (metal impurities) Na, Mg, K, Ca, Mn, Fe, Cu, Li, Al, Cr, Ni, Zn and Ag in a solvent by distilling the solvent or by a particle-eliminating membrane and an ion exchange resin membrane; a mixing step for mixing the solvent after the first refinement step and an agent for forming a water-repellant protective film; and a second refinement step for eliminating particles in a liquid chemical after the mixing step by a particle-eliminating membrane.

摘要翻译： 一种制备用于形成防水保护膜的液体化学品的方法，具有溶剂的液体化学品和用于形成防水保护膜的试剂，所述液体化学品至少在表面上形成防水保护膜 该方法包括：第一精炼步骤，用于除去Na，Mg，K，Ca，Mn，Fe，Cu，Li等元素（金属杂质）的元素（金属杂质） Al，Cr，Ni，Zn和Ag在溶剂中通过蒸馏溶剂或通过除颗粒膜和离子交换树脂膜; 混合步骤，用于在第一精制步骤之后混合溶剂和形成防水保护膜的试剂; 以及第二细化步骤，用于通过除去颗粒的膜在混合步骤之后消除液体化学品中的颗粒。

公开(公告)号：US12098319B2

公开(公告)日：2024-09-24

申请号：US16962159

申请日：2019-02-05

申请人： CENTRAL GLASS COMPANY, LIMITED

发明人： Yuzo Okumura ,  Katsuya Kondo ,  Shuhei Yamada ,  Atsushi Ryokawa ,  Yuki Fukui

IPC分类号： C09K3/00 ,  C09K3/18 ,  H01L21/304 ,  H01L21/306

CPC分类号： C09K3/18 ,  H01L21/304 ,  H01L21/306

摘要： The present invention is directed to a liquid chemical for forming a water-repellent protective film on a silicon element-containing wafer surface, a method of preparing the liquid chemical and a method of manufacturing a surface-treated body with the use of the liquid chemical, wherein the liquid chemical includes the following components: (I) a silylation agent; (II) at least one kind of nitrogen-containing compound selected from the group consisting of those of the following general formulas [1] and [2]; and (III) an organic solvent.

公开(公告)号：US09748092B2

公开(公告)日：2017-08-29

申请号：US14952354

申请日：2015-11-25

申请人： Central Glass Company, Limited

发明人： Soichi Kumon ,  Takashi Saio ,  Shinobu Arata ,  Masanori Saito ,  Atsushi Ryokawa ,  Shuhei Yamada ,  Hidehisa Nanai ,  Yoshinori Akamatsu

IPC分类号： H01L21/02 ,  C09K3/18 ,  B08B3/08 ,  B08B3/10 ,  C11D1/82 ,  C11D3/16 ,  C11D11/00

CPC分类号： H01L21/02057 ,  B08B3/08 ,  B08B3/10 ,  C09K3/18 ,  C11D1/82 ,  C11D3/162 ,  C11D11/0047 ,  H01L21/02082

摘要： Disclosed is a liquid chemical for forming a water-repellent protecting film at least on a surface of a recessed portion of an uneven pattern at the time of cleaning a wafer having a finely uneven pattern at its surface and containing silicon at at least a part of the uneven pattern. This liquid chemical contains a silicon compound A represented by the general formula: R1aSi(H)bX4-a-b and an acid A, the acid A being at least one selected from the group consisting of trimethylsilyl trifluoroactate, trimethylsilyl trifluoromethanesulfonate, dimethylsilyl trifluoroactate, dimethylsilyl trifluoromethanesulfonate, butyldimethylsilyl trifluoroactate, butyldimethylsilyl trifluoromethanesulfonate, hexyldimethylsilyl trifluoroacetate, hexyldimethylsilyl trifluoromethanesulfonate, octyldimethylsilyl trifluoroactate, octyldimethylsilyl trifluoromethanesulfonate, decyldimethylsilyl trifluoroacetate and decyldimethylsilyl trifluoromethanesulfonate.