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公开(公告)号:US09650451B2
公开(公告)日:2017-05-16
申请号:US14188154
申请日:2014-02-24
IPC分类号: C08F20/30 , C09D133/16 , C08F14/18 , C08F216/14 , C08F220/24 , C08F220/30 , C09D125/16 , C08F20/28
CPC分类号: C08F20/30 , C08F14/18 , C08F20/28 , C08F216/1408 , C08F220/24 , C08F220/30 , C09D125/16 , C09D133/16 , Y10S430/108 , Y10S430/111 , C08F2/00
摘要: A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n≦6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
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公开(公告)号:US09281178B2
公开(公告)日:2016-03-08
申请号:US14136381
申请日:2013-12-20
发明人: Soichi Kumon , Takashi Saio , Shinobu Arata , Hidehisa Nanai , Yoshinori Akamatsu , Shigeo Hamaguchi , Kazuhiko Maeda
CPC分类号: H01L21/02052 , B08B3/00 , C09D183/04 , C11D3/162 , C11D7/5022 , H01L21/00 , H01L21/02054
摘要: A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.
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