摘要:
A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.
摘要:
A water repellent liquid for forming water repellent film. The liquid is provided containing: fluoroalkylsilane compound represented by general formula 1 where “m” is an integer between 2 and 7, “n” is an integer between 1 and 5, “X” is mutually independently at least one group selected from the group consisting of alkoxy group, chloro group, isocyanate group and hydroxyl group, and “p” is an integer between 1 and 3; silicon compound represented by general formula 2 R12SiY2 2 where “R1” mutually independently represents a C1-C20 hydrocarbon group, “Y” mutually independently represents at least one group selected from the group consisting of alkoxy group, chloro group, isocyanate group and hydroxyl group, and “R1” may be a branched hydrocarbon group or a cyclic hydrocarbon group; organic solvent; water; and acid. In this liquid the mass ratio of the fluoroalkylsilane compound to the silicon compound is between 1:0.1 and 1:20.