公开(公告)号：US20160158753A1

公开(公告)日：2016-06-09

申请号：US14935166

申请日：2015-11-06

Applicant: Cepheid

Inventor： DOUGLAS B. DORITY ,  Ronald Chang

IPC: B01L3/00

CPC classification number: B01L3/502715 ,  B01L3/502 ,  B01L3/50273 ,  B01L3/502738 ,  B01L2200/06 ,  B01L2200/10 ,  B01L2200/16 ,  B01L2300/06 ,  B01L2300/0645 ,  B01L2300/0681 ,  B01L2300/0848 ,  B01L2300/0861 ,  B01L2300/0877 ,  B01L2300/123 ,  B01L2300/14 ,  B01L2400/0421 ,  B01L2400/0478 ,  B01L2400/0487 ,  B01L2400/0644 ,  G01N1/18 ,  G01N1/28 ,  G01N1/405 ,  Y10T436/255 ,  Y10T436/2575

Abstract: A fluid control and processing system for controlling fluid flow among a plurality of chambers comprises a body including a fluid processing region continuously coupled fluidicly with a fluid displacement region. The fluid displacement region is depressurizable to draw fluid into the fluid displacement region and pressurizable to expel fluid from the fluid displacement region. The body includes at least one external port. The fluid processing region is fluidicly coupled with the at least one external port. The fluid displacement region is fluidicly coupled with at least one external port of the body. The body is adjustable with respect to the plurality of chambers to place the at least one external port selectively in fluidic communication with the plurality of chambers. One or more of the chambers may be a processing chamber which includes two ports configured to selectively engage the at least one external port of the body, and a fluid processing material such as an enrichment material or a depletion material. In some embodiments, one or more chambers may include a separation channel, and an electric field may be applied across the separation channel.

Abstract translation: 用于控制多个室之间的流体流动的流体控制和处理系统包括主体，其包括与流体位移区域流体连续耦合的流体处理区域。 流体位移区域是可减压的，以将流体吸入流体移动区域并且可加压以从流体位移区域排出流体。 身体至少包括一个外部端口。 流体处理区域与至少一个外部端口流体耦合。 流体位移区域与主体的至少一个外部端口流体耦合。 主体相对于多个室可调节以将至少一个外部端口选择性地与多个室流体连通。 一个或多个室可以是处理室，其包括构造成选择性地接合主体的至少一个外部端口的两个端口，以及诸如富集材料或耗尽材料的流体处理材料。 在一些实施例中，一个或多个腔室可以包括分离通道，并且可以跨越分离通道施加电场。