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    Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device
    2.
    发明授权
    Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor device 有权
    观察曝光半导体器件的曝光条件的方法及其装置及制造半导体器件的方法

    公开(公告)号：US06913861B2

    公开(公告)日：2005-07-05

    申请号：US10370369

    申请日：2003-02-18

    申请人： Chie Shishido ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Ryo Nakagaki ,  Maki Tanaka ,  Yuuji Takagi

    发明人： Chie Shishido ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Ryo Nakagaki ,  Maki Tanaka ,  Yuuji Takagi

    IPC分类号： G01B15/00 ,  G03F7/20 ,  G03F7/207 ,  H01J37/28 ,  H01L21/027 ,  G03F9/00 ,  G03C5/00

    CPC分类号： G03F7/70625 ,  G03F7/70641 ,  H01J37/28 ,  H01J2237/2817 ,  Y10S430/143

    摘要： Size characteristic quantities are measured at a plural locations. The size characteristic quantities include edge widths, pattern widths, and/or pattern lengths of the electron-beam images of a resist-dropout pattern and a resist-remaining pattern that are located such that the effective exposure quantities differ depending on the places. With the predetermined measurement errors added thereto, the size characteristic quantities are compared with model data that has been created in advance and that causes various exposure conditions to be related with the size characteristic quantities measured under these various exposure conditions. This comparison makes it possible not only to estimate deviation quantities in the exposure quantity and the focal-point position from the correct values, but also to calculate ambiguity degrees of the estimated values. This, allows the implementation of a proper monitoring/controlling of the exposure-condition variations (i.e., the deviations in the exposure quantity and the focal-point position) in the lithography process.

    摘要翻译： 在多个位置测量尺寸特征量。 尺寸特征量包括抗蚀剂落下图案和抗蚀剂剩余图案的电子束图像的边缘宽度，图案宽度和/或图案长度，其位置使得有效曝光量根据位置而不同。 随着预定的测量误差被添加到其中，将尺寸特征量与预先创建的模型数据进行比较，并使各种曝光条件与在这些各种曝光条件下测量的尺寸特征量相关。 该比较使得不仅可以从正确值估计曝光量和焦点位置中的偏差量，而且可以计算估计值的模糊度。 这允许在光刻工艺中实现曝光条件变化（即，曝光量和焦点位置的偏差）的适当监控/控制。

    Process conditions change monitoring systems that use electron beams, and related monitoring methods
    4.
    发明授权
    Process conditions change monitoring systems that use electron beams, and related monitoring methods 失效
    过程条件改变使用电子束的监测系统，以及相关的监测方法

    公开(公告)号：US06791082B2

    公开(公告)日：2004-09-14

    申请号：US10347616

    申请日：2003-01-22

    申请人： Osamu Komuro ,  Hidetoshi Morokuma ,  Chie Shishido

    发明人： Osamu Komuro ,  Hidetoshi Morokuma ,  Chie Shishido

    IPC分类号： G01M1900

    CPC分类号： G03F7/70641 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70625 ,  H01J37/304 ,  H01J37/3174

    摘要： In order to accurately monitor changes in exposure conditions (changes in exposure level and focus) at a product wafer level during lithography, changes in exposure conditions can be calculated by acquiring electron beam images of a first pattern portion and a second pattern portion different from one another in terms of the tendency of the changes in dimensional characteristic quantities against the changes in exposure conditions, then calculating the respective dimensional characteristic quantities of the first pattern portion and the second pattern portion, and applying these dimensional characteristic quantities to the models which logically link the exposure conditions and the dimensional characteristic quantities. Hereby, it is possible to supply the process conditions change monitoring systems and methods that enable output of accurate changes in exposure level and focus.

    摘要翻译： 为了在光刻期间准确地监视产品晶片级的曝光条件（曝光水平和焦点的变化）的变化，可以通过获取不同于第一图案部分和第二图案部分的电子束图像来计算曝光条件的变化 另一方面，根据暴露条件变化的尺寸特征量变化的趋势，然后计算第一图案部分和第二图案部分的相应尺寸特征量，并将这些尺寸特征量应用于逻辑链接的模型 暴露条件和尺寸特征量。 因此，可以提供能够输出曝光水平和焦点的精确变化的过程条件变化监视系统和方法。

    SCANNING ELECTRON MICROSCOPE
    5.
    发明申请
    SCANNING ELECTRON MICROSCOPE 有权
    扫描电子显微镜

    公开(公告)号：US20090041333A1

    公开(公告)日：2009-02-12

    申请号：US12249014

    申请日：2008-10-10

    申请人： Satoru YAMAGUCHI ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

    发明人： Satoru YAMAGUCHI ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

    IPC分类号： G06K9/00 ,  G01N23/00

    CPC分类号： H01J37/28 ,  G01N23/04 ,  G01N23/225 ,  G06T7/74 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J37/222 ,  H01J2237/2817

    摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.

    摘要翻译： 本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜，从而以高速度高精度地运行。 为了实现上述目的，本发明提供了一种扫描电子显微镜，其具有基于预先登记的图案来识别期望位置的功能，该扫描电子显微镜包括用于设置关于图案种类的信息的装置，多个部分之间的间隔 构成图案的部分，以及构成图案的部分的尺寸，以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。

    Scanning electron microscope
    7.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US08666165B2

    公开(公告)日：2014-03-04

    申请号：US12249014

    申请日：2008-10-10

    申请人： Satoru Yamaguchi ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

    发明人： Satoru Yamaguchi ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

    IPC分类号： G06K9/00

    CPC分类号： H01J37/28 ,  G01N23/04 ,  G01N23/225 ,  G06T7/74 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J37/222 ,  H01J2237/2817

    摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.

    摘要翻译： 本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜，从而以高速度高精度地运行。 为了实现上述目的，本发明提供了一种扫描电子显微镜，其具有基于预先登记的图案来识别期望位置的功能，该扫描电子显微镜包括用于设置关于图案种类的信息的装置，多个部分之间的间隔 构成图案的部分，以及构成图案的部分的尺寸，以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。

    Scanning electron microscope
    8.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US07439505B2

    公开(公告)日：2008-10-21

    申请号：US11292002

    申请日：2005-12-02

    申请人： Satoru Yamaguchi ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

    发明人： Satoru Yamaguchi ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

    IPC分类号： H01J37/28

    CPC分类号： H01J37/28 ,  G01N23/04 ,  G01N23/225 ,  G06T7/74 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J37/222 ,  H01J2237/2817

    摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.

    摘要翻译： 本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜，从而以高速度高精度地运行。 为了实现上述目的，本发明提供了一种扫描电子显微镜，其具有基于预先登记的图案来识别期望位置的功能，该扫描电子显微镜包括用于设置关于图案种类的信息的装置，多个部分之间的间隔 构成图案的部分，以及构成图案的部分的尺寸，以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。

    Scanning electron microscope
    9.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US07002151B2

    公开(公告)日：2006-02-21

    申请号：US10933342

    申请日：2004-09-03

    申请人： Satoru Yamaguchi ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

    发明人： Satoru Yamaguchi ,  Takashi Iizumi ,  Osamu Komuro ,  Hidetoshi Morokuma ,  Tatsuya Maeda ,  Juntaro Arima ,  Yasuhiko Ozawa

    IPC分类号： H01J37/28

    CPC分类号： H01J37/28 ,  G01N23/04 ,  G01N23/225 ,  G06T7/74 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J37/222 ,  H01J2237/2817

    摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.

    摘要翻译： 本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜，从而以高速度高精度地运行。 为了实现上述目的，本发明提供了一种扫描电子显微镜，其具有基于预先登记的图案来识别期望位置的功能，该扫描电子显微镜包括用于设置关于图案种类的信息的装置，多个部分之间的间隔 构成图案的部分，以及构成图案的部分的尺寸，以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。