Cleaning method following opening etch
    1.
    发明申请
    Cleaning method following opening etch 有权
    打开蚀刻后的清洁方法

    公开(公告)号:US20090142931A1

    公开(公告)日:2009-06-04

    申请号:US11946875

    申请日:2007-11-29

    IPC分类号: H01L21/461 C23F1/12

    摘要: A cleaning method following an opening etching is provided. First, a semiconductor substrate having a dielectric layer is provided. The hard mask layer includes at least a metal layer. The opening etch is then carried out to form at least an opening in the dielectric layer. A nitrogen (N2) treatment process is performed to clean polymer residues having carbon-fluorine (C—F) bonds remained in the opening. Finally, a wet cleaning process is performed.

    摘要翻译: 提供了开口蚀刻后的清洁方法。 首先,提供具有电介质层的半导体基板。 硬掩模层至少包括金属层。 然后进行开口蚀刻以形成电介质层中的至少一个开口。 进行氮(N2)处理工艺以清洁残留在开口中的具有碳 - 氟(C-F)键的聚合物残基。 最后,进行湿式清洗处理。

    Cleaning method following opening etch
    2.
    发明授权
    Cleaning method following opening etch 有权
    打开蚀刻后的清洁方法

    公开(公告)号:US08282842B2

    公开(公告)日:2012-10-09

    申请号:US11946875

    申请日:2007-11-29

    IPC分类号: H01B13/00

    摘要: A cleaning method following an opening etching is provided. First, a semiconductor substrate having a dielectric layer is provided. The hard mask layer includes at least a metal layer. The opening etch is then carried out to form at least an opening in the dielectric layer. A nitrogen (N2) treatment process is performed to clean polymer residues having carbon-fluorine (C—F) bonds remained in the opening. Finally, a wet cleaning process is performed.

    摘要翻译: 提供了开口蚀刻后的清洁方法。 首先,提供具有电介质层的半导体基板。 硬掩模层至少包括金属层。 然后进行开口蚀刻以形成电介质层中的至少一个开口。 进行氮(N2)处理工艺以清洁残留在开口中的具有碳 - 氟(C-F)键的聚合物残基。 最后,进行湿式清洗处理。

    PATTERNING METHOD
    3.
    发明申请
    PATTERNING METHOD 审中-公开
    绘图方法

    公开(公告)号:US20100018944A1

    公开(公告)日:2010-01-28

    申请号:US12179879

    申请日:2008-07-25

    IPC分类号: H01B13/00

    摘要: A patterning method is provided. A patterned photoresist layer is formed on a bottom anti-reflective coating (BARC), having therein an opening exposing a portion of the BARC. The patterned photoresist layer is treated with a first plasma-generating gas including a fluorocarbon species to form a polymer layer on the surface of the PR layer and the sidewall of the opening. The patterned photoresist layer is used as a mask to etch the BARC with a second plasma-generating gas, which includes Ar and H2 but no fluorocarbon species or oxygen-containing species, to remove the exposed portion of the BARC.

    摘要翻译: 提供了图案化方法。 在底部抗反射涂层(BARC)上形成图案化的光致抗蚀剂层,其中具有露出BARC的一部分的开口。 图案化的光致抗蚀剂层用包括碳氟化合物种的第一等离子体产生气体处理,以在PR层的表面和开口的侧壁上形成聚合物层。 图案化的光致抗蚀剂层用作掩模以具有第二等离子体产生气体(其包括Ar和H 2,但不含碳氟物质或含氧物质)来蚀刻BARC以去除BARC的暴露部分。

    Hardware component graph to hardware description language translation method
    5.
    发明授权
    Hardware component graph to hardware description language translation method 失效
    硬件组件图到硬件描述语言翻译方法

    公开(公告)号:US07430727B2

    公开(公告)日:2008-09-30

    申请号:US11440065

    申请日:2006-05-25

    IPC分类号: G06F17/50

    CPC分类号: G06F17/505

    摘要: An HCG to HDL translation method, which can automatically generate VHDL codes. The method reads a hardware component graph (HCG) to find a start node and obtain a corresponding hardware component subgraph of the start node, analyzes all information of the start node to thereby add input and output components and generate a VHDL entity, determines types on all nodes of the hardware component, graph to thereby generate corresponding VHDL components and write associated information in a VHDL architecture, generates corresponding signal connections of VHDL components in accordance with edges of the hardware component graph, and outputs the VHDL entity and architecture to a file in a text form.

    摘要翻译: 一种HCG到HDL的翻译方法,可以自动生成VHDL代码。 该方法读取硬件组件图(HCG)以找到起始节点并获取起始节点的相应硬件组件子图,分析起始节点的所有信息,从而添加输入和输出组件并生成VHDL实体,确定类型 硬件组件的所有节点图形,从而生成对应的VHDL组件并在VHDL架构中写入关联信息,根据硬件组件图的边缘生成VHDL组件的相应信号连接,并将VHDL实体和体系结构输出到文件 以文本形式。

    Hardware component graph to hardware description language translation method
    6.
    发明申请
    Hardware component graph to hardware description language translation method 失效
    硬件组件图到硬件描述语言翻译方法

    公开(公告)号:US20070157147A1

    公开(公告)日:2007-07-05

    申请号:US11440065

    申请日:2006-05-25

    IPC分类号: G06F17/50

    CPC分类号: G06F17/505

    摘要: An HCG to HDL translation method, which can automatically generate VHDL codes. The method reads a hardware component graph (HCG) to find a start node and obtain a corresponding hardware component subgraph of the start node, analyzes all information of the start node to thereby add input and output components and generate a VHDL entity, determines types on all nodes of the hardware component, graph to thereby generate corresponding VHDL components and write associated information in a VHDL architecture, generates corresponding signal connections of VHDL components in accordance with edges of the hardware component graph, and outputs the VHDL entity and architecture to a file in a text form.

    摘要翻译: 一种HCG到HDL的翻译方法,可以自动生成VHDL代码。 该方法读取硬件组件图(HCG)以找到起始节点并获取起始节点的相应硬件组件子图,分析起始节点的所有信息,从而添加输入和输出组件并生成VHDL实体,确定类型 硬件组件的所有节点图形,从而生成对应的VHDL组件并在VHDL架构中写入关联信息,根据硬件组件图的边缘生成VHDL组件的相应信号连接,并将VHDL实体和体系结构输出到文件 以文本形式。