FLUOROCARBON FILM AND PROCESS FOR ITS PRODUCTION
    1.
    发明申请
    FLUOROCARBON FILM AND PROCESS FOR ITS PRODUCTION 审中-公开
    荧光膜及其生产工艺

    公开(公告)号:US20070202340A1

    公开(公告)日:2007-08-30

    申请号:US11743260

    申请日:2007-05-02

    IPC分类号: B32B27/00 B32B27/16

    摘要: To provide a process for producing a fluorocarbon film, which is capable of constantly forming a fluorocarbon film excellent in durability and functionality. The process for producing a fluorocarbon film of the present invention is a process for producing a fluorocarbon film at least a part of which is chemically bonded to a substrate surface, and is characterized by conducting, in sequence, step (a) for applying plasma to a substrate surface in a continuous or pulse manner to form active points on the substrate surface and step (b) for applying plasma to the substrate surface in a continuous or pulse manner in the presence of a gas of a fluorocompound represented by the formula CxFy and/or CxFyOz under such a condition that active species impinge on the substrate surface at a relatively lower collision energy than in step (a).

    摘要翻译: 提供能够不断形成耐久性和功能性优异的碳氟化合物膜的碳氟化合物膜的制造方法。 本发明的氟碳膜的制造方法是将氟化碳膜的至少一部分与基材表面进行化学键合的制造方法,其特征在于,依次进行将等离子体施加的步骤(a) 基板表面,以连续或脉冲的方式在基板表面上形成有效点,并且步骤(b)用于在存在由式C'表示的氟化合物的气体的情况下以连续或脉冲的方式将等离子体施加到基板表面, 在这种条件下,在这种条件下, 该活性物质以比步骤(a)中相对较低的碰撞能量撞击在基底表面上。