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    System and method for providing modified illumination intensity
    6.
    发明授权
    System and method for providing modified illumination intensity 失效
    提供改进的照明强度的系统和方法

    公开(公告)号：US07602475B2

    公开(公告)日：2009-10-13

    申请号：US12141630

    申请日：2008-06-18

    申请人： Roel De Jonge

    发明人： Roel De Jonge

    IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54 ,  G03B27/32 ,  G02B5/30

    CPC分类号： G02F1/0131 ,  G02F2202/40

    摘要： A lithography system including a polarized illumination source, a birefringence-controllable optical element, a birefringence inducer, a pattern generator, a linear polarizer, and a projection system. The polarized illumination source is configured to provide polarized light. The birefringence-controllable optical element is optically coupled to the polarized illumination source. The birefringence inducer is coupled to the birefringence-controllable optical element and configured to induce birefringence on the birefringence-controllable optical element to provide polarization-retarded polarized light. The pattern generator is optically coupled to the birefringence-controllable optical element. The linear polarizer is optically coupled to the pattern generator and configured (i) to receive the polarization-retarded polarized light and (ii) modify intensity distribution of the polarization-retarded polarized light to provide modified polarization-retarded polarized light. The projection system is configured to project the modified polarization-retarded polarized light.

    摘要翻译： 包括偏振照明源，双折射可控光学元件，双折射诱导器，图案发生器，线性偏振器和投影系统的光刻系统。 偏振照明源被配置为提供偏振光。 双折射可控光学元件光耦合到偏振照明源。 双折射诱导器耦合到双折射可控光学元件并且被配置为在双折射可控光学元件上诱发双折射以提供偏振延迟偏振光。 图案发生器光耦合到双折射可控光学元件。 线性偏振器光学耦合到图案发生器并且被配置为（i）接收极化延迟的偏振光，和（ii）修改偏振延迟的偏振光的强度分布，以提供修正的偏振延迟的偏振光。 投影系统被配置为投影修改的偏振延迟偏振光。