公开(公告)号：US06558869B1

公开(公告)日：2003-05-06

申请号：US09558110

申请日：2000-04-25

申请人： Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley ,  Peter Andrew Reath Bennett ,  Richard David Hoare ,  James Laurence Mulligan ,  John Andrew Hearson ,  Carole-Anne Smith ,  Stuart Bayes ,  Mark John Spowage

发明人： Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley ,  Peter Andrew Reath Bennett ,  Richard David Hoare ,  James Laurence Mulligan ,  John Andrew Hearson ,  Carole-Anne Smith ,  Stuart Bayes ,  Mark John Spowage

IPC分类号： G03F7039

CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41M5/368 ,  B41M5/46 ,  B41M5/465 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

摘要： This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e. the “reversible insolubilizer compound”) such that the aqueous alkaline developer solubility of the composition is increased on heating and the aqueous alkaline developer solubility of the composition is not increased by incident UV radiation. The invention provides a solution to the problem of the relatively narrow solubility differential between imaged and non-imaged areas of heat sensitive positive working radiation sensitive compositions.

摘要翻译： 本发明涉及通过热模式成像来制备抗蚀剂图案的前体，前体包括热敏组合物，其热溶性在碱性显影剂的水溶液中被设置为增加加热区域， 热敏组合物的非加热区域溶解在含水碱性显影剂（“显影剂阻挡装置”）中，其中所述显影剂阻力装置包括一种或多种选自以下的化合物：（A）包括聚 （环氧烷）单元;（B）硅氧烷; 和（C）多元醇的酯，醚和酰胺，其中所述热敏组合物包含水性碱性显影剂可溶性聚合物质（即“活性聚合物”）和降低聚合物质的碱性显影剂水溶液的化合物（ 即“可逆不溶物化合物”），使得组合物的碱性显影剂水溶液在加热时增加，并且组合物的水性碱性显影剂溶解度不会因入射的紫外线辐射而增加。 本发明提供了解决热敏感正性辐射敏感组合物的成像区域和非成像区域之间相对窄的溶解度差异的问题的解决方案。