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公开(公告)号：US6087073A
公开(公告)日：2000-07-11
申请号：US875004
申请日：1997-09-18
CPC分类号： G03F7/40 , G03F7/2024
摘要： There is described a method of preparing a water-less lithographic plate by coating a positive working photosensitive composition onto an oleophilic base imagewise exposing the plate and developing it to remove the areas of the photosensitive composition which have been light exposed, coating overall the surface of the plate with a layer of a composition which is ink-releasing or when cured becomes ink releasing, then either as a separate step or as a combined step curing the ink-releasing composition or drying the ink-releasing composition and light exposing overall the plate, then redeveloping the plate to remove the photosensitive composition remaining after the first development and any ink-releasing composition overlying the photosensitive composition.
摘要翻译： PCT No.PCT / GB95 / 02782 Sec。 371日期：1997年9月18日 102（e）日期1997年9月18日PCT提交1995年11月28日PCT公布。 公开号WO96 / 20433 日本1996年7月4日描述了一种制备无水平版印刷版的方法，该方法是将正性感光性组合物涂布在亲油性基底上，成像曝光该印版并使其显影以去除已曝光的光敏组合物的区域， 使用油墨释放或固化时的组合物层整体涂覆在板的表面上，然后作为分离步骤或组合步骤固化油墨释放组合物或干燥油墨释放组合物， 光总体曝光板，然后重新开发板以除去第一次显影后残留的感光组合物和覆盖光敏组合物的任何油墨释放组合物。
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公开(公告)号：US5976764A
公开(公告)日：1999-11-02
申请号：US793142
申请日：1997-05-05
摘要： There is described a method of preparing water-less lithographic plate which comprises imagewise exposing a lithographic plate coated with a photosensitive composition, processing the exposed plate in an aqueous based developing liquid to remove those areas of the photosensitive composition which are removable by the developing liquid, drying the plate and coating the plate with an ink releasing coating composition which adheres to those areas of the plate from which the photosensitive composition has been removed, but which does not adhere to those areas of the plate from which the photosensitive composition which has not been removed, further treating the plate to cure or fix the ink-releasing composition thus providing ink-receptive areas of the plate which are those areas of the plate from which the photosensitive composition which has not been removed in the developing liquid and ink-releasing areas of the plate which are covered with the cured ink-releasing composition. Both positive working and negative working lithographic plates can be used in this method to produce positive working water-less plates and negative working water-less plates.
摘要翻译： PCT No.PCT / GB95 / 01846 Sec。 371日期：1997年5月5日 102（e）日期1997年5月5日PCT提交1995年8月3日PCT公布。 公开号WO96 / 05539 日本1996年2月22日描述了一种制备无水平版印刷版的方法，其包括使用感光组合物涂布的平版印刷板成像曝光，将曝光的板在基于水性的显影液中处理以去除感光性组合物的那些区域， 可以通过显影液体移除，干燥板并用粘附到已经除去感光性组合物的板的那些区域附着的油墨释放涂料组合物涂布，但不粘附到板的这些区域 未被除去的光敏组合物，进一步处理该板以固化或固定该油墨释放组合物，从而提供该板的油墨接收区域，该板的那些区域是在该显影剂中未被除去的光敏组合物的那些区域 被固化的油墨释放组合物覆盖的板的液体和油墨释放区域 爱心 在这种方法中可以使用正工作和负极平版印刷板，以生产正工作无水板和负工作无水板。
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公开(公告)号：US6130026A
公开(公告)日：2000-10-10
申请号：US11590
申请日：1998-02-11
CPC分类号： B41C1/1008 , G03F7/0046 , G03F7/0752 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/16 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A method for preparing a waterless lithographic plate is disclosed. A mixture that contains a water-repellant release material and a compound that becomes aqueous developable on heating is coated on a support, heated imagewise, and developed to produce the printing plate. Preferred water-repellant release materials are acrylic and methacrylic polymers with fluorinated side chains and silicone containing polymers, especially organo functional siloxanes. Preferred compounds that become aqueous developable on heating are phenolic resins as well as complexes of phenolic resins with quinolinium compounds, benzothiazolium compounds, pyridinium compounds, and imidazoline compounds.
摘要翻译： PCT No.PCT / GB96 / 01973。 371日期1998年2月11日 102（e）1998年2月11日PCT PCT 1996年8月13日PCT公布。 公开号WO97 / 07986 日期1997年3月6日公开了一种无水平版印刷版的制备方法。 含有防水脱模材料的混合物和在加热时显影的水性化合物被涂覆在载体上，成像加热并显影以产生印刷版。 优选的防水释放材料是具有氟化侧链的丙烯酸和甲基丙烯酸聚合物和含硅氧烷聚合物，特别是有机官能硅氧烷。 在加热时可变成水性的优选化合物是酚醛树脂以及酚醛树脂与喹啉化合物，苯并噻唑鎓化合物，吡啶鎓化合物和咪唑啉化合物的络合物。
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公开(公告)号：US06420087B1
公开(公告)日：2002-07-16
申请号：US09297443
申请日：1999-04-30
IPC分类号： G03F7038
CPC分类号： G03F7/11 , G03F7/0233 , G03F7/0752 , G03F7/0757
摘要： A positive working lithographic plate precursor comprising a support having a hydrophilic surface and a coating thereon comprising a positive working, photosensitive composition and an aryl alkyl polysiloxane. A method of preparing a positive working lithographic plate precursor comprising coating on a support having a hydrophilic surface a coating comprising, in admixture, a positive working photosensitive composition and an aryl alkyl polysiloxane.
摘要翻译： 一种正性工作平版印刷版原版，其包含具有亲水表面的载体和其上的涂层，其包含正性，感光性组合物和芳基烷基聚硅氧烷。 一种制备正性平版印刷版原版的方法，其包括在具有亲水表面的载体上涂布涂层，所述涂层包含正性感光性组合物和芳基烷基聚硅氧烷。
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公开(公告)号：US06303271B1
公开(公告)日：2001-10-16
申请号：US09194822
申请日：1999-06-29
IPC分类号： G03F730
CPC分类号： B41C1/1008 , B41C2210/04 , B41C2210/08 , B41C2210/22 , B41C2210/24 , Y10S430/145 , Y10S430/146
摘要： A method for preparing a printing form and a method of printing are disclosed. A coating of a radiation sensitive ink on a lithographic support having a hydrophilic surface is imaged. The unexposed areas of the coating are removed to produce a printing form, which is used for printing. Preferably, the same radiation sensitive ink is used for printing as is used in the coating, and, preferably, the desired printing run length is predetermined and the thickness of the coating determined according to the desired run length.
摘要翻译： 公开了一种制备印刷方法和印刷方法。 对具有亲水表面的光刻支架上的辐射敏感油墨的涂层进行成像。 去除涂层的未曝光区域以产生用于印刷的印刷形式。 优选地，相同的辐射敏感油墨用于如涂层中使用的印刷，并且优选地，期望的印刷行程长度是预定的，并且涂层的厚度根据期望的行程长度确定。
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公开(公告)号：US06558869B1
公开(公告)日：2003-05-06
申请号：US09558110
申请日：2000-04-25
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare , James Laurence Mulligan , John Andrew Hearson , Carole-Anne Smith , Stuart Bayes , Mark John Spowage
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare , James Laurence Mulligan , John Andrew Hearson , Carole-Anne Smith , Stuart Bayes , Mark John Spowage
IPC分类号： G03F7039
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41M5/368 , B41M5/46 , B41M5/465 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e. the “reversible insolubilizer compound”) such that the aqueous alkaline developer solubility of the composition is increased on heating and the aqueous alkaline developer solubility of the composition is not increased by incident UV radiation. The invention provides a solution to the problem of the relatively narrow solubility differential between imaged and non-imaged areas of heat sensitive positive working radiation sensitive compositions.
摘要翻译： 本发明涉及通过热模式成像来制备抗蚀剂图案的前体，前体包括热敏组合物，其热溶性在碱性显影剂的水溶液中被设置为增加加热区域， 热敏组合物的非加热区域溶解在含水碱性显影剂（“显影剂阻挡装置”）中，其中所述显影剂阻力装置包括一种或多种选自以下的化合物：（A）包括聚 （环氧烷）单元;（B）硅氧烷; 和（C）多元醇的酯，醚和酰胺，其中所述热敏组合物包含水性碱性显影剂可溶性聚合物质（即“活性聚合物”）和降低聚合物质的碱性显影剂水溶液的化合物（ 即“可逆不溶物化合物”），使得组合物的碱性显影剂水溶液在加热时增加，并且组合物的水性碱性显影剂溶解度不会因入射的紫外线辐射而增加。 本发明提供了解决热敏感正性辐射敏感组合物的成像区域和非成像区域之间相对窄的溶解度差异的问题的解决方案。
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公开(公告)号：US06187511B1
公开(公告)日：2001-02-13
申请号：US09011436
申请日：1998-02-11
IPC分类号： G03F726
CPC分类号： G03F7/0752 , G03F7/0046 , Y10S430/108 , Y10S430/123
摘要： There is described a method of preparing a positive working water-less lithographic plate which comprises a support having an oleophilic surface, there being coated on the support a mixture which comprises as one component an ink-repellant and water-repellant polymer or a mixture of such polymers or polymer precursors, and as the other essential component of the mixture an infra-red or heat sensitive composition selected from (a) an organic solvent soluble diazo compound and an infra-red absorbing compound, (b) a photopolymer and an infra-red absorbing dye, or (c) a mixture of a free-radically polymerisable ethylenically unsaturated compound or compounds together with either a photoinitiator which is infra-red sensitive or an initiator which is heat sensitive together with an infra-red absorbing compound, the ratio of ink-repellant polymer to infra-red or heat sensitive composition (a), (b) or (c) in the mixture being from 20-80 ink repellant polymer to 80-20 infra-red or heat sensitive composition by weight, imagewise acting on the coated mixture, developing the acted on mixture with the appropriate developing solution depending on the composition (a), (b) or (c) used, to remove the composition and the water-repellant polymer in the unacted on areas to reveal the oleophilic surface of the support in the unacted on areas of the plate and leaving the coated mixture in the acted on areas of the plate.
摘要翻译： 描述了一种制备正性工作无水平版印刷版的方法，其包括具有亲油表面的载体，在载体上涂覆一种混合物，该混合物包含斥水斥水聚合物或防水聚合物的混合物 这种聚合物或聚合物前体，以及作为混合物的另一种基本组分，选自（a）有机溶剂可溶性重氮化合物和红外吸收化合物的红外或热敏组合物，（b）光聚合物和下文 或（c）可自由基聚合的烯键式不饱和化合物或其混合物与红外线敏感的光引发剂或与红外吸收化合物一起热敏的引发剂的混合物， 斥墨聚合物与红外或热敏组合物（a），（b）或（c）的比例为20-80墨水排斥聚合物至80-20红外或热敏 根据所用组合物（a），（b）或（c），用适当的显影液对混合物进行显影，以除去组合物和防水聚合物 在区域上未暴露以暴露在板上未活化的载体上的亲油表面并将涂覆的混合物留在板的区域上。
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公开(公告)号：US6077645A
公开(公告)日：2000-06-20
申请号：US155019
申请日：1999-01-26
CPC分类号： G03F7/0755 , G03F7/0752
摘要： There is described a water-less lithographic plate precursor which comprises on an aluminium plate a light-sensitive composition which comprises a polymer with hydroxy functional groups, an acid generator which when light exposed yields an acid together with a silyl ether of general formula (I), where Rf is a fluoroaliphatic group having 3 to 10 carbon atoms, Y is oxygen, SO.sub.2, carbonyl or a direct link, X is N R.sub.4 where R.sub.4 is hydrogen or lower alkyl having up to six carbon atoms or is a direct link, each of R.sub.1, R.sub.2 and R.sub.3 are lower alkyl groups having up to six carbon atoms and R.sub.5 is a lower alkyl group having up to six carbon atoms. ##STR1##
摘要翻译： PCT No.PCT / GB97 / 00758 Sec。 371日期1999年1月26日 102（e）日期1999年1月26日PCT 1997年3月19日PCT公布。 公开号WO97 / 36208 日期1997年10月2日描述了一种无水平版印刷版前体，其在铝板上包含含有具有羟基官能团的聚合物的光敏组合物，当曝光时产生酸与甲硅烷基醚一起产生的酸产生剂 其中R f是具有3至10个碳原子的氟代脂族基，Y是氧，SO 2，羰基或直链，X是N R 4，其中R 4是氢或具有至多6个碳原子的低级烷基或 是直链，R 1，R 2和R 3各自是具有至多6个碳原子的低级烷基，R 5是具有至多6个碳原子的低级烷基。
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