公开(公告)号：US06558869B1

公开(公告)日：2003-05-06

申请号：US09558110

申请日：2000-04-25

申请人： Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley ,  Peter Andrew Reath Bennett ,  Richard David Hoare ,  James Laurence Mulligan ,  John Andrew Hearson ,  Carole-Anne Smith ,  Stuart Bayes ,  Mark John Spowage

发明人： Christopher David McCullough ,  Kevin Barry Ray ,  Alan Stanley Monk ,  John David Riches ,  Anthony Paul Kitson ,  Gareth Rhodri Parsons ,  David Stephen Riley ,  Peter Andrew Reath Bennett ,  Richard David Hoare ,  James Laurence Mulligan ,  John Andrew Hearson ,  Carole-Anne Smith ,  Stuart Bayes ,  Mark John Spowage

IPC分类号： G03F7039

CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41M5/368 ,  B41M5/46 ,  B41M5/465 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

摘要： This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e. the “reversible insolubilizer compound”) such that the aqueous alkaline developer solubility of the composition is increased on heating and the aqueous alkaline developer solubility of the composition is not increased by incident UV radiation. The invention provides a solution to the problem of the relatively narrow solubility differential between imaged and non-imaged areas of heat sensitive positive working radiation sensitive compositions.

摘要翻译： 本发明涉及通过热模式成像来制备抗蚀剂图案的前体，前体包括热敏组合物，其热溶性在碱性显影剂的水溶液中被设置为增加加热区域， 热敏组合物的非加热区域溶解在含水碱性显影剂（“显影剂阻挡装置”）中，其中所述显影剂阻力装置包括一种或多种选自以下的化合物：（A）包括聚 （环氧烷）单元;（B）硅氧烷; 和（C）多元醇的酯，醚和酰胺，其中所述热敏组合物包含水性碱性显影剂可溶性聚合物质（即“活性聚合物”）和降低聚合物质的碱性显影剂水溶液的化合物（ 即“可逆不溶物化合物”），使得组合物的碱性显影剂水溶液在加热时增加，并且组合物的水性碱性显影剂溶解度不会因入射的紫外线辐射而增加。 本发明提供了解决热敏感正性辐射敏感组合物的成像区域和非成像区域之间相对窄的溶解度差异的问题的解决方案。

公开(公告)号：US06475698B2

公开(公告)日：2002-11-05

申请号：US09726347

申请日：2000-12-01

申请人： Alan Stanley Monk ,  James Laurence Mulligan

发明人： Alan Stanley Monk ,  James Laurence Mulligan

IPC分类号： G03F7004

CPC分类号： C08G73/0627 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  C08G73/1092 ,  G03F7/0233

摘要： Polymeric compounds for lithographic printing plates, especially plates for use in printing utilizing UV curable inks, may include a structural unit (I) wherein R1 represents an optionally-substituted cyclic or alkyl group, x represents 0 or 1 and A represents an optionally-substituted alkylene group. A range of compounds having different solubilities in selected solvents may be prepared by varying the identity or group R1. Such components may be prepared by reacting an amine of formula R1NH2 with the maleic anhydride derivative corresponding to moiety 1.

摘要翻译： 用于平版印刷版的聚合化合物，特别是用于使用UV固化油墨印刷的印版，可包括结构单元（I），其中R 1表示任选取代的环状或烷基，x表示0或1，A表示任选取代的 亚烷基。 在选择的溶剂中具有不同溶解度的一系列化合物可以通过改变同一性或基团R1来制备。 这样的组分可以通过使式R 1 NH 2的胺与对应于部分1的马来酸酐衍生物反应来制备。

公开(公告)号：US06924080B2

公开(公告)日：2005-08-02

申请号：US10445489

申请日：2003-05-27

申请人： James Laurence Mulligan ,  Eric Clark ,  David B. Bailey

发明人： James Laurence Mulligan ,  Eric Clark ,  David B. Bailey

IPC分类号： B41C1/10 ,  B41M5/40 ,  B41M5/46 ,  B41N1/08 ,  B41N1/14 ,  G03F7/004 ,  G03F7/30

CPC分类号： B41C1/1025 ,  B41C2201/04 ,  B41C2201/10 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/465 ,  B41N1/08 ,  B41N1/083 ,  B41N1/14 ,  Y10S430/145 ,  Y10S430/146

摘要： The present invention provides a processless printing plate precursor including a thermally sensitive layer applied onto a substrate. The thermally sensitive layer includes polycyanoacrylate particles having a major dimension between about 50 and about 500 nm, and a mean major dimension of no greater than about 350 nm. The printing plate precursor may be exposed to radiation and may then be developed “on press” with a suitable fountain solution.

摘要翻译： 本发明提供一种无机印刷版原版，其包括施加在基材上的热敏层。 热敏层包括主要尺寸在约50至约500nm之间的聚氰基丙烯酸酯颗粒，平均主要尺寸不大于约350nm。 印版前体可以暴露于辐射，然后可以用合适的润版液“压制”显影。

公开(公告)号：US06821709B1

公开(公告)日：2004-11-23

申请号：US10445548

申请日：2003-05-27

申请人： James Laurence Mulligan ,  Eric Clark

发明人： James Laurence Mulligan ,  Eric Clark

IPC分类号： G03F711

CPC分类号： B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  Y10S430/145 ,  Y10S430/146

摘要： The present invention provides a top coat layer for a printing plate precursor. The top coat layer includes polycyanoacrylate particles, but is substantially free of photothermal conversion material. The topcoat layer may be applied onto a thermally sensitive layer containing polycyanoacrylate particles and a photothermal conversion material. The top coat layer may reduce ablation during radiation exposure without adversely affecting printing plate performance.

摘要翻译： 本发明提供一种用于印版前体的顶涂层。 顶涂层包括聚氰基丙烯酸酯颗粒，但基本上不含光热转化材料。 面涂层可以施加到含有聚氰基丙烯酸酯颗粒和光热转换材料的热敏层上。 顶涂层可以减少辐射暴露期间的消融而不会不利地影响印刷板性能。