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    Liquid emission device
    1.
    发明授权
    Liquid emission device 失效
    液体排放装置

    公开(公告)号：US06986566B2

    公开(公告)日：2006-01-17

    申请号：US10706199

    申请日：2003-11-12

    申请人： Christopher N. Delametter ,  James M. Chwalek ,  David P. Trauernicht ,  David L. Jeanmaire

    发明人： Christopher N. Delametter ,  James M. Chwalek ,  David P. Trauernicht ,  David L. Jeanmaire

    IPC分类号： B41J2/02

    CPC分类号： B41J2/03 ,  B41J2/09 ,  B41J2002/032 ,  B41J2202/16

    摘要： An emission device for ejecting a liquid drop is provided. The device includes a body. Portions of the body define an ink delivery channel and other portions of the body define a nozzle bore. The nozzle bore is in fluid communication with the ink delivery channel. An obstruction having an imperforate surface is positioned in the ink delivery channel. The emission device can be operated in a continuous mode and/or a drop on demand mode.

    摘要翻译： 提供了一种用于喷射液滴的排放装置。 该装置包括一个主体。 本体的一部分限定了墨水输送通道，并且本体的其它部分限定了喷嘴孔。 喷嘴孔与油墨输送通道流体连通。 具有无孔表面的阻塞被定位在墨水输送通道中。 发射装置可以在连续模式和/或按需降压模式下操作。

    Fluid ejector having an anisotropic surface chamber etch
    4.
    发明授权
    Fluid ejector having an anisotropic surface chamber etch 有权
    具有各向异性表面腔蚀刻的流体喷射器

    公开(公告)号：US07213908B2

    公开(公告)日：2007-05-08

    申请号：US10911186

    申请日：2004-08-04

    申请人： James M. Chwalek ,  John A. Lebens ,  Christopher N. Delametter ,  David P. Trauernicht ,  Gary A. Kneezel

    发明人： James M. Chwalek ,  John A. Lebens ,  Christopher N. Delametter ,  David P. Trauernicht ,  Gary A. Kneezel

    IPC分类号： B41J2/05

    CPC分类号： B41J2/1601 ,  B41J2/14137 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1635 ,  B41J2/1637 ,  B41J2002/1437 ,  B41J2002/14467 ,  Y10T29/49401

    摘要： A fluid ejecting device and method of forming same are provided. The fluid ejecting device includes a substrate having a first surface and a second surface located opposite the first surface. A nozzle plate is formed over the first surface of the substrate. The nozzle plate has a nozzle through which fluid is ejected. A drop forming mechanism is situated at the periphery of the nozzle. A fluid chamber is in fluid communication with the nozzle and has a first wall and a second wall with the first wall and the second wall being positioned at an angle relative to each other. A fluid delivery channel is formed in the substrate and extends from the second surface of the substrate to the fluid chamber. The fluid delivery channel is in fluid communication with the fluid chamber. A source of fluid impedance includes a physical structure located between the nozzle and the fluid delivery channel.

    摘要翻译： 提供一种流体喷射装置及其形成方法。 流体喷射装置包括具有第一表面和与第一表面相对的第二表面的基底。 在基板的第一表面上形成喷嘴板。 喷嘴板具有喷嘴，流体被喷射通过喷嘴。 液滴形成机构位于喷嘴的周边。 流体室与喷嘴流体连通，并且具有第一壁和第二壁，其中第一壁和第二壁相对于彼此以一定角度定位。 流体输送通道形成在基底中并从基底的第二表面延伸到流体腔。 流体输送通道与流体室流体连通。 流体阻抗源包括位于喷嘴和流体输送通道之间的物理结构。

    CMOS/MEMS integrated ink jet print head and method of operating same
    5.
    发明授权
    CMOS/MEMS integrated ink jet print head and method of operating same 失效
    CMOS / MEMS集成喷墨打印头及其操作方法

    公开(公告)号：US06502925B2

    公开(公告)日：2003-01-07

    申请号：US09792114

    申请日：2001-02-22

    申请人： Constantine N. Anagnostopoulos ,  John A. Lebens ,  David P. Trauernicht ,  James M. Chwalek ,  Christopher N. Delametter

    发明人： Constantine N. Anagnostopoulos ,  John A. Lebens ,  David P. Trauernicht ,  James M. Chwalek ,  Christopher N. Delametter

    IPC分类号： B41J205

    CPC分类号： B41J2/03 ,  B41J2/105 ,  B41J2002/032 ,  B41J2202/13 ,  B41J2202/16 ,  B41J2202/22

    摘要： An ink jet print head is formed of a silicon substrate that includes an integrated circuit formed therein for controlling operation of the print head. The silicon substrate has one or more ink channels formed therein along the longitudinal direction of the nozzle array. An insulating layer or layers overlie the silicon substrate and has a series or an array of nozzle openings or bores formed therein along the length of the substrate and each nozzle opening communicates with an ink channel. The area comprising the nozzle openings forms a generally planar surface to facilitate maintenance of the printhead. A heater element is associated with each nozzle opening or bore for asymmetrically heating ink as ink passes through the nozzle opening or bore.

    摘要翻译： 喷墨打印头由硅基板形成，该硅基板包括形成在其中的集成电路，用于控制打印头的操作。 硅基板沿着喷嘴阵列的纵向方向形成有一个或多个油墨通道。 绝缘层或层叠在硅衬底上，并且沿着衬底的长度形成有一系列或阵列的喷嘴开口或孔，并且每个喷嘴开口与油墨通道连通。 包括喷嘴开口的区域形成大致平坦的表面，以便于打印头的维护。 当墨水通过喷嘴开口或孔时，加热器元件与每个喷嘴开口或孔相关联，用于不对称地加热墨。

    Fluid ejector having an anisotropic surface chamber etch
    6.
    发明授权
    Fluid ejector having an anisotropic surface chamber etch 有权
    具有各向异性表面腔蚀刻的流体喷射器

    公开(公告)号：US07836600B2

    公开(公告)日：2010-11-23

    申请号：US11685259

    申请日：2007-03-13

    申请人： James M. Chwalek ,  John A. Lebens ,  Christopher N. Delametter ,  David P. Trauernicht ,  Gary A. Kneezel

    发明人： James M. Chwalek ,  John A. Lebens ,  Christopher N. Delametter ,  David P. Trauernicht ,  Gary A. Kneezel

    IPC分类号： B23P17/00 ,  B21D53/76 ,  B41J2/14 ,  B41J2/16

    CPC分类号： B41J2/1601 ,  B41J2/14137 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1635 ,  B41J2/1637 ,  B41J2002/1437 ,  B41J2002/14467 ,  Y10T29/49401

    摘要： A method of forming a fluid chamber and a source of fluid impedance includes providing a substrate having a surface; depositing a first material layer on the surface of the substrate, the first material layer being differentially etchable with respect to the substrate; removing a portion of the first material layer thereby forming a patterned first material layer and defining the fluid chamber boundary location; depositing a sacrificial material layer over the patterned first layer; removing a portion of the sacrificial material layer thereby forming a patterned sacrificial material layer and further defining the fluid chamber boundary location; depositing at least one additional material layer over the patterned sacrificial material layer; forming a hole extending from the at least one additional material layer to the sacrificial material layer, the hole being positioned within the fluid chamber boundary location; removing the sacrificial material layer in the fluid chamber boundary location by introducing an etchant through the hole; forming the fluid chamber by introducing an etchant through the hole; and forming a source of fluid impedance.

    摘要翻译： 形成流体室和流体阻抗源的方法包括提供具有表面的基底; 在所述衬底的表面上沉积第一材料层，所述第一材料层相对于所述衬底可差分蚀刻; 去除第一材料层的一部分，从而形成图案化的第一材料层并限定流体室边界位置; 在所述图案化的第一层上沉积牺牲材料层; 去除牺牲材料层的一部分，从而形成图案化的牺牲材料层并进一步限定流体室边界位置; 在图案化的牺牲材料层上沉积至少一个附加材料层; 形成从所述至少一个附加材料层延伸到所述牺牲材料层的孔，所述孔位于所述流体室边界位置内; 通过在孔中引入蚀刻剂来除去流体室边界位置中的牺牲材料层; 通过在孔中引入蚀刻剂来形成流体室; 并形成流体阻抗源。

    CONTINUOUS FLUID JET EJECTOR WITH ANISOTROPICALLY ETCHED FLUID CHAMBERS
    7.
    发明申请
    CONTINUOUS FLUID JET EJECTOR WITH ANISOTROPICALLY ETCHED FLUID CHAMBERS 审中-公开
    连续流体喷射器，具有非均质蚀刻流体泡沫

    公开(公告)号：US20090295861A1

    公开(公告)日：2009-12-03

    申请号：US12540555

    申请日：2009-08-13

    申请人： David P. Trauernicht ,  Christopher N. Delametter ,  John A. Lebens ,  James M. Chwalek ,  Gary A. Kneezel

    发明人： David P. Trauernicht ,  Christopher N. Delametter ,  John A. Lebens ,  James M. Chwalek ,  Gary A. Kneezel

    IPC分类号： B41J2/165

    CPC分类号： B41J2/16517 ,  B41J2/03 ,  B41J2002/14467 ,  B41J2202/12

    摘要： A fluid ejection device, a method of cleaning the device, and a method of operating the device are provided. The device includes a substrate having a first surface and a second surface located opposite the first surface. A nozzle plate is formed over the first surface of the substrate and has a nozzle through which fluid is ejected. A drop forming mechanism is situated at the periphery of the nozzle. A fluid chamber is in fluid communication with the nozzle and has a first wall and a second wall. The first wall and the second wall are positioned at an angle other than 90° relative to each other. A fluid delivery channel is formed in the substrate and extends from the second surface of the substrate to the fluid chamber. The fluid delivery channel is in fluid communication with the fluid chamber.

    摘要翻译： 提供流体喷射装置，清洁装置的方法以及操作装置的方法。 该装置包括具有第一表面和与该第一表面相对的第二表面的基底。 喷嘴板形成在基板的第一表面上，并且具有喷嘴，流体被喷射通过该喷嘴。 液滴形成机构位于喷嘴的周边。 流体室与喷嘴流体连通并且具有第一壁和第二壁。 第一壁和第二壁相对于彼此以不同于90°的角度定位。 流体输送通道形成在基底中并从基底的第二表面延伸到流体腔。 流体输送通道与流体室流体连通。

    Substrate etching method for forming connected features
    8.
    发明授权
    Substrate etching method for forming connected features 有权
    用于形成连接特征的基板蚀刻方法

    公开(公告)号：US07354522B2

    公开(公告)日：2008-04-08

    申请号：US10911183

    申请日：2004-08-04

    申请人： Gary A. Kneezel ,  John A. Lebens ,  Christopher N. Delametter ,  David P. Trauernicht ,  James M. Chwalek

    发明人： Gary A. Kneezel ,  John A. Lebens ,  Christopher N. Delametter ,  David P. Trauernicht ,  James M. Chwalek

    IPC分类号： H01L21/311 ,  B44C1/22

    CPC分类号： B41J2/16 ,  B41J2/1628 ,  B41J2/1632 ,  B41J2/1639 ,  B41J2002/14403

    摘要： A method of etching a substrate and an article(s) formed using the method are provided. The method includes providing a substrate; coating a region of the substrate with a temporary material having properties that enable the temporary material to remain substantially intact during subsequent processing and enable the temporary material to be removed by a subsequent process that allows the substrate to remain substantially unaltered; removing a portion of the substrate to form a feature, at least some of the removed portion of the substrate overlapping at least a portion of the coated region of the substrate while allowing the temporary material substantially intact; and removing the temporary material while allowing the substrate to remain substantially unaltered.

    摘要翻译： 提供了使用该方法形成的蚀刻基板和制品的方法。 该方法包括提供基板; 用临时材料涂覆基材的区域，所述临时材料具有使得临时材料能够在随后的处理期间保持基本上完整的，并且使临时材料能够通过允许基材保持基本上不变的后续工艺来除去; 去除衬底的一部分以形成特征，衬底的至少部分被去除的部分与衬底的涂覆区域的至少一部分重叠，同时允许临时材料基本上完整; 并且移除临时材料同时允许基底基本上保持不变。

    Liquid drop ejection using dual feed ejector
    10.
    发明授权
    Liquid drop ejection using dual feed ejector 有权
    使用双进料喷射器进行液滴喷射

    公开(公告)号：US08591008B2

    公开(公告)日：2013-11-26

    申请号：US13300723

    申请日：2011-11-21

    申请人： Christopher N. Delametter ,  John A. Lebens ,  David P. Trauernicht ,  James M. Chwalek ,  Yonglin Xie ,  Gary A. Kneezel ,  Christopher R. Morton ,  Cathie J. Burke

    发明人： Christopher N. Delametter ,  John A. Lebens ,  David P. Trauernicht ,  James M. Chwalek ,  Yonglin Xie ,  Gary A. Kneezel ,  Christopher R. Morton ,  Cathie J. Burke

    IPC分类号： B41J2/05 ,  B41J2/14 ,  B41J2/04

    CPC分类号： H04L43/12 ,  H04L43/0864

    摘要： A printer includes a printhead die including liquid ejectors separated by walls. Each liquid ejector includes a nozzle orifice and an associated drop forming mechanism. First and second liquid feed channels, extending in opposite directions, are in fluid communication with each liquid ejector. A liquid inlet includes a plurality of first and second segments in fluid communication with the first liquid feed channels and the second liquid feed channels, respectively. The first and second segments are located on opposite sides of the nozzle orifice. For a given liquid ejector, both of the first and second segments are directly in line with the liquid ejector. An electrical lead extends from each drop forming mechanism toward an edge of the printhead die. At least one of the electrical leads is positioned between neighboring segments of at least one of the first and second segments of the liquid inlet.

    摘要翻译： 一种打印机包括一个包括由墙壁分开的​​液体喷射器的打印头模头。 每个液体喷射器包括喷嘴孔和相关的液滴形成机构。 沿相反方向延伸的第一和第二液体供给通道与每个液体喷射器流体连通。 液体入口包括分别与第一液体进料通道和第二液体进料通道流体连通的多个第一和第二部分。 第一和第二段位于喷嘴孔的相对侧上。 对于给定的液体喷射器，第一和第二段两者直接与液体喷射器成一直线。 电引线从每个液滴形成机构朝向打印头芯片的边缘延伸。 电引线中的至少一个位于液体入口的第一和第二段中的至少一个的相邻段之间。