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1.发明授权公开(公告)号：US06429667B1
公开(公告)日：2002-08-06
申请号：US09597921
申请日：2000-06-19
IPC分类号： G01R2708
CPC分类号： G01R19/0061 , G01R31/2831
摘要： A monitor for electrically testing energy beam dose or focus of a layer formed on a substrate by lithographic processing. The monitor comprises a substrate having in a lithographically formed layer an array of electrically conductive elements comprising a plurality of spaced, substantially parallel elements having a length and a width, with the individual elements being electrically connected, and the lengths of the elements being sensitive to dose and focus of an energy beam in lithographically forming the layer. The monitor further includes at least one pad electrically connected to the array to apply current through the array elements. Upon applying a voltage across the array elements, the suitability of dose or focus of the lithographically formed layer may be determined by the resistance of the array. Preferably, ends of the individual elements are aligned along essentially straight lines to form an array edge.
摘要翻译： 用于通过光刻处理对形成在衬底上的层的电子束剂量或焦点进行电学测试的监视器。 监测器包括在光刻形成的层中具有导电元件的阵列的衬底，所述导电元件包括多个间隔开的基本上平行的具有长度和宽度的元件，其中各个元件被电连接，并且元件的长度对 在光刻形成层中的能量束的剂量和焦点。 该监视器还包括至少一个焊盘，电连接到该阵列以通过阵列元件施加电流。 在跨阵列元件施加电压时，光刻形成层的剂量或焦点的适用性可以由阵列的电阻确定。 优选地，各个元件的端部沿着基本上的直线对准以形成阵列边缘。
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公开(公告)号：US6127686A
公开(公告)日：2000-10-03
申请号：US229087
申请日：1999-01-11
CPC分类号： H01L21/67069 , G03F7/168 , G03F7/2024 , G03F7/2026
摘要： The present invention utilizes a sub-threshold exposure step on an optically sensitive resist that is applied to a semiconductor wafer to thin the resist below the thickness which can be achieved by normal spinning and/or thinning techniques. Furthermore, the thinned resist can be re-expose to UV energies so as to develop patterns on the surface of the semiconductor wafer. An apparatus for vibrating and rotating the resist during the sub-threshold step is also disclosed herein.
摘要翻译： 本发明利用在光敏抗蚀剂上施加的亚阈值曝光步骤，其被施加到半导体晶片上以将抗蚀剂薄化到低于可以通过正常纺丝和/或变薄技术实现的厚度。 此外，减薄的抗蚀剂可以再暴露于UV能量，以便在半导体晶片的表面上形成图案。 本文还公开了一种用于在次阈值步骤期间使抗蚀剂振动和旋转的装置。
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3.发明授权Apparatus and method for in-situ adjustment of light transmission in a photolithography process 失效用于在光刻工艺中原位调节光透射的装置和方法
公开(公告)号：US6163367A
公开(公告)日：2000-12-19
申请号：US116395
申请日：1998-07-16
CPC分类号： G03F7/70566 , G03F1/29 , G03F7/70558
摘要： An adjustable, in-situ photolithography process is taught, where incident exposure light is passed through two polarizers; the first polarizer capable of altering its polarization direction, during exposure, relative to the polarization direction of the second polarizer, in order to enhance the contrast of a patterned image projected on a semiconductor wafer. The second polarizer in the optical train is a photo mask transparent substrate impregnated with colloidal crystals that are aligned in a fixed, predetermined direction by magnetic field. The photo mask may also contain a silicon compound for phase shifting the incident exposure light to further enhance the image contrast.
摘要翻译： 教导了可调的原位光刻工艺，其中入射的曝光光通过两个偏振器; 为了增强投射在半导体晶片上的图案化图像的对比度，第一偏振器能够在曝光期间相对于第二偏振器的偏振方向改变其偏振方向。 光学系列中的第二偏振器是用胶体晶体浸渍的光掩模透明基底，其通过磁场以固定的预定方向排列。 光掩模还可以包含硅化合物，用于使入射曝光光相移，以进一步增强图像对比度。
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公开(公告)号：US5905019A
公开(公告)日：1999-05-18
申请号：US943089
申请日：1997-09-26
CPC分类号： H01L21/67069 , G03F7/168 , G03F7/2024 , G03F7/2026
摘要： The present invention utilizes a sub-threshold exposure step on an optically sensitive resist that is applied to a semiconductor wafer to thin the resist below the thickness which can be achieved by normal spinning and/or thinning techniques. Furthermore, the thinned resist can be re-expose to UV energies so as to develop patterns on the surface of the semiconductor wafer. An apparatus for vibrating and rotating the resist during the sub-threshold step is also disclosed herein.
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公开(公告)号：US20090112834A1
公开(公告)日：2009-04-30
申请号：US11931108
申请日：2007-10-31
IPC分类号： G06F17/30
CPC分类号： G06F17/211 , G06F17/214 , G06F17/2765 , G06F17/277 , G06F17/2785
摘要： An exemplary method for determining emotive tone in text, the method comprising, matching text in a text file with text entries in a control file database, wherein the formatting attributes include textual and non-textual indicators, receiving a first set of emotive values associated with the matching text entries from the control file database, calculating an emotive score with the first set of emotive values, assigning the emotive score to the text file, and displaying the emotive score of the text file.
摘要翻译： 用于确定文本中的情绪音调的示例性方法，所述方法包括：将文本文件中的文本与控制文件数据库中的文本条目相匹配，其中所述格式化属性包括文本和非文本指示符，接收与第 来自控制文件数据库的匹配文本条目，使用第一组感情值计算感情分数，将感情分数分配给文本文件，以及显示文本文件的情感评分。
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公开(公告)号：US06176967B1
公开(公告)日：2001-01-23
申请号：US09154271
申请日：1998-09-16
IPC分类号： C23F102
CPC分类号： H01J37/32623 , C23F4/00
摘要： Disclosed are shielding platters for semiconductor wafers, and more particularly a reactive ion etch (RIE) chamber wafer masking system, wherein a mechanical mask facilitates the implementation of multiple etches on a single semiconductor wafer.
摘要翻译： 公开了用于半导体晶片的屏蔽盘，更具体地，涉及一种反应离子蚀刻（RIE）室晶片掩蔽系统，其中机械掩模有助于在单个半导体晶片上实现多个蚀刻。
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