摘要:
An active matrix substrate includes a substrate and an insulating unit arranged on the substrate. The substrate includes a display region and a periphery circuit region beside the display region. The periphery circuit region has at least a chip connecting unit. Each chip connecting unit includes a number of connecting elements. Each of the connecting elements includes a conducting pad and a wire electrically connected to the conducting pad. The conducting pads of the connecting elements are arranged in at least two rows. The insulating unit has a number of contact holes corresponding to the conducting pads so that each of the conducting pads is entirely exposed by the corresponding contact hole. The active matrix substrate is applied to a display device to increase reliability of the display device and improve the quality of the display device.
摘要:
A display device structure includes a substrate having an active region and an electrostatic protection circuit region. The first metal layer, the first insulation layer, and an amorphous silicon layer are sequentially disposed on the substrate; the first opening passes through the first insulation layer for exposing part of the first metal layer. The second metal layer, disposed on the first insulation layer or the amorphous silicon layer, fills the first opening to contact with the first metal layer; the second insulation layer and the flat layer are disposed on the second metal layer, in which the region of the flat layer is overlapped the electrostatic protection circuit region. The second opening passes through the second insulation layer and the flat layer for exposing the second metal layer, in which the third metal layer fills the second opening to contact with the second metal layer.
摘要:
A multi-channel thin film transistor structure including a first conducting layer, an insulating layer, a semiconductor layer and a second conducting layer is provided. The first conducting layer formed on a substrate includes a gate electrode. The insulating layer covers the first conducting layer. The semiconductor layer formed on the insulating layer includes a plurality of semiconductor islands located above the gate electrode. The second conducting layer formed on the insulating layer and on the semiconductor layer includes a source electrode and a drain electrode. Each one of the semiconductor islands is coupled electrically with the source electrode at one end and coupled electrically with the drain electrode at the other end.