摘要:
A thin film transistor is provided, including a substrate, a gate, a first dielectric layer, a channel layer, a source/drain and a second dielectric layer. The gate is disposed on the substrate, and the gate and the substrate are covered with the first dielectric layer. The channel layer is at least disposed on the first dielectric layer above the gate. The source/drain is disposed on the channel layer. The source/drain includes a first barrier layer, a conductive layer and a second barrier layer. The first barrier layer is disposed between the conductive layer and the channel layer. The conductive layer is covered with the first barrier layer and the second barrier layer. The source/drain is covered with the second dielectric layer. Accordingly, the variation of electric characters can be reduced. Moreover, a method for fabricating a thin film transistor is also provided.
摘要:
A thin film transistor is provided, including a substrate, a gate, a first dielectric layer, a channel layer, a source/drain and a second dielectric layer. The gate is disposed on the substrate, and the gate and the substrate are covered with the first dielectric layer. The channel layer is at least disposed on the first dielectric layer above the gate. The source/drain is disposed on the channel layer. The source/drain includes a first barrier layer, a conductive layer and a second barrier layer. The first barrier layer is disposed between the conductive layer and the channel layer. The conductive layer is covered with the first barrier layer and the second barrier layer. The source/drain is covered with the second dielectric layer. Accordingly, the variation of electric characters can be reduced. Moreover, a method for fabricating a thin film transistor is also provided.
摘要:
A thin film transistor is provided, including a substrate, a gate, a first dielectric layer, a channel layer, a source/drain and a second dielectric layer. The gate is disposed on the substrate, and the gate and the substrate are covered with the first dielectric layer. The channel layer is at least disposed on the first dielectric layer above the gate. The source/drain is disposed on the channel layer. The source/drain includes a first barrier layer, a conductive layer and a second barrier layer. The first barrier layer is disposed between the conductive layer and the channel layer. The conductive layer is covered with the first barrier layer and the second barrier layer. The source/drain is covered with the second dielectric layer. Accordingly, the variation of electric characters can be reduced. Moreover, a method for fabricating a thin film transistor is also provided.
摘要:
A thin film transistor is provided, including a substrate, a gate, a first dielectric layer, a channel layer, a source/drain and a second dielectric layer. The gate is disposed on the substrate, and the gate and the substrate are covered with the first dielectric layer. The channel layer is at least disposed on the first dielectric layer above the gate. The source/drain is disposed on the channel layer. The source/drain includes a first barrier layer, a conductive layer and a second barrier layer. The first barrier layer is disposed between the conductive layer and the channel layer. The conductive layer is covered with the first barrier layer and the second barrier layer. The source/drain is covered with the second dielectric layer. Accordingly, the variation of electric characters can be reduced. Moreover, a method for fabricating a thin film transistor is also provided.
摘要:
An organic electroluminescence device comprising a plurality of first electrodes, a plurality of first auxiliary electrodes, a plurality of second auxiliary electrodes, a plurality of organic emitting patterns and a plurality of second electrodes is provided. The first electrodes are arranged on a substrate. The first auxiliary electrodes are disposed on at least one edge of the substrate, wherein each first auxiliary electrode is electrically connected with each first electrode. The second auxiliary electrodes are disposed on another edge of the substrate, wherein the first auxiliary electrodes and the second auxiliary electrodes are constituted of a double layer of an aluminium-neodymium (Al—Nd) alloy layer and an aluminium-neodymium nitride layer. The organic emitting patterns are arranged over the first electrodes. The second electrodes are arranged over the organic emitting patterns, wherein each second electrode is electrically connected to each second auxiliary electrode.
摘要:
A method for fabricating a cover plate of an organic electroluminescent device comprising the following steps is provided. First, a substrate is provided, wherein the substrate has a bonding region. Then, a liquid-state desiccant layer is formed on the substrate, wherein the liquid-state desiccant layer is surrounded by the bonding region. Next, the liquid-state desiccant layer is cured to form a desiccant layer. Then, the bonding region of the substrate is cleaned. As mentioned above, the contaminants on the bonding region can be drastically reduced. Moreover, an organic electroluminescent device and a cover plate thereof are also provided.
摘要:
An etching apparatus, for etching copper or silver, which includes a hydrogen peroxide tank, an ammonium hydroxide tank, a water tank, an etching tank, a piping system and a temperature control device, is provided. The piping system connects the hydrogen peroxide tank, the ammonium hydroxide tank, the water tank to the etching tank, and the temperature control device is disposed around the hydrogen peroxide tank, the ammonium hydroxide tank and the etching tank to maintain the temperatures of them below the room temperature and above 12 degree centigrade. An etching process is also provided. First, hydrogen peroxide and ammonium hydroxide having a temperature in a temperature-range below the room temperature and above 12 degree centigrade, is provided. Then, water, hydrogen peroxide and ammonium hydroxide are mixed to be an etchant with a temperature maintained in said temperature temperature-range. Next, the etchant is utilized for etching copper or silver.
摘要:
A sensing system is provided in the present application. The sensing system includes a plurality of input areas, by each of which an input is received and an input signal is generated; and a processing device electrically coupled with the each of the plurality of input areas and performing a validation criterion for determining a means processing the input signal.