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    ELECTROPHORETIC DISPLAY AND DRIVING METHOD THEREOF
    1.
    发明申请
    ELECTROPHORETIC DISPLAY AND DRIVING METHOD THEREOF 审中-公开
    电泳显示及其驱动方法

    公开(公告)号：US20120001957A1

    公开(公告)日：2012-01-05

    申请号：US13172844

    申请日：2011-06-30

    申请人： Chun-Ting Liu ,  Hsu-Ping Tseng ,  Chi-Mao Hung ,  Wei-Min Sun ,  Wen-Pin Chiu ,  Pei-Lin Tien ,  Yan-Liang Wu ,  Ying Hua Hsu

    发明人： Chun-Ting Liu ,  Hsu-Ping Tseng ,  Chi-Mao Hung ,  Wei-Min Sun ,  Wen-Pin Chiu ,  Pei-Lin Tien ,  Yan-Liang Wu ,  Ying Hua Hsu

    IPC分类号： G09G5/10 ,  G09G3/34

    CPC分类号： G09G3/344 ,  G09G3/2044 ,  G09G2360/16

    摘要： An electrophoretic display and a driving method thereof are provided. The electrophoretic display includes a display panel, a storage unit and a timing controller. The display panel has a plurality of sub pixels. The storage unit stores a plurality of sets of multiple-grayscale driving waveforms, in which the driving voltage scales of driving waveforms corresponding to a same grayscale in the sets of multiple-grayscale driving waveforms are different from each other. The timing controller is coupled to the storage unit and the display panel and receives an image signal, and when the image signal transmits a multiple-grayscale frame, the timing controller sequentially adopts the sets of multiple-grayscale driving waveforms to drive the sub pixels.

    摘要翻译： 提供电泳显示器及其驱动方法。 电泳显示器包括显示面板，存储单元和定时控制器。 显示面板具有多个子像素。 存储单元存储多组多灰阶驱动波形，其中在多个灰度级驱动波形的集合中对应于相同灰度的驱动波形的驱动电压标度彼此不同。 定时控制器耦合到存储单元和显示面板并接收图像信号，并且当图像信号发送多灰阶帧时，定时控制器顺序地采用多个灰阶驱动波形的集合来驱动子像素。

    Method for compensating proximity effects of particle beam lithography processes
    4.
    发明授权
    Method for compensating proximity effects of particle beam lithography processes 有权
    用于补偿粒子束光刻工艺的邻近效应的方法

    公开(公告)号：US08539392B2

    公开(公告)日：2013-09-17

    申请号：US13399096

    申请日：2012-02-17

    申请人： Kuen-Yu Tsai ,  Chun-Hung Liu ,  Philip C. W. Ng ,  Pei-Lin Tien

    发明人： Kuen-Yu Tsai ,  Chun-Hung Liu ,  Philip C. W. Ng ,  Pei-Lin Tien

    IPC分类号： G06F17/50

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J2237/31769

    摘要： A method for compensating proximity effects of particle beam lithography processes is provided. The method includes the following steps. A control pattern is provided. A dissection process is provided. A set of control points are provided. The control pattern is defined as an input pattern of a lithography process. A target pattern is provided. A set of target points are produced. A set of target measurement values are provided. An actual pattern is defined. A set of actual measurement values are provided. A set of comparison values are calculated. An adjusting strategy is provided. A corrected pattern is produced. The corrected pattern is defined as an updated input of the lithography process.

    摘要翻译： 提供了一种用于补偿粒子束光刻工艺的邻近效应的方法。 该方法包括以下步骤。 提供控制模式。 提供解剖过程。 提供一组控制点。 控制图形被定义为光刻工艺的输入图案。 提供目标模式。 产生一组目标点。 提供一组目标测量值。 定义了一个实际的模式。 提供一组实际测量值。 计算一组比较值。 提供调整策略。 产生校正图案。 校正图案被定义为光刻工艺的更新输入。

    METHOD FOR COMPENSATING PROXIMITY EFFECTS OF PARTICLE BEAM LITHOGRAPHY PROCESSES
    5.
    发明申请
    METHOD FOR COMPENSATING PROXIMITY EFFECTS OF PARTICLE BEAM LITHOGRAPHY PROCESSES 有权
    用于补偿颗粒束​​光刻过程的近似效应的方法

    公开(公告)号：US20120221983A1

    公开(公告)日：2012-08-30

    申请号：US13399096

    申请日：2012-02-17

    申请人： Kuen-Yu Tsai ,  Chun-Hung Liu ,  Philip C.W. Ng ,  Pei-Lin Tien

    发明人： Kuen-Yu Tsai ,  Chun-Hung Liu ,  Philip C.W. Ng ,  Pei-Lin Tien

    IPC分类号： G06F17/50

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J2237/31769

    摘要： A method for compensating proximity effects of particle beam lithography processes is provided. The method includes the following steps. A control pattern is provided. A dissection process is provided. A set of control points are provided. The control pattern is defined as an input pattern of a lithography process. A target pattern is provided. A set of target points are produced. A set of target measurement values are provided. An actual pattern is defined. A set of actual measurement values are provided. A set of comparison values are calculated. An adjusting strategy is provided. A corrected pattern is produced. The corrected pattern is defined as an updated input of the lithography process.

    摘要翻译： 提供了一种用于补偿粒子束光刻工艺的邻近效应的方法。 该方法包括以下步骤。 提供控制模式。 提供解剖过程。 提供一组控制点。 控制图形被定义为光刻工艺的输入图案。 提供目标模式。 产生一组目标点。 提供一组目标测量值。 定义了一个实际的模式。 提供一组实际测量值。 计算一组比较值。 提供调整策略。 产生校正图案。 校正图案被定义为光刻工艺的更新输入。