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1.发明授权公开(公告)号：US07824249B2
公开(公告)日：2010-11-02
申请号：US11702217
申请日：2007-02-05
CPC分类号： B24B37/26 , B24D11/001
摘要： The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The polymer elastic body covers the base material and the polishing particles, whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid scratching of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces.
摘要翻译： 本发明涉及具有抛光颗粒的抛光材料及其制造方法。 具有抛光颗粒的抛光材料包括基材，多个抛光颗粒和聚合物弹性体。 基材具有用于限定多个网格空间的多根纤维。 抛光颗粒分布在网格空间中。 聚合物弹性体覆盖基材和抛光颗粒，由此在抛光过程中抛光颗粒均匀地分布在抛光工件的表面上。 此外，基材防止抛光颗粒接触抛光工件，以避免抛光工件的刮擦。 此外，基材提供了用于扫掠小磨碎片的效果。
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2.发明申请公开(公告)号：US20080188168A1
公开(公告)日：2008-08-07
申请号：US11702217
申请日：2007-02-05
IPC分类号： B24D11/00
CPC分类号： B24B37/26 , B24D11/001
摘要： The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a high polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The high polymer elastic body covers the base material and the polishing particles. Whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid the scratch of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces.
摘要翻译： 本发明涉及具有抛光颗粒的抛光材料及其制造方法。 具有抛光颗粒的抛光材料包括基材，多个抛光颗粒和高聚合物弹性体。 基材具有用于限定多个网格空间的多根纤维。 抛光颗粒分布在网格空间中。 高分子弹性体覆盖基材和抛光颗粒。 由此，抛光粒子在研磨工序中均匀地分布在研磨工件的表面上。 此外，基材防止抛光颗粒接触抛光工件，以避免抛光工件的划痕。 此外，基材提供了用于扫掠小磨碎片的效果。
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3.发明授权公开(公告)号：US08485869B2
公开(公告)日：2013-07-16
申请号：US12889553
申请日：2010-09-24
CPC分类号： B24B37/26 , B24D11/001
摘要： The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The polymer elastic body covers the base material and the polishing particles. Whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid the scratch of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces.
摘要翻译： 本发明涉及具有抛光颗粒的抛光材料及其制造方法。 具有抛光颗粒的抛光材料包括基材，多个抛光颗粒和聚合物弹性体。 基材具有用于限定多个网格空间的多根纤维。 抛光颗粒分布在网格空间中。 聚合物弹性体覆盖基材和抛光颗粒。 由此，抛光粒子在研磨工序中均匀地分布在研磨工件的表面上。 此外，基材防止抛光颗粒接触抛光工件，以避免抛光工件的划痕。 此外，基材提供了用于扫掠小磨碎片的效果。
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公开(公告)号：US09862071B2
公开(公告)日：2018-01-09
申请号：US12887363
申请日：2010-09-21
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang
CPC分类号： B24B37/24
摘要： The present invention relates to a method for manufacturing a polishing pad. The method of the invention includes the steps of forming a polishing layer from a polyurethane solution has a solid content more than about 90 wt % and drying the polyurethane solution at a temperature from about 130° C. to about 170° C. The invention also provides a polishing pad manufactured by the method mentioned above. The defect of scraping the surface of the substrate to be polished due to polishing particles remaining is avoided when applying the polishing pad according to the invention, and the flatness of the substrate to be polished is raised and the defective rate is eliminated also.
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公开(公告)号：US08414669B2
公开(公告)日：2013-04-09
申请号：US12883446
申请日：2010-09-16
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
IPC分类号： B24D11/00
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a first membrane with low permeability; a two-component paste formed on the upper surface of the first membrane with low permeability for adhering the base material to the first membrane with low permeability; and a polyurethane paste formed on the lower surface of the first membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 具有低渗透性的第一膜; 在所述第一膜的上表面上形成低渗透性的双组分糊料，用于将所述基材粘附到所述第一膜，所述第一膜具有低渗透性; 以及形成在第一膜的下表面上的低渗透性的聚氨酯浆料。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。 如上所述的抛光垫防止抛光垫从抛光台板或头部分离。 抛光垫易于更换，而不会在研磨台板或头部上留下残留物。
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公开(公告)号：US20080299879A1
公开(公告)日：2008-12-04
申请号：US11754418
申请日：2007-05-29
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; a two-component paste formed on the upper surface of the membrane with low permeability for adhering the base material to the membrane with low permeability; and a polyurethane paste formed on the lower surface of the membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 在膜的上表面形成低渗透性的双组分糊料，用于将基底材料以低渗透性粘附到膜上; 以及形成在膜的下表面上的低渗透性的聚氨酯浆料。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。 如上所述的抛光垫防止抛光垫从抛光台板或头部分离。 抛光垫易于更换，而不会在研磨台板或头部上留下残留物。
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7.发明授权公开(公告)号：US08765259B2
公开(公告)日：2014-07-01
申请号：US12907382
申请日：2010-10-19
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
CPC分类号： B24B9/146 , B24B37/30 , B24B41/068 , C08J5/128 , C08J2323/06 , C08J2323/12 , C08J2327/06 , C08J2375/04 , C09J5/06 , C09J2423/046 , C09J2423/106 , C09J2427/006 , C09J2475/006
摘要： The present invention relates to a carrier film for mounting a polishing workpiece. The carrier film comprises a surface substrate and a buffer substrate. The surface substrate consists of first elastomer, the first elastomer comprising a plurality of first holes; wherein the first holes have a drop shape, and each of the first holes has an opening. The buffer substrate consists of second elastomer, the second elastomer comprising a plurality of second holes. The surface substrate and the buffer substrate are adhered with adhesive comprising the first or the second elastomer. A method for making the carrier film is also provided. When polishing, the carrier film provides a good buffer property to conduct and release down force applied on the polishing workpiece.
摘要翻译： 本发明涉及一种用于安装抛光工件的载体膜。 载体膜包括表面基板和缓冲基板。 所述表面基板由第一弹性体构成，所述第一弹性体包括多个第一孔; 其中所述第一孔具有液滴形状，并且每个所述第一孔具有开口。 缓冲衬底由第二弹性体组成，第二弹性体包括多个第二孔。 表面基材和缓冲基材用包含第一或第二弹性体的粘合剂粘合。 还提供了制造载体膜的方法。 当抛光时，载体膜提供良好的缓冲性能以传导和释放施加在抛光工件上的下压力。
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公开(公告)号：US20110000141A1
公开(公告)日：2011-01-06
申请号：US12883446
申请日：2010-09-16
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a first membrane with low permeability; a two-component paste formed on the upper surface of the first membrane with low permeability for adhering the base material to the first membrane with low permeability; and a polyurethane paste formed on the lower surface of the first membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 具有低渗透性的第一膜; 在所述第一膜的上表面上形成低渗透性的双组分糊料，用于将所述基材粘附到所述第一膜，所述第一膜具有低渗透性; 以及形成在第一膜的下表面上的低渗透性的聚氨酯浆料。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。 如上所述的抛光垫防止抛光垫从抛光台板或头部分离。 抛光垫易于更换，而不会在研磨台板或头部上留下残留物。
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公开(公告)号：US07815491B2
公开(公告)日：2010-10-19
申请号：US11754418
申请日：2007-05-29
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; a two-component paste formed on the upper surface of the membrane with low permeability for adhering the base material to the membrane with low permeability; and a polyurethane paste formed on the lower surface of the membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 在膜的上表面形成低渗透性的双组分糊料，用于将基底材料以低渗透性粘附到膜上; 以及形成在膜的下表面上的低渗透性的聚氨酯浆料。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。 如上所述的抛光垫防止抛光垫从抛光台板或头部分离。 抛光垫易于更换，而不会在抛光台板或头部上留下残留物。
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公开(公告)号：US07556555B2
公开(公告)日：2009-07-07
申请号：US11706189
申请日：2007-02-15
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.
摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 以及在所述基材和所述膜的上表面之间形成的低渗透性并嵌入所述基材的纤维中的缓冲层。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。
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