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公开(公告)号：US08491359B2
公开(公告)日：2013-07-23
申请号：US12862098
申请日：2010-08-24
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
CPC分类号： B24B37/22 , B24D18/00 , Y10T428/24983 , Y10T428/249981
摘要： The present invention relates to a polishing pad that comprises a polishing sheet for polishing a substrate, a buffer sheet comprising a plurality of holes, and adhesive for adhering the buffer sheet to the polishing sheet; wherein the adhesive is formed by polymerizing macromolecules with fluidity. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad described above are also provided.
摘要翻译： 抛光垫技术领域本发明涉及一种抛光垫，其包括用于研磨基板的抛光片，包括多个孔的缓冲片和用于将缓冲片粘附到抛光片的粘合剂; 其中所述粘合剂通过聚合具有流动性的大分子形成。 还提供了一种抛光包括使用抛光垫的基板的方法和用于制造上述抛光垫的方法。
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公开(公告)号：US20110045744A1
公开(公告)日：2011-02-24
申请号：US12862098
申请日：2010-08-24
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
CPC分类号： B24B37/22 , B24D18/00 , Y10T428/24983 , Y10T428/249981
摘要： The present invention relates to a polishing pad that comprises a polishing sheet for polishing a substrate, a buffer sheet comprising a plurality of holes, and adhesive for adhering the buffer sheet to the polishing sheet; wherein the adhesive is formed by polymerizing macromolecules with fluidity. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad described above are also provided.
摘要翻译： 抛光垫技术领域本发明涉及一种抛光垫，其包括用于研磨基板的抛光片，包括多个孔的缓冲片和用于将缓冲片粘附到抛光片的粘合剂; 其中所述粘合剂通过聚合具有流动性的大分子形成。 还提供了一种抛光包括使用抛光垫的基板的方法和用于制造上述抛光垫的方法。
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3.发明申请Carrier film for mounting polishing workpiece and method for making the same 审中-公开用于安装抛光工件的载体膜及其制造方法公开(公告)号：US20080200105A1
公开(公告)日：2008-08-21
申请号：US11706226
申请日：2007-02-15
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
CPC分类号： C09J5/06 , B24B9/146 , B24B37/30 , B24B41/068 , C09J2423/006 , C09J2427/006 , C09J2475/006
摘要： The present invention relates to a carrier film for mounting a polishing workpiece. The carrier film comprises a surface substrate and a buffer substrate. The surface substrate comprises holes, and the material of the surface substrate comprises elastomer. The buffer substrate comprises holes, and the material of the buffer substrate comprises the elastomer. The surface substrate and the buffer substrate are adhered with adhesive comprising the elastomer. A method for making the carrier film is also provided. When polishing, the carrier film provides a good buffer property to conduct and release down force applied on the polishing workpiece.
摘要翻译： 本发明涉及一种用于安装抛光工件的载体膜。 载体膜包括表面基板和缓冲基板。 表面基材包括孔，表面基材的材料包括弹性体。 缓冲基板包括孔，缓冲基板的材料包括弹性体。 表面基板和缓冲基板用包含弹性体的粘合剂粘合。 还提供了制造载体膜的方法。 当抛光时，载体膜提供良好的缓冲性能以传导和释放施加在抛光工件上的下压力。
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公开(公告)号：US09862071B2
公开(公告)日：2018-01-09
申请号：US12887363
申请日：2010-09-21
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang
CPC分类号： B24B37/24
摘要： The present invention relates to a method for manufacturing a polishing pad. The method of the invention includes the steps of forming a polishing layer from a polyurethane solution has a solid content more than about 90 wt % and drying the polyurethane solution at a temperature from about 130° C. to about 170° C. The invention also provides a polishing pad manufactured by the method mentioned above. The defect of scraping the surface of the substrate to be polished due to polishing particles remaining is avoided when applying the polishing pad according to the invention, and the flatness of the substrate to be polished is raised and the defective rate is eliminated also.
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公开(公告)号：US08414669B2
公开(公告)日：2013-04-09
申请号：US12883446
申请日：2010-09-16
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
IPC分类号： B24D11/00
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a first membrane with low permeability; a two-component paste formed on the upper surface of the first membrane with low permeability for adhering the base material to the first membrane with low permeability; and a polyurethane paste formed on the lower surface of the first membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 具有低渗透性的第一膜; 在所述第一膜的上表面上形成低渗透性的双组分糊料，用于将所述基材粘附到所述第一膜，所述第一膜具有低渗透性; 以及形成在第一膜的下表面上的低渗透性的聚氨酯浆料。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。 如上所述的抛光垫防止抛光垫从抛光台板或头部分离。 抛光垫易于更换，而不会在研磨台板或头部上留下残留物。
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公开(公告)号：US20080299879A1
公开(公告)日：2008-12-04
申请号：US11754418
申请日：2007-05-29
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; a two-component paste formed on the upper surface of the membrane with low permeability for adhering the base material to the membrane with low permeability; and a polyurethane paste formed on the lower surface of the membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 在膜的上表面形成低渗透性的双组分糊料，用于将基底材料以低渗透性粘附到膜上; 以及形成在膜的下表面上的低渗透性的聚氨酯浆料。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。 如上所述的抛光垫防止抛光垫从抛光台板或头部分离。 抛光垫易于更换，而不会在研磨台板或头部上留下残留物。
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公开(公告)号：US20110070814A1
公开(公告)日：2011-03-24
申请号：US12887363
申请日：2010-09-21
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang
CPC分类号： B24B37/24
摘要： The present invention relates to a method for manufacturing a polishing pad. The method of the invention includes the steps of forming a polishing layer from a polyurethane solution has a solid content more than about 90 wt % and drying the polyurethane solution at a temperature from about 130° C. to about 170° C. The invention also provides a polishing pad manufactured by the method mentioned above. The defect of scraping the surface of the substrate to be polished due to polishing particles remaining is avoided when applying the polishing pad according to the invention, and the flatness of the substrate to be polished is raised and the defective rate is eliminated also.
摘要翻译： 本发明涉及一种抛光垫的制造方法。 本发明的方法包括从聚氨酯溶液形成抛光层的步骤，其固体含量大于约90重量％，并在约130℃至约170℃的温度下干燥聚氨酯溶液。本发明还 提供通过上述方法制造的抛光垫。 当应用根据本发明的抛光垫时，避免了由于抛光颗粒残留而刮擦待抛光的基板的表面的缺陷，并且抛光的基板的平坦度提高并且不良率也被消除。
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8.发明授权公开(公告)号：US08485869B2
公开(公告)日：2013-07-16
申请号：US12889553
申请日：2010-09-24
CPC分类号： B24B37/26 , B24D11/001
摘要： The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The polymer elastic body covers the base material and the polishing particles. Whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid the scratch of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces.
摘要翻译： 本发明涉及具有抛光颗粒的抛光材料及其制造方法。 具有抛光颗粒的抛光材料包括基材，多个抛光颗粒和聚合物弹性体。 基材具有用于限定多个网格空间的多根纤维。 抛光颗粒分布在网格空间中。 聚合物弹性体覆盖基材和抛光颗粒。 由此，抛光粒子在研磨工序中均匀地分布在研磨工件的表面上。 此外，基材防止抛光颗粒接触抛光工件，以避免抛光工件的划痕。 此外，基材提供了用于扫掠小磨碎片的效果。
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公开(公告)号：US20080268227A1
公开(公告)日：2008-10-30
申请号：US11790961
申请日：2007-04-30
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
CPC分类号： B24B37/24 , B32B3/30 , B32B25/10 , B32B27/12 , D06N3/142 , D06N7/00 , D06N2209/128 , Y10T428/249981
摘要： The present invention relates to a complex polishing pad and method for making the same. The method of the invention comprises the steps of: (a) providing a buffer layer, the buffer layer being continuous-porous material and having a surface; (b) flattening the surface of the buffer layer to form a flattened surface; and (c) disposing a polishing layer on the flattened surface so as to form the complex polishing pad, wherein the polishing layer is used to polish a polishing workpiece. Whereby, the complex polishing pad of the invention has a better flatness, and the buffer layer and the polishing layer have a stronger combination.
摘要翻译： 复合抛光垫及其制造方法技术领域本发明涉及一种复合抛光垫及其制造方法。 本发明的方法包括以下步骤：（a）提供缓冲层，缓冲层为连续多孔材料并具有表面; （b）使缓冲层的表面变平，形成平坦的表面; 和（c）在平坦化表面上设置抛光层以形成复合抛光垫，其中抛光层用于抛光抛光工件。 由此，本发明的复合抛光垫具有更好的平坦度，并且缓冲层和抛光层具有更强的组合。
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10.发明授权公开(公告)号：US08765259B2
公开(公告)日：2014-07-01
申请号：US12907382
申请日：2010-10-19
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
CPC分类号： B24B9/146 , B24B37/30 , B24B41/068 , C08J5/128 , C08J2323/06 , C08J2323/12 , C08J2327/06 , C08J2375/04 , C09J5/06 , C09J2423/046 , C09J2423/106 , C09J2427/006 , C09J2475/006
摘要： The present invention relates to a carrier film for mounting a polishing workpiece. The carrier film comprises a surface substrate and a buffer substrate. The surface substrate consists of first elastomer, the first elastomer comprising a plurality of first holes; wherein the first holes have a drop shape, and each of the first holes has an opening. The buffer substrate consists of second elastomer, the second elastomer comprising a plurality of second holes. The surface substrate and the buffer substrate are adhered with adhesive comprising the first or the second elastomer. A method for making the carrier film is also provided. When polishing, the carrier film provides a good buffer property to conduct and release down force applied on the polishing workpiece.
摘要翻译： 本发明涉及一种用于安装抛光工件的载体膜。 载体膜包括表面基板和缓冲基板。 所述表面基板由第一弹性体构成，所述第一弹性体包括多个第一孔; 其中所述第一孔具有液滴形状，并且每个所述第一孔具有开口。 缓冲衬底由第二弹性体组成，第二弹性体包括多个第二孔。 表面基材和缓冲基材用包含第一或第二弹性体的粘合剂粘合。 还提供了制造载体膜的方法。 当抛光时，载体膜提供良好的缓冲性能以传导和释放施加在抛光工件上的下压力。
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