公开(公告)号：US06366688B1

公开(公告)日：2002-04-02

申请号：US09162267

申请日：1998-09-29

申请人： Chung-sam Jun ,  Jeong-kon Kim ,  Sang-moon Chon ,  Sang-bong Choi

发明人： Chung-sam Jun ,  Jeong-kon Kim ,  Sang-moon Chon ,  Sang-bong Choi

IPC分类号： G06K900

CPC分类号： G01R31/2886 ,  H01J2237/2817

摘要： There is provided a contact failure inspection system and method for semiconductor devices and a method of manufacturing semiconductor devices. Using digitized values for electron signals detected using a scanning electron microscope, contacts can be inspected to identify failures such as non-open contact holes. The contact failure inspection is performed by comparing the electron signal value detected from a unit area including at least one contact hole with values representative of the electron signal corresponding to a normal contact.

摘要翻译： 提供了一种用于半导体器件的接触故障检测系统和方法以及半导体器件的制造方法。 使用扫描电子显微镜检测的电子信号的数字化值可以被检查以识别诸如非开放接触孔的故障。 通过将从包括至少一个接触孔的单位区域检测到的电子信号值与表示与正常接触相对应的电子信号的值进行比较来进行接触故障检查。

公开(公告)号：US6149507A

公开(公告)日：2000-11-21

申请号：US111746

申请日：1998-07-08

申请人： Sang-seon Lee ,  Jeong-kon Kim

发明人： Sang-seon Lee ,  Jeong-kon Kim

IPC分类号： B24B37/04 ,  H01L21/304 ,  H01L21/3205 ,  H01L21/321 ,  H01L21/768 ,  B24B1/00

CPC分类号： B24B37/345

摘要： A polishing method and apparatus for a semiconductor wafer includes a loading section having a loading platform for mounting a loading cassette, and a loading robot arm for transferring a wafer from the loading cassette. The apparatus includes a standby stage having a pre-polishing stand on which the wafer is placed, and a post-polishing stand for holding the wafer after polishing, and a polishing table on which a polishing process is performed. A wafer moving device transfers the wafer from the pre-polishing stand to the polishing table and back to the post-polishing stand. An unloading section includes an unloading platform for mounting an unloading cassette, and an unloading robot arm for transferring the wafer to the unloading cassette. A measurement device, proximal to the unloading stage, analyzes a polishing state of the wafer and then a cleaning device cleans the wafer after the wafers are analyzed.

摘要翻译： 一种用于半导体晶片的抛光方法和装置，包括具有用于安装装载盒的装载平台的装载部分和用于从装载盒传送晶片的装载机器人臂。 该装置包括备用台，其具有放置晶片的预抛光台，以及用于在抛光之后保持晶片的后抛光台，以及执行抛光处理的抛光台。 晶片移动装置将晶片从预抛光台转移到抛光台并返回到后抛光台。 卸载部分包括用于安装卸载盒的卸载平台和用于将晶片传送到卸载盒的卸载机器人臂。 靠近卸载台的测量装置分析晶片的抛光状态，然后在分析晶片之后清洁装置清洁晶片。

公开(公告)号：US5744812A

公开(公告)日：1998-04-28

申请号：US773336

申请日：1996-12-26

申请人： Sang-guen Oh ,  Jeong-kon Kim

发明人： Sang-guen Oh ,  Jeong-kon Kim

IPC分类号： G01T1/29 ,  C23C14/48 ,  H01J37/04 ,  H01J37/244 ,  H01J37/317 ,  H01L21/265

CPC分类号： H01J37/244 ,  H01J2237/24405 ,  H01J2237/31701

摘要： A Faraday cup assembly of a semiconductor ion-implanting apparatus is installed adjacent to a disc upon which a wafer can be mounted for performing an ion implantation. A micro-discharge is prevented because the Faraday cup has an inner wall covered by a conductive thin film or has a discharge tag of a predetermined size embedded in its inner wall. An ion implanting process utilizing such an apparatus ensures that contamination and quality inferiority of the wafer are prevented by preventing the build up of an insulating layer of carbon impurities on the inner wall of the Faraday cup assembly.

摘要翻译： 半导体离子注入装置的法拉第杯组件安装在可安装晶片以执行离子注入的盘附近。 由于法拉第杯具有被导电薄膜覆盖的内壁或具有嵌入其内壁中的预定尺寸的放电标签，因此可以防止微放电。 使用这种装置的离子注入工艺通过防止在法拉第杯组件的内壁上积聚碳杂质的绝缘层来防止晶片的污染和质量劣化。

公开(公告)号：US5691803A

公开(公告)日：1997-11-25

申请号：US604302

申请日：1996-02-21

申请人： Jae-kwan Song ,  Jeong-kon Kim ,  Kyoung-shin Park ,  Kyung-sung Bae

发明人： Jae-kwan Song ,  Jeong-kon Kim ,  Kyoung-shin Park ,  Kyung-sung Bae

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70108

摘要： An advanced exposure apparatus combines a quadrupole illumination system and an annular illumination system, and includes a light source, an adjusting portion comprising a filter to limit the light emitted from the light source, a refractive/diffractive portion for refracting and diffracting the light emitted from the adjusting portion and a focussing portion for focussing the light emitted from the refractive/diffractive portion onto a wafer, wherein the filter is provided with first group holes and second group holes comprising four holes, respectively. In an exposure method using such an apparatus, uniform light intensity distribution can be formed on an image formation plane (or wafer) while improved resolution is maintained. Since image formation information (i.e, light passing through a mask pattern) becomes uniform, a very nearly circular contact hole pattern can be formed, to reduce the proximity effect.

摘要翻译： 先进的曝光装置结合了四极照明系统和环形照明系统，并且包括光源，包括用于限制从光源发射的光的滤光器的调节部分，用于折射和衍射从光源发出的光的折射/衍射部分 所述调整部分和用于将从所述折射/衍射部分发射的光聚焦到晶片上的聚焦部分，其中所述滤光器分别设置有包括四个孔的第一组孔和第二组孔。 在使用这种装置的曝光方法中，可以在保持改善的分辨率的同时在图像形成平面（或晶片）上形成均匀的光强度分布。 由于图像形成信息（即，通过掩模图案的光）变得均匀，可以形成非常接近圆形的接触孔图案，以减少邻近效应。