ULTRASONIC TANK AND METHODS FOR UNIFORM GLASS SUBSTRATE ETCHING
    3.
    发明申请
    ULTRASONIC TANK AND METHODS FOR UNIFORM GLASS SUBSTRATE ETCHING 审中-公开
    超声波罐和均匀玻璃基板蚀刻的方法

    公开(公告)号:US20160035587A1

    公开(公告)日:2016-02-04

    申请号:US14810967

    申请日:2015-07-28

    IPC分类号: H01L21/48 C03C15/00

    摘要: In some embodiments, an ultrasonic tank includes a container, an etching solution tank comprising a working area disposed within the container, and a plurality of ultrasonic transducers arranged about a perimeter of the etching solution tank in a configuration that provides a standard deviation of ultrasonic power within the working area of less than about 0.35.

    摘要翻译: 在一些实施例中,超声波箱包括容器,包括设置在容器内的工作区域的蚀刻溶液罐以及提供超声波功率的标准偏差的构造的围绕蚀刻溶液罐的周边布置的多个超声换能器 在工作区内小于0.35左右。