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公开(公告)号：US20170106408A1
公开(公告)日：2017-04-20
申请号：US15128323
申请日：2014-10-22
发明人： Naoko NAKATA , Kouji YOSHIDA , Naoshi KAWAMATA , Takaharu NAGAI , Koji ICHIMURA
CPC分类号： B05D3/12 , B05D3/067 , B29C59/02 , G03F7/0002 , H01L21/027
摘要： An imprint mold has a base 2, an uneven structure area A set on a surface 2a of the base 2, a measurement area 6 set in the uneven structure area A, and a measurement mark structure 7 positioned in the measurement area 6, the measurement mark structure 7 having a plurality of pattern sets 7a each having a line/space shape. With this, a deformation occurring in a resin layer at the time of release of the resin layer from the mold is prevented, and a measurement mark can be formed with high accuracy.
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公开(公告)号：US20220236642A1
公开(公告)日：2022-07-28
申请号：US17722608
申请日：2022-04-18
IPC分类号： G03F7/00 , B29C33/42 , B29C33/38 , B29C59/00 , H01L21/027
摘要： A template and a template blank are used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate, in which a first step structure is formed on a main surface of a base, a second step structure is formed on the first step structure, and an outside region of the second step structure on an upper surface of the first step structure is covered with a light shielding film to solve the above problem.
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公开(公告)号：US20190086798A1
公开(公告)日：2019-03-21
申请号：US16304264
申请日：2017-05-24
IPC分类号： G03F7/00 , B29C33/38 , B29C59/00 , H01L21/027
摘要： A template and a template blank are used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate, in which a first step structure is formed on a main surface of a base, a second step structure is formed on the first step structure, and an outside region of the second step structure on an upper surface of the first step structure is covered with a light shielding film to solve the above problem.
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