公开(公告)号：US20240309197A1

公开(公告)日：2024-09-19

申请号：US18277869

申请日：2022-03-23

Applicant: DENKA COMPANY LIMITED

Inventor： Gaito KIYOFUJI ,  Seiya TOMIZAWA ,  Naoki KOBAYASHI

IPC: C08L47/00

CPC classification number: C08L47/00 ,  C08L2201/52

Abstract: A method for producing a chloroprene-based polymer composition including a polymerization step, wherein chloroprene, or chloroprene and a monomer copolymerizable with chloroprene are polymerized; and includes monomer and emulsifier addition steps, when a total amount of monomer used in the polymerization step is 100%, an initial addition amount of monomer at start of polymerization is X %; in the monomer addition step, when the initial addition amount of the monomer is 100%, a remaining monomer is added to the polymerization system from time when polymerization progresses and Y % of the monomer initially added converts, by reaching the polymerization completion conversion; in the emulsifier addition step, when the total amount of monomer used in the polymerization step is 100%, emulsifier is added from time when polymerization progresses and Z % of the monomer converts by reaching the polymerization completion conversion; and X, Y and Z satisfy following relationship, 1

公开(公告)号：US20240376244A1

公开(公告)日：2024-11-14

申请号：US18686971

申请日：2022-09-07

Applicant: Denka Company Limited

Inventor： Seiya TOMIZAWA ,  Atsunori KONDO

IPC: C08F279/02 ,  C08J3/24 ,  C08K3/04 ,  C08K3/36 ,  C08K5/25

Abstract: Provided is a rubber composition capable of improving the scorch time of the unvulcanized product, and the hardness, tensile strength, and freeze resistance of the vulcanizate in a well-balanced manner.
According to the present invention, there is provided a rubber composition including a chloroprene-based rubber having a content of an unsaturated nitrile monomer unit of less than 25% by mass and an epoxy compound having a weight average molecular weight more than 100 and less than 900, wherein the rubber composition contains 0.1 to 25 parts by mass of the epoxy compound with respect to 100 parts by mass of the chloroprene-based rubber.

公开(公告)号：US20240117161A1

公开(公告)日：2024-04-11

申请号：US18274370

申请日：2022-03-24

Applicant: DENKA COMPANY LIMITED

Inventor： Seiya TOMIZAWA ,  Wataru NISHINO ,  Misaki TADA

IPC: C08L11/02 ,  C08F2/22 ,  C08F236/18 ,  C09J111/02

CPC classification number: C08L11/02 ,  C08F2/22 ,  C08F236/18 ,  C09J111/02

Abstract: A chloroprene-based polymer latex including a chloroprene-based polymer, wherein: an amount of substance of alkali metal cation per unit mass in the chloroprene-based polymer latex is 0.05 to 0.12 mmol/g, when the chloroprene-based polymer latex is freeze-dried to obtain a solid content containing the chloroprene-based polymer, and an ethanol-toluene azeotropic mixture soluble content specified in JIS K 6229 is extracted by refluxing from the solid content to obtain an extract, and the obtained extract is acid treated with hydrochloric acid, an amount of rosin acid of in the solid content measured by gas chromatography is 1.4 to 4.2% by mass with respect to 100% by mass of the chloroprene-based polymer in the solid content, is provided.

公开(公告)号：US20240117083A1

公开(公告)日：2024-04-11

申请号：US18274281

申请日：2022-03-24

Applicant: DENKA COMPANY LIMITED

Inventor： Seiya TOMIZAWA ,  Wataru NISHINO ,  Misaki TADA

IPC: C08F36/18 ,  C08C4/00 ,  C08F2/22 ,  C08L11/02

CPC classification number: C08F36/18 ,  C08C4/00 ,  C08F2/22 ,  C08L11/02 ,  C08L2312/00

Abstract: A chloroprene-based polymer, wherein: a 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.80 to 6.00 ppm; when an area of the peak at 5.80 to 6.00 ppm is A and an area of a peak at 4.05 to 6.00 ppm is B, A/B is 1.20/100 or less; the 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.40 to 5.60 ppm; when an area of the peak at 5.40 to 5.60 ppm is D and the area of the peak at 4.05 to 6.00 ppm is B, D/B is 97.20/100 or less, is provided.