公开(公告)号：US20160214282A1

公开(公告)日：2016-07-28

申请号：US15026509

申请日：2014-12-04

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka MURAMOTO ,  Masanao KIKUCHI ,  Shunichi KAJIYA ,  Takaaki OTOWA ,  Yasuhiro TAKAHASHI

IPC: B29C33/42 ,  B29C35/08 ,  B29C59/04 ,  B29C33/38 ,  B29D11/00

CPC classification number: B29D11/0074 ,  B29C33/38 ,  B29C33/3842 ,  B29C33/424 ,  B29C35/0805 ,  B29C35/0888 ,  B29C41/28 ,  B29C59/04 ,  B29C59/046 ,  B29K2909/08 ,  B29L2011/00 ,  C03C15/00 ,  C03C2218/34 ,  G03F7/0002 ,  G03F7/24 ,  G11B7/261

Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.

Abstract translation: 提供了一种圆柱形基座，主机和用于制造能够均匀转移精细图案的主机的方法。 使用具有双折射小于70nm / cm的内部应变的石英玻璃的圆柱形基座。 将抗蚀剂层沉积到该圆筒形基底的外圆周表面上，在抗蚀剂层上形成潜像，将形成在抗蚀剂层上的潜像显影，并将显影的抗蚀剂层的图案用作蚀刻掩模 以形成在圆筒形基座的外圆周表面上设置成多排的凹凸的结构。

公开(公告)号：US20180281239A1

公开(公告)日：2018-10-04

申请号：US15950596

申请日：2018-04-11

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka MURAMOTO ,  Masanao KIKUCHI ,  Shunichi KAJIYA ,  Takaaki OTOWA ,  Yasuhiro TAKAHASHI

IPC: B29C33/42 ,  G11B7/26 ,  B29C33/38 ,  G03F7/00 ,  G03F7/24 ,  B29C35/08 ,  B29C41/28 ,  B29C59/04 ,  C03C15/00 ,  B29D11/00 ,  B29L11/00

Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.

公开(公告)号：US20210387429A1

公开(公告)日：2021-12-16

申请号：US17393963

申请日：2021-08-04

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka MURAMOTO ,  Masanao KIKUCHI ,  Shunichi KAJIYA ,  Takaaki OTOWA ,  Yasuhiro TAKAHASHI

IPC: B29D11/00 ,  B29C41/28 ,  G11B7/26 ,  B29C33/38 ,  G03F7/00 ,  G03F7/24 ,  C03C15/00 ,  B29C59/04 ,  B29C33/42 ,  B29C35/08

Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.

公开(公告)号：US20220003897A1

公开(公告)日：2022-01-06

申请号：US17470339

申请日：2021-09-09

Applicant: DEXERIALS CORPORATION

Inventor： Shunichi KAJIYA ,  Hideki TERASHIMA ,  Yutaka MURAMOTO ,  Masanao KIKUCHI ,  Takaaki OTOWA

IPC: G02B1/118 ,  B29C33/42 ,  G02B1/12

Abstract: There is provided an optical body with improved antireflection capability, a display device, and a method for manufacturing an optical body, the optical body including: a first concave-convex structure formed on a surface of a base material;
and a second concave-convex structure superimposed on the first concave-convex structure. An average concave-convex period of the first concave-convex structure is larger than a wavelength in a visible light region, an average concave-convex period of the second concave-convex structure is less than or equal to the wavelength in the visible light region, and projecting parts of the second concave-convex structure extend in a direction normal to a flat plane of the base material.

公开(公告)号：US20170299778A1

公开(公告)日：2017-10-19

申请号：US15508050

申请日：2015-08-31

Applicant: DEXERIALS CORPORATION

Inventor： Shunichi KAJIYA ,  Hideki TERASHIMA ,  Yutaka MURAMOTO ,  Masanao KIKUCHI ,  Takaaki OTOWA

IPC: G02B1/118 ,  G02B1/12

CPC classification number: G02B1/118 ,  B29C33/42 ,  B29C59/046 ,  B29C2059/023 ,  G02B1/12 ,  G02B5/0273 ,  G02F1/133502 ,  G02F2201/38

Abstract: There is provided an optical body with improved antireflection capability, a display device, and a method for manufacturing an optical body, the optical body including: a first concave-convex structure formed on a surface of a base material; and a second concave-convex structure superimposed on the first concave-convex structure. An average concave-convex period of the first concave-convex structure is larger than a wavelength in a visible light region, an average concave-convex period of the second concave-convex structure is less than or equal to the wavelength in the visible light region, and projecting parts of the second concave-convex structure extend in a direction normal to a flat plane of the base material.