ARE PREPARED BY REACTING TRIALKYL ALUMINUM COMPOUNDS WITH CH2=(R'')YSIR"AH3- IN AN INERT ATMOSPHERE AT A TEMPERATURE OF FROM 100 TO 150*C. FOR EXAMPLE, TRIISOBUTYL ALUMINUM IS REACTED WITH VINYLMETHYLSILANE IN HELIUM AT 120*C. TO GIVE (IC4H9)2ALC2H4SI(CH3)H2. THE COMPOUNDS ARE USEFUL AS INTERMEDIATES IN THE PREPARATION OF CARBOXYALKYL SILICON COMPOUNDS AND ALKENYLSILANES AND CAN BE USED AS WATER REPELLANTS.
Abstract:
Chlorosilanes of the formula RxSiHC13 x are prepared by reacting RxSi(OR'')C13 x with dialkyl aluminum hydrides at a temperature from -40* to 25* C. and thereafter separating the desired product from the reaction mixture at a temperature not exceeding 25* C.
Abstract:
Low temperature, fast curing electrical and coating resins, activated by ultraviolet or other low energy radiation, are obtained by mixing mercaptoalkyl siloxane resins with methylvinyl siloxanes and subjecting the mixture to ultraviolet light. An exemplary formulation is: 8.5 parts by weight of a copolymer of 20 mol percent mercaptopropyl siloxane, 50 mol percent monopropyl siloxane, 20 mol percent dimethyl siloxane and 10 mol percent monomethyl siloxane and 1.5 parts by weight of methylvinyl cyclosiloxane wherein the cyclics contain from 4 to 8 silicon atoms. These resins are particularly designed for circuit board coatings.
Abstract:
THE PREPARATION OF METHALLYLSILANES WHICH INVOLVES CONTACTING (IN AN OPEN SYSTEM) A HYDROGEN-SUBSTITUTED ORGANOSILICON COMPOUND WITH DIISOBUTYLENE, AT A TEMPERATURE OF FROM 400*C, TO 600*C. THE PRESENT METHOD IS LESS DIFFICULT (AND THUS LESS EXPENSIVE) THAN PRIOR ART METHODS AND THE RECOVERED METHALLYLSILANES ARE USEFUL IN THE PRODUCTION OF CERTAIN SYNTHETIC RESINS.
Abstract:
When reacting chlorine with methallylsilanes, the yield of 2(chloromethyl)allylsilanes is increased substantially by carrying out the reaction in the absence of light or other sources of free radicals.
Abstract:
Aluminum alkyls are reacted with halo and/or alkoxysilanes at 300* C. or above to give silanes containing SiH groups without alkylation of the silicon. For example, a mixture of triethyl aluminum and dimethyldichlorosilane was heated in a tube at 450* C. for less than one second to give dimethylchlorosilane and dimethylsilane without the formation of ethylsilicon bonds.
Abstract:
Chlorosilanes of the formula RxSiHCl3 x are prepared by reacting RxSi(OR'')Cl3 x with dialkyl aluminum hydrides employing certain ethers such as 1,4-dioxane or dihexyl ethers. There are two variations of the process. One, the ether is present during reaction, in which case, the reaction temperature is in the range from -40* C. to above 25* C. Two, the reaction is carried out at temperature at or below about 25* C. and the ether is then added and the product distilled at temperatures which can be above 25* C.