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    Illumination system for a microlithographic projection exposure apparatus
    1.
    发明授权
    Illumination system for a microlithographic projection exposure apparatus 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US08004656B2

    公开(公告)日：2011-08-23

    申请号：US11505408

    申请日：2006-08-17

    申请人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

    发明人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G03B27/52 ,  G03B27/72

    CPC分类号： G03F7/7015 ,  G03B27/54 ,  G03F7/70075 ,  G03F7/70108

    摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

    摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。

    Illumination system for a microlithographic projection exposure apparatus
    2.
    发明授权
    Illumination system for a microlithographic projection exposure apparatus 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US08730455B2

    公开(公告)日：2014-05-20

    申请号：US13181033

    申请日：2011-07-12

    申请人： Damian Fiolka ,  Manfred Maul ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler ,  Vladimir Davydenko

    发明人： Damian Fiolka ,  Manfred Maul ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler ,  Vladimir Davydenko

    IPC分类号： G03B27/54 ,  G03B27/72 ,  G03F7/20 ,  G03B27/68 ,  G03B27/42 ,  G03B27/52

    CPC分类号： G03F7/7015 ,  G03B27/54 ,  G03F7/70075 ,  G03F7/70108

    摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

    摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。

    Illumination system for a microlithographic projection exposure apparatus
    3.
    发明申请
    Illumination system for a microlithographic projection exposure apparatus 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US20070206171A1

    公开(公告)日：2007-09-06

    申请号：US11505408

    申请日：2006-08-17

    申请人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

    发明人： Damian Fiolka ,  Manfred Maul ,  Vladimir Davydenko ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler

    IPC分类号： G03B27/54

    CPC分类号： G03F7/7015 ,  G03B27/54 ,  G03F7/70075 ,  G03F7/70108

    摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

    摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。

    ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY
    4.
    发明申请
    ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY 有权
    微观照明系统

    公开(公告)号：US20120019796A1

    公开(公告)日：2012-01-26

    申请号：US13186068

    申请日：2011-07-19

    申请人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

    发明人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70191 ,  G02B3/0043 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083

    摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.

    摘要翻译： 用于微光刻的照明系统用于利用一次光源的照明光照射照明场。 第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。 第一光栅布置用于产生二次光源的光栅布置。 传输光学器件用于将次级光源的照明光的叠加传输到照明场中。 传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。 在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。 例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。 两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III） 这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。 结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。

    Illumination system for microlithography
    5.
    发明授权
    Illumination system for microlithography 有权
    微光刻照明系统

    公开(公告)号：US08873023B2

    公开(公告)日：2014-10-28

    申请号：US13186068

    申请日：2011-07-19

    申请人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

    发明人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70191 ,  G02B3/0043 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083

    摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.

    摘要翻译： 用于微光刻的照明系统用于利用一次光源的照明光照射照明场。 第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。 第一光栅布置用于产生二次光源的光栅布置。 传输光学器件用于将次级光源的照明光的叠加传输到照明场中。 传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。 在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。 例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。 两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III） 这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。 结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。

    Illumination system and polarizer for a microlithographic projection exposure apparatus
    9.
    发明授权
    Illumination system and polarizer for a microlithographic projection exposure apparatus 有权
    用于微光刻投影曝光装置的照明系统和偏振器

    公开(公告)号：US07408622B2

    公开(公告)日：2008-08-05

    申请号：US10994141

    申请日：2004-11-19

    申请人： Damian Fiolka ,  Axel Scholz ,  Manfred Maul

    发明人： Damian Fiolka ,  Axel Scholz ,  Manfred Maul

    IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70058 ,  G03F7/70566

    摘要： An illumination system for a microlithographic projection exposure apparatus includes a light source (1) for generating projection light, a masking arrangement (5) for masking a reticle (R) and a masking objective (6) for imaging the masking arrangement (5) on the reticle (R). A polarizer (10) for generating linearly polarized light is arranged in the masking objective (6). The polarizer (10) may comprise, for example, polarization-selective beam splitting layers (54, 56; 154, 156; 292, 294) arranged at an angle to one another, which are transparent to light in a first polarisation state (68) and reflect light in different second polarisation state (70).

    摘要翻译： 一种用于微光刻投影曝光装置的照明系统，包括用于产生投影光的光源（1），用于掩蔽掩模版（R）的掩模装置（5）和用于使掩蔽装置（5）成像成像的掩蔽物镜 标线（R）。 用于产生线性偏振光的偏振器（10）布置在掩蔽物镜（6）中。 偏振器（10）可以包括例如以彼此成角度布置的偏振选择性分束层（54,56; 154,156; 292,294），其对于第一偏振状态的光（68 ）并且以不同的第二偏振状态（70）反射光。

    Illumination system and polarizer for a microlithographic projection exposure apparatus
    10.
    发明申请
    Illumination system and polarizer for a microlithographic projection exposure apparatus 有权
    用于微光刻投影曝光装置的照明系统和偏振器

    公开(公告)号：US20050140958A1

    公开(公告)日：2005-06-30

    申请号：US10994141

    申请日：2004-11-19

    申请人： Damian Fiolka ,  Axel Scholz ,  Manfred Maul

    发明人： Damian Fiolka ,  Axel Scholz ,  Manfred Maul

    IPC分类号： G03F7/20 ,  G03B27/72

    CPC分类号： G03F7/70058 ,  G03F7/70566

    摘要： An illumination system for a microlithographic projection exposure apparatus includes a light source (1) for generating projection light, a masking arrangement (5) for masking a reticle (R) and a masking objective (6) for imaging the masking arrangement (5) on the reticle (R). A polarizer (10) for generating linearly polarized light is arranged in the masking objective (6). The polarizer (10) may comprise, for example, polarization-selective beam splitting layers (54, 56; 154, 156; 292, 294) arranged at an angle to one another, which are transparent to light in a first polarisation state (68) and reflect light in different second polarisation state (70).

    摘要翻译： 一种用于微光刻投影曝光装置的照明系统，包括用于产生投影光的光源（1），用于掩蔽掩模版（R）的掩模装置（5）和用于使掩蔽装置（5）成像成像的掩蔽物镜 标线（R）。 用于产生线性偏振光的偏振器（10）布置在掩蔽物镜（6）中。 偏振器（10）可以包括例如以彼此成角度布置的偏振选择性分束层（54,56; 154,156; 292,294），其对于第一偏振状态的光（68 ）并且以不同的第二偏振状态（70）反射光。