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    Wavefront propagation from one plane to another
    5.
    发明授权
    Wavefront propagation from one plane to another 有权
    从一个平面到另一个平面的波前传播

    公开(公告)号：US08746886B2

    公开(公告)日：2014-06-10

    申请号：US13353562

    申请日：2012-01-19

    申请人： Guangming Dai ,  Charles E. Campbell ,  Li Chen ,  Huawei Zhao ,  Dimitri Chernyak

    发明人： Guangming Dai ,  Charles E. Campbell ,  Li Chen ,  Huawei Zhao ,  Dimitri Chernyak

    IPC分类号： A61B3/00

    CPC分类号： A61B3/0025 ,  A61B3/1015

    摘要： The present invention provides methods, systems and software for scaling optical aberration measurements of optical systems. In one embodiment, the present invention provides a method of reconstructing optical tissues of an eye. The method comprises transmitting an image through the optical tissues of the eye. Aberration data from the transmitted image is measured across the optical tissues of the eye at a first plane. A conversion algorithm is applied to the data, converting it to corrective optical power data that can be used as a basis for constructing a treatment for the eye at a second plane.

    摘要翻译： 本发明提供了用于缩放光学系统的光学像差测量的方法，系统和软件。 在一个实施例中，本发明提供了重建眼睛的光学组织的方法。 该方法包括通过眼睛的光学组织传输图像。 在第一平面上跨越眼睛的光学组织测量来自透射图像的畸变数据。 将转换算法应用于数据，将其转换为校正光功率数据，该光功率数据可用作在第二平面上为眼睛构建治疗的基础。

    TORIC OPTIC FOR OPHTHALMIC USE
    6.
    发明申请
    TORIC OPTIC FOR OPHTHALMIC USE 有权
    OPO用于OPHTHALMIC使用

    公开(公告)号：US20130060542A1

    公开(公告)日：2013-03-07

    申请号：US13601252

    申请日：2012-08-31

    申请人： Huawei Zhao

    发明人： Huawei Zhao

    IPC分类号： G06G7/60 ,  G06F17/10

    CPC分类号： G02C7/04 ,  A61F2/1637 ,  A61F2/1645 ,  A61F2240/002 ,  G02C7/024

    摘要： An ophthalmic lens for modifying or reducing non-axisymmetric higher order aberrations includes an optic body disposed about an optical axis having a primary meridian and an orthogonal secondary meridian. The optic body includes a higher order toric shape that is imposed on or added to one of the optic body surfaces. The higher order toric shape also includes a first profile disposed along the primary meridian and a second profile disposed along the secondary meridian that is different in shape from the first profile. The higher order toric shape is characterized by a profile along at least one meridian of the lens that changes with increasing radius from the optical axis raised to a power that is greater than two.

    摘要翻译： 用于修改或减少非轴对称高阶像差的眼镜包括围绕具有主子午线和正交子午线的光轴设置的光学主体。 光学主体包括施加在光学主体表面之一上或添加到光学体表面之一的较高阶复曲面形状。 较高阶复曲面形状还包括沿着主子午线设置的第一轮廓和沿着与第一轮廓不同形状的次要子午线设置的第二轮廓。 高阶复曲面形状的特征在于沿着透镜的至少一个子午线的轮廓，其随着半径从增加的光轴增加到大于2的光焦度而变化。

    Multifocal intraocular lens
    7.
    发明授权
    Multifocal intraocular lens 有权
    多焦点眼内镜

    公开(公告)号：US08292953B2

    公开(公告)日：2012-10-23

    申请号：US12254710

    申请日：2008-10-20

    申请人： Hendrik A Weeber ,  Patricia Ann Piers ,  Mark H. Bandhauer ,  Marrie H. Van Der Mooren ,  Huawei Zhao

    发明人： Hendrik A Weeber ,  Patricia Ann Piers ,  Mark H. Bandhauer ,  Marrie H. Van Der Mooren ,  Huawei Zhao

    IPC分类号： A61F2/16

    CPC分类号： A61F2/1654 ,  A61F2/1618 ,  A61F2250/0014 ,  A61F2250/0053 ,  G02C7/042 ,  G02C7/044 ,  G02C7/06 ,  G02C2202/20

    摘要： An intraocular lens for providing a subject with vision at various distances includes an optic having a first surface with a first shape, an opposing second surface with a second shape, a multifocal refractive profile, and one or more diffractive portions. The optic may include at least one multifocal diffractive profile. In some embodiments, multifocal diffractive and the multifocal refractive profiles are disposed on different, distinct, or non-overlapping portions or apertures of the optic. Alternatively, portions of the multifocal diffractive profiles and the multifocal refractive profiles may overlap within a common aperture or zone of the optic.

    摘要翻译： 用于以不同距离为受试者提供视力的眼内透镜包括具有第一形状的第一表面，具有第二形状的相对的第二表面，多焦点折射轮廓和一个或多个衍射部分的光学元件。 光学元件可以包括至少一个多焦点衍射轮廓。 在一些实施例中，多焦点衍射和多焦点折射廓线设置在光学元件的不同的，不同的或非重叠的部分或孔上。 或者，多焦点衍射轮廓和多焦点折射轮廓的部分可以在光学器件的公共孔径或区域内重叠。

    Systems and software for wavefront data processing, vision correction, and other applications
    8.
    发明授权
    Systems and software for wavefront data processing, vision correction, and other applications 有权
    用于波前数据处理，视力矫正和其他应用的系统和软件

    公开(公告)号：US07654672B2

    公开(公告)日：2010-02-02

    申请号：US12263433

    申请日：2008-10-31

    申请人： Huawei Zhao ,  Li Chen

    发明人： Huawei Zhao ,  Li Chen

    IPC分类号： A61B3/10

    CPC分类号： A61B3/1015

    摘要： A system for providing vision contains an aberrometer, a wavefront sensor, and a transfer optical system. The aberrometer is configured to measure a received wavefront. The aberrometer includes a wavefront sensor and a transfer optical system for transferring an input wavefront so as to the provide the received wavefront at or near the wavefront sensor. The system also includes a processor in communication with the aberrometer, a readable memory, and instructions located within the memory. The readable memory contains one or more system error parameters and instructions available to the processor. The instructions are for determining at least one aberration of the received wavefront and calculating the input wavefront based on the received wavefront and the one or more system error parameters.

    摘要翻译： 用于提供视觉的系统包括像差计，波前传感器和传输光学系统。 像差计被配置为测量接收的波前。 像差仪包括波前传感器和用于传送输入波前的传输光学系统，以便在波前传感器处或附近提供接收的波前。 该系统还包括与像差计的通信处理器，可读存储器和位于存储器内的指令。 可读存储器包含处理器可用的一个或多个系统错误参数和指令。 该指令用于确定接收的波前的至少一个像差，并基于接收到的波前和一个或多个系统误差参数来计算输入波前。

    Systems and Software for Wavefront Data Processing, Vision Correction, and Other Applications
    9.
    发明申请
    Systems and Software for Wavefront Data Processing, Vision Correction, and Other Applications 有权
    用于波前数据处理，视觉校正和其他应用的系统和软件

    公开(公告)号：US20090109403A1

    公开(公告)日：2009-04-30

    申请号：US12263433

    申请日：2008-10-31

    申请人： Huawei Zhao ,  Li Chen

    发明人： Huawei Zhao ,  Li Chen

    IPC分类号： A61B3/10

    CPC分类号： A61B3/1015

    摘要： A system for providing vision contains an aberrometer, a wavefront sensor, and a transfer optical system. The aberrometer is configured to measure a received wavefront. The aberrometer includes a wavefront sensor and a transfer optical system for transferring an input wavefront so as to the provide the received wavefront at or near the wavefront sensor. The system also includes a processor in communication with the aberrometer, a readable memory, and instructions located within the memory. The readable memory contains one or more system error parameters and instructions available to the processor. The instructions are for determining at least one aberration of the received wavefront and calculating the input wavefront based on the received wavefront and the one or more system error parameters.

    摘要翻译： 用于提供视觉的系统包括像差计，波前传感器和传输光学系统。 像差计被配置为测量接收的波前。 像差仪包括波前传感器和用于传送输入波前的传输光学系统，以便在波前传感器处或附近提供接收的波前。 该系统还包括与像差计的通信处理器，可读存储器和位于存储器内的指令。 可读存储器包含处理器可用的一个或多个系统错误参数和指令。 该指令用于确定接收的波前的至少一个像差，并基于接收到的波前和一个或多个系统误差参数来计算输入波前。

    MULTI-LAYER MAGNET
    10.
    发明申请
    MULTI-LAYER MAGNET 有权
    多层磁铁

    公开(公告)号：US20070018648A1

    公开(公告)日：2007-01-25

    申请号：US11183940

    申请日：2005-07-19

    申请人： David Doddrell ,  Huawei Zhao

    发明人： David Doddrell ,  Huawei Zhao

    IPC分类号： G01V3/00

    CPC分类号： G01R33/3815 ,  G01R33/3875 ,  G01R33/421

    摘要： A shielded superconducting MRI magnet system uses a multi-layer shielded coil design. By splitting the magnet coils into a plurality of coil layers, an increased number of degrees of freedom is achieved which, in turn, permits minimization of the overall length of the magnet while nevertheless avoiding excessive magnet field and stress values in the coils. A compact coil system is thereby designed which also satisfies the plurality of MRI requirements with regard to sufficiently large investigational volume, magnet field strength, acceptable homogeneity, and magnet stray field limitation while achieving sufficiently low maximum coil B field strengths and stress values to avoid quenches and maintain the structural integrity of the magnet.

    摘要翻译： 屏蔽超导MRI磁体系统采用多层屏蔽线圈设计。 通过将磁体线圈分成多个线圈层，实现了增加数量的自由度，这进而允许最小化磁体的整个长度，同时避免了线圈中过多的磁场和应力值。 由此设计了一种紧凑的线圈系统，其在满足足够大的研究体积，磁场强度，可接受的均匀性和磁体杂散场限制的同时满足多个MRI要求，同时实现足够低的最大线圈B场强和应力值以避免淬火 并保持磁体的结构完整性。