公开(公告)号：US20070001127A1

公开(公告)日：2007-01-04

申请号：US11173988

申请日：2005-06-30

申请人： Daniel Reiley ,  German Rylov ,  Robert Bergstedt

发明人： Daniel Reiley ,  German Rylov ,  Robert Bergstedt

IPC分类号： A61N5/00

CPC分类号： G03F7/70575 ,  G03F7/70025 ,  H01S3/005 ,  H01S3/08036 ,  H01S3/106 ,  H01S3/137 ,  H01S3/225

摘要： In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.

摘要翻译： 在第一方面，光刻设备可以包括使用光学邻近校正（OPC），脉冲激光源和有源带宽控制系统设计的掩模，该有源带宽控制系统被配置为响应于测量的脉冲带宽来增加后续脉冲的带宽， 低于预定带宽范围，并且响应于高于预定带宽范围的测量脉冲带宽增加随后脉冲的带宽。 在另一方面，有源带宽控制系统可以包括用于改变激光源的激光腔中的激光束的波前的光学器件，用于响应于控制信号选择性地调节输出激光器带宽。 在另一方面，具有穿过孔的波长变化的激光器的带宽可以由可移动以调节孔径的孔径阻挡元件主动地控制。

公开(公告)号：US20070280308A1

公开(公告)日：2007-12-06

申请号：US11805583

申请日：2007-05-23

申请人： Alexander Ershov ,  James Ferrell ,  Thomas Hofmann ,  Daniel Reiley ,  Chris Remen

发明人： Alexander Ershov ,  James Ferrell ,  Thomas Hofmann ,  Daniel Reiley ,  Chris Remen

IPC分类号： H01S3/22

CPC分类号： H01S3/225 ,  H01S3/0057 ,  H01S3/03 ,  H01S3/034

摘要： An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.

摘要翻译： 公开了一种装置和方法，其可以包括高功率准分子或分子氟气体放电激光DUV光源系统，其可以包括：脉冲展宽器，其可以包括：光学延迟路径反射镜，光学延迟路径镜气体清洗组件，其可以 包括：吹扫气体供应系统，其引导净化气体穿过光学延迟线反射镜的表面。 光学延迟路径镜可以包括多个光学延迟路径镜; 净化气体供应系统可以引导净化气体穿过多个光学延迟线反射镜中的每一个的表面。 净化气体供应系统可以包括：净化气体供应管线; 吹扫气体分配和引导机构，其可以将吹扫气体引导通过相应的光学延迟路径反射镜的表面。