Software controlled transistor body bias
    1.
    发明授权
    Software controlled transistor body bias 有权
    软件控制晶体管体偏置

    公开(公告)号:US08370785B2

    公开(公告)日:2013-02-05

    申请号:US13168896

    申请日:2011-06-24

    IPC分类号: G06F17/50

    摘要: Software controlled transistor body bias. A target frequency is accessed. Using software, transistor body-biasing values are determined for the target frequency in order to enhance a characteristic of a circuit. The bodies of the transistors are biased based on the body-biasing values, wherein the characteristic is enhanced.

    摘要翻译: 软件控制晶体管体偏置。 访问目标频率。 使用软件,为了提高电路的特性,确定了目标频率的晶体管体偏置值。 晶体管的主体基于主体偏置值被偏置,其中特性被增强。

    SOFTWARE CONTROLLED TRANSISTOR BODY BIAS
    2.
    发明申请
    SOFTWARE CONTROLLED TRANSISTOR BODY BIAS 有权
    软件控制的晶体管体偏置

    公开(公告)号:US20080141187A1

    公开(公告)日:2008-06-12

    申请号:US12033832

    申请日:2008-02-19

    IPC分类号: G06F17/50

    摘要: Software controlled transistor body bias. A target frequency is accessed. Using software, transistor body-biasing values are determined for the target frequency in order to enhance a characteristic of a circuit. The bodies of the transistors are biased based on the body-biasing values, wherein the characteristic is enhanced.

    摘要翻译: 软件控制晶体管体偏置。 访问目标频率。 使用软件,为了提高电路的特性,确定了目标频率的晶体管体偏置值。 晶体管的主体基于主体偏置值被偏置,其中特性被增强。

    Conversion of an SOI design layout to a bulk design layout
    3.
    发明授权
    Conversion of an SOI design layout to a bulk design layout 有权
    将SOI设计布局转换为批量设计布局

    公开(公告)号:US07579221B1

    公开(公告)日:2009-08-25

    申请号:US11393555

    申请日:2006-03-29

    摘要: An SOI design layout is converted to a bulk design layout. According to a method of converting a first semiconductor design layout based on an Silicon-on-Insulator (SOI) process to a second semiconductor design layout based on a bulk process, an insulator layer of the SOI process beneath active devices in the first semiconductor design layout is removed. A conductive sub-surface structure for routing voltage is added to the first semiconductor design layout. Further, the active devices from the SOI process are converted to the bulk process to form the second semiconductor design layout without requiring a relayout of the first semiconductor design layout on a semiconductor surface. The bulk design layout is utilized to fabricate a semiconductor device having a plurality of active devices.

    摘要翻译: SOI设计布局被转换为散装设计布局。 根据基于体积工艺将基于绝缘体上硅(SOI)工艺的第一半导体设计布局转换为第二半导体设计布局的方法,在第一半导体设计中的有源器件下方的SOI工艺的绝缘体层 布局被删除。 用于路由电压的导电子表面结构被添加到第一半导体设计布局。 此外,来自SOI工艺的有源器件被转换为本体处理以形成第二半导体设计布局,而不需要在半导体表面上重新布置第一半导体设计布局。 本体设计布局用于制造具有多个有源器件的半导体器件。

    Software controlled transistor body bias
    4.
    发明授权
    Software controlled transistor body bias 有权
    软件控制晶体管体偏置

    公开(公告)号:US07334198B2

    公开(公告)日:2008-02-19

    申请号:US10334638

    申请日:2002-12-31

    IPC分类号: G06F17/50

    摘要: Software controlled body bias. A target frequency is accessed. Using software, transistor body-biasing values are determined for the target frequency in order to enhance a characteristic of a circuit. The bodies of the transistors are biased based on the body-biasing values, wherein the characteristic is optimized.

    摘要翻译: 软件控制体偏。 访问目标频率。 使用软件,为了提高电路的特性,确定了目标频率的晶体管体偏置值。 晶体管的主体基于身体偏置值被偏置,其中特性被优化。

    SOFTWARE CONTROLLED TRANSISTOR BODY BIAS
    5.
    发明申请
    SOFTWARE CONTROLLED TRANSISTOR BODY BIAS 有权
    软件控制晶体管体偏置

    公开(公告)号:US20110258590A1

    公开(公告)日:2011-10-20

    申请号:US13168896

    申请日:2011-06-24

    IPC分类号: G06F17/50

    摘要: Software controlled transistor body bias. A target frequency is accessed. Using software, transistor body-biasing values are determined for the target frequency in order to enhance a characteristic of a circuit. The bodies of the transistors are biased based on the body-biasing values, wherein the characteristic is enhanced.

    摘要翻译: 软件控制晶体管体偏置。 访问目标频率。 使用软件,为了提高电路的特性,确定了目标频率的晶体管体偏置值。 晶体管的主体基于主体偏置值被偏置,其中特性被增强。

    SOFTWARE CONTROLLED TRANSISTOR BODY BIAS
    6.
    发明申请
    SOFTWARE CONTROLLED TRANSISTOR BODY BIAS 有权
    软件控制晶体管体偏置

    公开(公告)号:US20140033160A1

    公开(公告)日:2014-01-30

    申请号:US13741246

    申请日:2013-01-14

    IPC分类号: G06F17/50

    摘要: Software controlled transistor body bias. A target frequency is accessed. Using software, transistor body-biasing values are determined for the target frequency in order to enhance a characteristic of a circuit. The bodies of the transistors are biased based on the body-biasing values, wherein the characteristic is enhanced.

    摘要翻译: 软件控制晶体管体偏置。 访问目标频率。 使用软件,为了提高电路的特性,确定了目标频率的晶体管体偏置值。 晶体管的主体基于主体偏置值被偏置,其中特性被增强。

    Software controlled transistor body bias
    7.
    发明授权
    Software controlled transistor body bias 有权
    软件控制晶体管体偏置

    公开(公告)号:US07996809B2

    公开(公告)日:2011-08-09

    申请号:US12033832

    申请日:2008-02-19

    IPC分类号: G06F17/50

    摘要: Software controlled transistor body bias. A target frequency is accessed. Using software, transistor body-biasing values are determined for the target frequency in order to enhance a characteristic of a circuit. The bodies of the transistors are biased based on the body-biasing values, wherein the characteristic is enhanced.

    摘要翻译: 软件控制晶体管体偏置。 访问目标频率。 使用软件,为了提高电路的特性,确定了目标频率的晶体管体偏置值。 晶体管的主体基于主体偏置值被偏置,其中特性被增强。

    Formation of a super steep retrograde channel
    9.
    发明授权
    Formation of a super steep retrograde channel 有权
    形成一个超级陡峭的逆行通道

    公开(公告)号:US08298896B2

    公开(公告)日:2012-10-30

    申请号:US13214593

    申请日:2011-08-22

    IPC分类号: H01L21/336

    摘要: Systems and methods for raised source/drain with super steep retrograde channel are described. In accordance with a first embodiment, a semiconductor device comprises a substrate comprising a surface and a gate oxide disposed above the surface comprising a gate oxide thickness. The semiconductor device further comprises a super steep retrograde channel region formed at a depth below the surface. The depth is about ten to thirty times the gate oxide thickness. Embodiments may provide a more desirable body biasing voltage to threshold voltage characteristic than is available under the conventional art.

    摘要翻译: 描述了具有超陡逆行通道的升高源极/漏极的系统和方法。 根据第一实施例,半导体器件包括包括表面的衬底和设置在包括栅极氧化物厚度的表面之上的栅极氧化物。 半导体器件还包括形成在表面下方深度的超陡逆行通道区域。 深度约为栅极氧化物厚度的十至三十倍。 实施例可以提供比常规技术中可获得的阈值电压特性更理想的主体偏置电压。

    Balanced adaptive body bias control
    10.
    发明授权
    Balanced adaptive body bias control 有权
    平衡自适应体偏置控制

    公开(公告)号:US07949864B1

    公开(公告)日:2011-05-24

    申请号:US11238446

    申请日:2005-09-28

    IPC分类号: G06F1/32 G06F1/24

    摘要: Systems and methods of balanced adaptive body bias control. In accordance with a first embodiment of the present invention, a method of balanced adaptive body bias control comprises determining a desirable dynamic condition for circuitry of an integrated circuit. A first dynamic indicator corresponding to the desirable dynamic condition is accessed. Second and third dynamic indicators of the integrated circuit are accessed. A first body biasing voltage is adjusted by an increment so as to change the first dynamic indicator in the direction of the desirable dynamic condition. A second body biasing voltage is adjusted based on a relationship between the second dynamic indicator and the third dynamic indicator.

    摘要翻译: 平衡自适应体偏置控制的系统和方法。 根据本发明的第一实施例,平衡自适应体偏置控制的方法包括确定用于集成电路的电路的期望的动态条件。 访问对应于期望的动态条件的第一动态指示符。 访问集成电路的第二和第三动态指示器。 通过增量来调整第一体偏置电压,以便在期望的动态条件的方向上改变第一动态指示器。 基于第二动态指示器和第三动态指示器之间的关系来调整第二身体偏置电压。