ELECTROMIGRATION-COMPLAINT HIGH PERFORMANCE FET LAYOUT
    1.
    发明申请
    ELECTROMIGRATION-COMPLAINT HIGH PERFORMANCE FET LAYOUT 有权
    电化学高性能FET布局

    公开(公告)号:US20120112819A1

    公开(公告)日:2012-05-10

    申请号:US13347851

    申请日:2012-01-11

    IPC分类号: G11C5/14 H01L27/088

    摘要: An electrical contact structure distributes current along a length thereof. The electrical contact structure includes a plurality of n metal rectangles on n levels of metal. The rectangle on one metal level is at least as wide in width and vertically covers in width the rectangle on the metal level immediately below. The rectangle on one metal level is shorter in length than and substantially aligned at a first end with the rectangle on the metal level immediately below. Rectangle first ends are substantially aligned. Features of an exemplary FET transistor of this invention are a source and drain terminal electrical contact structure, a multi-level metal ring connecting gate rectangles on both ends, and a wider-than-minimum gate-to-gate spacing. The invention is useful, for example, in an electromigration-compliant, high performance transistor.

    摘要翻译: 电接触结构沿其长度分布电流。 电接触结构包括在n级金属上的多个n个金属矩形。 一个金属层上的矩形至少具有宽度的宽度,并且垂直地在宽度上覆盖紧接在下面的金属层上的矩形。 一个金属层上的矩形长度短于第一端,并且在紧靠下方的金属层上的矩形基本对齐。 矩形的第一端基本对齐。 本发明的示例性FET晶体管的特征是源极和漏极端子电接触结构,在两端连接栅极矩形的多级金属环和大于最小栅极至栅极间隔。 本发明例如在电迁移兼容的高性能晶体管中是有用的。

    Electrical contact structure having multiple metal interconnect levels staggering one another
    2.
    发明授权
    Electrical contact structure having multiple metal interconnect levels staggering one another 有权
    具有多个金属互连级别彼此交错的电接触结构

    公开(公告)号:US08178908B2

    公开(公告)日:2012-05-15

    申请号:US12116470

    申请日:2008-05-07

    IPC分类号: H01L29/41

    摘要: An electrical contact structure distributes current along a length thereof. The electrical contact structure includes a plurality of n metal rectangles on n levels of metal. The rectangle on one metal level is at least as wide in width and vertically covers in width the rectangle on the metal level immediately below. The rectangle on one metal level is shorter in length than and substantially aligned at a first end with the rectangle on the metal level immediately below. Rectangle first ends are substantially aligned. Features of an exemplary FET transistor of this invention are a source and drain terminal electrical contact structure, a multi-level metal ring connecting gate rectangles on both ends, and a wider-than-minimum gate-to-gate spacing. The invention is useful, for example, in an electromigration-compliant, high performance transistor.

    摘要翻译: 电接触结构沿其长度分布电流。 电接触结构包括在n级金属上的多个n个金属矩形。 一个金属层上的矩形至少具有宽度的宽度,并且垂直地在宽度上覆盖紧接在下面的金属层上的矩形。 一个金属层上的矩形长度短于第一端,并且在紧靠下方的金属层上的矩形基本对齐。 矩形的第一端基本对齐。 本发明的示例性FET晶体管的特征是源极和漏极端子电接触结构,在两端连接栅极矩形的多级金属环和大于最小栅极至栅极间隔。 本发明例如在电迁移兼容的高性能晶体管中是有用的。

    Electromigration-Complaint High Performance FET Layout
    3.
    发明申请
    Electromigration-Complaint High Performance FET Layout 有权
    电迁移投诉高性能FET布局

    公开(公告)号:US20090278207A1

    公开(公告)日:2009-11-12

    申请号:US12116470

    申请日:2008-05-07

    IPC分类号: H01L29/78 H01B5/00

    摘要: An electrical contact structure distributes current along a length thereof. The electrical contact structure includes a plurality of n metal rectangles on n levels of metal. The rectangle on one metal level is at least as wide in width and vertically covers in width the rectangle on the metal level immediately below. The rectangle on one metal level is shorter in length than and substantially aligned at a first end with the rectangle on the metal level immediately below. Rectangle first ends are substantially aligned. Features of an exemplary FET transistor of this invention are a source and drain terminal electrical contact structure, a multi-level metal ring connecting gate rectangles on both ends, and a wider-than-minimum gate-to-gate spacing. The invention is useful, for example, in an electromigration-compliant, high performance transistor.

    摘要翻译: 电接触结构沿其长度分布电流。 电接触结构包括在n级金属上的多个n个金属矩形。 一个金属层上的矩形至少具有宽度的宽度,并且垂直地在宽度上覆盖紧接在下面的金属层上的矩形。 一个金属层上的矩形长度短于第一端,并且在紧靠下方的金属层上的矩形基本对齐。 矩形的第一端基本对齐。 本发明的示例性FET晶体管的特征是源极和漏极端子电接触结构,在两端连接栅极矩形的多级金属环和大于最小栅极至栅极间隔。 本发明例如在电迁移兼容的高性能晶体管中是有用的。

    Self-aligned graphene transistor
    5.
    发明授权
    Self-aligned graphene transistor 有权
    自对准石墨烯晶体管

    公开(公告)号:US08106383B2

    公开(公告)日:2012-01-31

    申请号:US12617770

    申请日:2009-11-13

    IPC分类号: H01L29/16 H01L21/04 H01L51/30

    CPC分类号: H01L29/78684

    摘要: A graphene field effect transistor includes a gate stack, the gate stack including a seed layer, a gate oxide formed over the seed layer, and a gate metal formed over the gate oxide; an insulating layer; and a graphene sheet displaced between the seed layer and the insulating layer.

    摘要翻译: 石墨烯场效应晶体管包括栅极堆叠,栅极堆叠包括种子层,形成在种子层上的栅极氧化物和形成在栅极氧化物上的栅极金属; 绝缘层; 以及在种子层和绝缘层之间移动的石墨烯片。

    Millimeter-wave communications using a reflector
    6.
    发明授权
    Millimeter-wave communications using a reflector 有权
    使用反射镜的毫米波通信

    公开(公告)号:US08797211B2

    公开(公告)日:2014-08-05

    申请号:US13024881

    申请日:2011-02-10

    IPC分类号: H04B7/145

    摘要: Methods and systems for establishing a non-line of sight millimeter wave connection that include a transmitter unit having beam-steering capability, a receiver unit having beam-steering capability, and a reflecting unit in a position having a line-of-sight path to the transmitter unit and the receiver unit. The reflecting unit includes an attachment mechanism configured to attach to a mounting point on an object or surface, a reflecting surface that is reflective to millimeter-wave radiation, and an adjustable pivot connected between the attachment mechanism and the reflecting surface configured to permit directional positioning of the reflecting surface relative to the attachment mechanism.

    摘要翻译: 用于建立非线视距毫米波连接的方法和系统,其包括具有光束转向能力的发射器单元,具有光束转向能力的接收器单元和在具有视线路径的位置的位置的反射单元 发射机单元和接收机单元。 反射单元包括被配置为附接到物体或表面上的安装点,反射到毫米波辐射的反射表面的连接机构,以及连接在附接机构和反射表面之间的可调节枢轴,其被配置为允许定向定位 的反射表面相对于附接机构。

    SELF-ALIGNED GRAPHENE TRANSISTOR
    8.
    发明申请
    SELF-ALIGNED GRAPHENE TRANSISTOR 有权
    自对准的石墨晶体管

    公开(公告)号:US20110114919A1

    公开(公告)日:2011-05-19

    申请号:US12617770

    申请日:2009-11-13

    IPC分类号: H01L29/16 H01L21/04

    CPC分类号: H01L29/78684

    摘要: A graphene field effect transistor includes a gate stack, the gate stack including a seed layer, a gate oxide formed over the seed layer, and a gate metal formed over the gate oxide; an insulating layer; and a graphene sheet displaced between the seed layer and the insulating layer.

    摘要翻译: 石墨烯场效应晶体管包括栅极堆叠,栅极堆叠包括种子层,形成在种子层上的栅极氧化物和形成在栅极氧化物上的栅极金属; 绝缘层; 以及在种子层和绝缘层之间移动的石墨烯片。

    MILLIMETER-WAVE COMMUNICATIONS USING A REFLECTOR
    10.
    发明申请
    MILLIMETER-WAVE COMMUNICATIONS USING A REFLECTOR 有权
    使用反射器的毫米波通信

    公开(公告)号:US20120206299A1

    公开(公告)日:2012-08-16

    申请号:US13024881

    申请日:2011-02-10

    IPC分类号: H01Q15/00 H04B7/14 H01Q15/20

    摘要: Methods and systems for establishing a non-line of sight millimeter wave connection that include a transmitter unit having beam-steering capability, a receiver unit having beam-steering capability, and a reflecting unit in a position having a line-of-sight path to the transmitter unit and the receiver unit. The reflecting unit includes an attachment mechanism configured to attach to a mounting point on an object or surface, a reflecting surface that is reflective to millimeter-wave radiation, and an adjustable pivot connected between the attachment mechanism and the reflecting surface configured to permit directional positioning of the reflecting surface relative to the attachment mechanism.

    摘要翻译: 用于建立非线视距毫米波连接的方法和系统,其包括具有光束转向能力的发射器单元,具有光束转向能力的接收器单元和在具有视线路径的位置的位置的反射单元 发射机单元和接收机单元。 反射单元包括被配置为附接到物体或表面上的安装点,反射于毫米波辐射的反射表面的连接机构,以及连接在附接机构和反射表面之间的可调节枢轴,其被配置成允许定向定位 的反射表面相对于附接机构。