HEAT-RESISTANT ADHESIVE SHEET FOR SEMICONDUCTOR TESTING
    3.
    发明申请
    HEAT-RESISTANT ADHESIVE SHEET FOR SEMICONDUCTOR TESTING 有权
    用于半导体测试的耐热粘合片

    公开(公告)号:US20160130481A1

    公开(公告)日:2016-05-12

    申请号:US14895546

    申请日:2014-06-10

    Abstract: A heat-resistant adhesive sheet for semiconductor testing, used in a performance test while semiconductor chips are heated includes: a base material; and an adhesive layer provided on the base material, the base material having a thermal shrinkage of lower than 1% when being heated at 150 degrees Celsius for 30 minutes and a linear expansion coefficient of equal to or lower than 5.0×10−5 at 60 to 150 degrees Celsius, and the adhesive layer containing a (meth)acrylic acid ester copolymer, a photopolymerizable compound, a polyfunctional isocyanate curing agent, and photoinitiator. The adhesive layer contains 5 to 200 parts by mass of the photopolymerizable compound, 0.5 to 20 parts by mass of the polyfunctional isocyanate curing agent, and 0.1 to 20 parts by mass of the photoinitiator, with respect to 100 parts by mass of the(meth)acrylic acid ester copolymer. The adhesive layer is free of tackifying resin.

    Abstract translation: 用于半导体芯片加热时的性能测试中的用于半导体测试的耐热粘合片包括:基材; 以及设置在基材上的粘合剂层,当在150℃下加热30分钟时,该基材的热收缩率低于1%,线膨胀系数等于或低于5.0×10-5的线膨胀系数在60 和含有(甲基)丙烯酸酯共聚物的粘合剂层,光聚合性化合物,多官能异氰酸酯固化剂和光引发剂。 粘合剂层含有5〜200质量份的光聚合性化合物,0.5〜20质量份的多官能异氰酸酯固化剂和0.1〜20质量份的光引发剂,相对于100质量份的(甲基 )丙烯酸酯共聚物。 粘合剂层不含增粘树脂。

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