公开(公告)号：US20080078750A1

公开(公告)日：2008-04-03

申请号：US11661201

申请日：2005-08-24

申请人： Dimitri Boguslavsky ,  Valentin Cherepin ,  Colin Smith

发明人： Dimitri Boguslavsky ,  Valentin Cherepin ,  Colin Smith

IPC分类号： B23K9/00 ,  G21K1/087

CPC分类号： H01J37/3056 ,  H01J37/147 ,  H01J37/305 ,  H01J2237/1501 ,  H01J2237/3114 ,  H01J2237/31749

摘要： Method, device, and system, for directed multi-deflected ion beam milling of a work piece, and, determining and controlling extent thereof. Providing an ion beam; and directing and at least twice deflecting the provided ion beam, for forming a directed multi-deflected ion beam, wherein the directed multi-deflected ion beam is directed towards, incident and impinges upon, and mills, a surface of the work piece. Device includes an ion beam source assembly; and an ion beam directing and multi-deflecting assembly, for directing and at least twice deflecting the provided ion beam, for forming a directed multi-deflected ion beam, wherein the directed multi-deflected ion beam is directed towards, incident and impinges upon, and mills, a surface of the work piece.

摘要翻译： 方法，装置和系统，用于工件的定向多偏转离子束铣削，以及确定和控制其程度。 提供离子束; 并且引导和至少两次偏转所提供的离子束，用于形成定向的多偏转离子束，其中定向多偏转离子束被引导朝向，入射并冲击在工件的表面上并磨削。 装置包括离子束源组件; 以及用于引导和至少两次偏转所提供的离子束的离子束引导和多偏转组件，用于形成定向的多偏转离子束，其中定向多偏转离子束被引导，入射和撞击， 和磨机，工件的表面。

公开(公告)号：US20080308727A1

公开(公告)日：2008-12-18

申请号：US11883478

申请日：2006-02-05

申请人： Dimitri Boguslavsky ,  Colin Smith ,  Dan Viazovsky ,  Danny Farhana ,  Dimitry Zacharin ,  Grigori Aronov

发明人： Dimitri Boguslavsky ,  Colin Smith ,  Dan Viazovsky ,  Danny Farhana ,  Dimitry Zacharin ,  Grigori Aronov

IPC分类号： G01N1/28 ,  B32B38/00 ,  B32B38/10 ,  B32B37/06 ,  H01L21/00 ,  G01N1/34 ,  G01N1/04 ,  B28D5/00

CPC分类号： H01L21/67092 ,  G01N1/286 ,  G01N1/32 ,  Y10T83/929

摘要： System and method for preparing a sample for micro-analysis, comprising: (a) sample precursor holding unit, for supporting and holding a sample precursor; (b) transporting and positioning unit, for transporting and positioning the sample precursor holding unit; (c) optical imaging unit, for optically imaging, recognizing, and identifying, target features on the sample precursor, and for monitoring the sample preparation; (d) picking and placing unit, for picking and placing the sample precursor and system components from initial positions to other functionally dependent positions; (e) micro-groove generating unit, for generating at least one micro-groove in a surface of the sample precursor, wherein the micro-groove generating unit includes components for controlling formation of each micro-groove in the surface; and (f) cryogenic sectioning unit, for cryogenically sectioning the sample precursor to a pre-determined configuration and size, for forming the prepared sample. Optionally, includes a micro-mask adhering unit, and a macro-mask adhering method.

摘要翻译： 制备用于微量分析的样品的系统和方法，包括：（a）用于支撑和保持样品前体的样品前体保持单元; （b）运送和定位单元，用于运送和定位样品前体保持单元; （c）光学成像单元，用于光学成像，识别和识别样品前体上的目标特征，并用于监测样品制备; （d）采摘和放置单元，用于挑选并将样品前体和系统组分从初始位置放置到其他功能依赖位置; （e）用于在样品前体的表面中产生至少一个微槽的微槽产生单元，其中所述微槽产生单元包括用于控制所述表面中的每个微槽的形成的部件; 和（f）低温切片装置，用于将样品前体低温切割成预定的构型和尺寸，以形成所制备的样品。 可选地，包括微掩模附着单元和宏观掩模粘合方法。