公开(公告)号：US4149085A

公开(公告)日：1979-04-10

申请号：US869972

申请日：1978-01-16

申请人： Donald E. Davis ,  Edward V. Weber ,  Maurice C. Williams ,  Ollie C. Woodard

发明人： Donald E. Davis ,  Edward V. Weber ,  Maurice C. Williams ,  Ollie C. Woodard

IPC分类号： G01B15/00 ,  H01J37/304 ,  H01L21/027 ,  H01L21/302 ,  H01J37/00

CPC分类号： H01J37/3045

摘要： A method and apparatus is described for performing automatic overlay measurements on wafers utilized in semiconductor manufacturing. The overlay measurements are made at selected sites on a given wafer where a single bar pattern has been overlaid over a double bar pattern. The position of the single bar center line with respect to the center line between the double bars is a direct indication of the overlay error of the two patterns. The overlay error is measured in both the X and Y dimensions and is utilized to monitor the overlay error or to produce statistics and correlations to system parameters so that the sources of overlay errors may be identified and the errors eliminated or minimized on subsequent wafers being processed.

摘要翻译： 描述了一种在半导体制造中使用的晶片上进行自动重叠测量的方法和装置。 覆盖测量在给定晶片上的选定位置处进行，其中单个条形图案已经覆盖在双重条形图案上。 单条中心线相对于双杆之间的中心线的位置是两种图案的重叠误差的直接指示。 覆盖误差在X和Y维度上都被测量，并用于监测覆盖误差或产生与系统参数的统计学和相关性，从而可以识别覆盖误差的来源，并且在随后的晶片处理中消除或最小化误差 。

公开(公告)号：US4000440A

公开(公告)日：1976-12-28

申请号：US492096

申请日：1974-07-26

申请人： Alan V. Hall ,  Merlyn H. Perkins ,  Hans C. Pfeiffer ,  Edward V. Weber ,  Ollie C. Woodard

发明人： Alan V. Hall ,  Merlyn H. Perkins ,  Hans C. Pfeiffer ,  Edward V. Weber ,  Ollie C. Woodard

IPC分类号： H01J37/305 ,  H01J37/147 ,  H01J37/304 ,  H01L21/027 ,  H01J29/52 ,  H01J29/54

CPC分类号： H01J37/304 ,  H01J37/1471

摘要： A beam of charged particles has its alignment and brightness alternately controlled in accordance with the current of the beam. The measurements of the current and any corrections for alignment or brightness are made when the beam is not applied to a target.

摘要翻译： 带电粒子束的对准和亮度根据光束的电流交替地控制。 当光束未施加到目标时，进行电流的测量和对准或亮度的任何校正。

公开(公告)号：US4494004A

公开(公告)日：1985-01-15

申请号：US510385

申请日：1983-07-01

申请人： John L. Mauer, IV ,  Michel S. Michail ,  Ollie C. Woodard

发明人： John L. Mauer, IV ,  Michel S. Michail ,  Ollie C. Woodard

IPC分类号： H01J37/147 ,  H01J37/317 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/1474 ,  H01J37/3174 ,  H01J2237/30488 ,  H01J2237/30494 ,  H01J2237/31764

摘要： An electron beam method and apparatus, for writing patterns, such as on semiconductor wafers, in which the writing field is divided into a large number of overlapping subfields with a predetermined periodicity. Subfield to subfield moves are made in a stepped sequential scan, such as raster, while patterns, within a subfield, are addressed using vector scan and written using a sequential scan. Significant improvement in throughput results by the use of this electron beam method and apparatus which preferably employs magnetic deflection for the sequential scanning the subfields and electric deflection for vector scanning within the subfield.

摘要翻译： 一种电子束方法和装置，用于写入诸如半导体晶片的图案，其中写入场被划分成具有预定周期的大量重叠子场。 子场到子场移动是以阶梯式顺序扫描（例如光栅）进行的，而子场内的图案使用向量扫描寻址并使用顺序扫描进行写入。 通过使用该电子束方法和优选采用磁偏转进行顺序扫描子场的装置和在子场内的矢量扫描的电偏转的装置，可以显着提高吞吐量。

公开(公告)号：UST961002I4

公开(公告)日：1977-08-02

申请号：US730548

申请日：1976-10-07

申请人： Alan V. Hall ,  Ollie C. Woodard

发明人： Alan V. Hall ,  Ollie C. Woodard

IPC分类号： H01J37/24

CPC分类号： H01J37/243

摘要： circuit for controlling the electron discharge from a cathode, of an electron discharge device, which provides a control voltage signal, proportional to the cathode current, for comparison with a reference value to provide a correction bias to a grid interposed between the cathode and an anode.