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    TRANSEPIDERMAL DRUG DELIVERY SYSTEM CONTAINING TULOBUTEROL
    2.
    发明申请
    TRANSEPIDERMAL DRUG DELIVERY SYSTEM CONTAINING TULOBUTEROL 审中-公开
    包含TULOBUTEROL的转移药物递送系统

    公开(公告)号：US20110182971A1

    公开(公告)日：2011-07-28

    申请号：US12844538

    申请日：2010-07-27

    申请人： Dong Il Lee ,  Mun Seok Han ,  Tae Wan Lee ,  Jong Kyoo Lee ,  Han Ki Kim

    发明人： Dong Il Lee ,  Mun Seok Han ,  Tae Wan Lee ,  Jong Kyoo Lee ,  Han Ki Kim

    IPC分类号： A61F13/02 ,  A61K31/135

    CPC分类号： A61K9/7084 ,  A61K31/137 ,  A61K47/14

    摘要： Disclosed is a pharmaceutical composition containing tulobuterol. More specifically, disclosed is a transepidermal drug delivery system including a drug layer containing tulobuterol and a natural rubber-based adhesive material, and a supporter adhered to one surface of the drug layer to support the drug layer, wherein the natural rubber-based adhesive material comprises 10 to 40 parts by weight of a natural rubber, 54.5 to 85 parts by weight of a rosin ester resin and an acid value controller, and the drug layer has a thickness of 25 μm to 75 μm.

    摘要翻译： 公开了含有杜洛特罗的药物组合物。 更具体地，公开了一种经表皮药物递送系统，其包括含有杜洛特罗和天然橡胶基粘合剂材料的药物层，以及附着在药物层的一个表面以支撑药物层的支持物，其中天然橡胶基粘合剂材料 包含10〜40重量份的天然橡胶，54.5〜85重量份的松香酯树脂和酸值控制剂，所述药物层的厚度为25μm〜75μm。

    SUBSTRATE PROCESSING APPARATUS
    3.
    发明申请
    SUBSTRATE PROCESSING APPARATUS 审中-公开
    基板加工设备

    公开(公告)号：US20100059182A1

    公开(公告)日：2010-03-11

    申请号：US12550391

    申请日：2009-08-30

    申请人： Ho Chul LEE ,  Sun Hong Choi ,  Seung Ho Lee ,  Ji Hun Lee ,  Dong Kyu Lee ,  Tae Wan Lee

    发明人： Ho Chul LEE ,  Sun Hong Choi ,  Seung Ho Lee ,  Ji Hun Lee ,  Dong Kyu Lee ,  Tae Wan Lee

    IPC分类号： H01L21/465 ,  H05B6/10

    CPC分类号： C23C16/46 ,  H01L21/67109

    摘要： A substrate processing apparatus includes a chamber having a reaction space therein, a substrate seating member disposed in the reaction space of the chamber to seat a substrate thereon, an induction heating unit to heat the substrate seating member, and at least one altitude adjusting unit to selectively adjust the altitude of the induction heating unit at the outside of the chamber according to a temperature adjusting region of the substrate seating member. Therefore, it is possible to constantly control a temperature of the substrate seating member by adjusting the distance length between the substrate seating member and the induction heating unit at the outside of the chamber.

    摘要翻译： 一种基板处理装置，包括：反应空间的室，设置在所述室的反应空间中以将基板安置在其上的基板安置部件;加热所述基板座部件的感应加热单元;以及至少一个高度调节单元， 根据基板座部件的温度调节区域选择性地调节室外的感应加热单元的高度。 因此，可以通过调节在室外的基板座构件和感应加热单元之间的距离长度来恒定地控制基板座部件的温度。