公开(公告)号：US20160059271A1

公开(公告)日：2016-03-03

申请号：US14834019

申请日：2015-08-24

Applicant: EBARA CORPORATION

Inventor： Masahiko SEKIMOTO ,  Toshio YOKOYAMA ,  Kenichi KOBAYASHI ,  Kenichi AKAZAWA

IPC: B08B3/04

CPC classification number: B08B3/048 ,  H01L21/67057

Abstract: A rinsing bath which can simplify a discharging structure of a rinsing liquid is disclosed. The rinsing bath includes an inner bath for storing the rinsing liquid, an overflow bath configured to receive the rinsing liquid overflowing the inner bath, a stopper for closing a drain hole provided on a bottom of the inner bath, an actuator configured to move the stopper between a closing position in which the stopper closes the drain hole and a opening position in which the stopper is away from the drain hole, a rinsing liquid supply pipe configured to supply the rinsing liquid into the inner bath, and a drain pipe coupled to a bottom of the overflow bath. The drain hole communicates between an inside of the inner bath and an inside of the overflow bath.

Abstract translation: 公开了一种能够简化冲洗液体排放结构的冲洗槽。 冲洗槽包括用于储存冲洗液体的内部浴液，构造成接收溢出内部浴槽的冲洗液体的溢流槽，用于关闭设置在内部浴槽底部的排水孔的止动件，构造成使塞子移动的致动器 在所述止动器关闭所述排水孔的关闭位置和所述止动件从所述排水孔离开的打开位置之间，构造成将所述冲洗液体供应到所述内部浴室中的冲洗液体供给管，以及与所述排液管 底部的溢流浴。 排水孔在内槽的内部和溢流槽的内部连通。

公开(公告)号：US20170358472A1

公开(公告)日：2017-12-14

申请号：US15690025

申请日：2017-08-29

Applicant: EBARA CORPORATION

Inventor： Toshio YOKOYAMA ,  Masahiko SEKIMOTO ,  Kenichi KOBAYASHI ,  Kenichi AKAZAWA ,  Takashi MITSUYA ,  Keiichi KURASHINA

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67718 ,  H01L21/67086 ,  H01L21/67751 ,  H01L21/68707

Abstract: A substrate processing apparatus according to the present invention comprises a transferring device including a grasping section configured to grasp a substrate holder, and a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented, and processing the substrate. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.

公开(公告)号：US20150270151A1

公开(公告)日：2015-09-24

申请号：US14666196

申请日：2015-03-23

Applicant: EBARA CORPORATION

Inventor： Toshio YOKOYAMA ,  Masahiko SEKIMOTO ,  Kenichi KOBAYASHI ,  Kenichi AKAZAWA ,  Takashi MITSUYA ,  Keiichi KURASHINA

IPC: H01L21/677

CPC classification number: H01L21/67718 ,  H01L21/67086 ,  H01L21/67751 ,  H01L21/68707

Abstract: A substrate processing apparatus according to the present invention comprises a transferring device including a grasping section configured to grasp a substrate holder, and a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented, and processing the substrate. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.

Abstract translation: 根据本发明的基板处理装置包括转印装置，该转印装置包括构造成夹持基板保持器的把持部，以及转印部，其被配置为转印由该抓持部抓住的基板支架，以及用于存储由 衬底保持器，使得衬底的表面垂直取向，并处理衬底。 把持部被配置为将基板的表面水平取向地抓握基板保持件。 转印部分被配置为将衬底保持器转移到处理槽上方，其中衬底的表面水平定向。

公开(公告)号：US20190214278A1

公开(公告)日：2019-07-11

申请号：US16236024

申请日：2018-12-28

Applicant: EBARA CORPORATION

Inventor： Toshio YOKOYAMA ,  Masahiko SEKIMOTO ,  Kenichi KOBAYASHI

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/677

Abstract: A substrate attaching/detaching unit includes a stocker accommodating a plurality of substrate holders 80 and adapted so that the substrate holders 80 are aligned in a vertical direction with one another in a horizontal posture, a first substrate holder conveying mechanism that takes the substrate holders 80 into and out of the stocker, an elevating mechanism that raises and lowers the first substrate holder conveying mechanism in the vertical direction, a second substrate holder conveying mechanism that transfers the substrate holder to and from the first substrate holder conveying mechanism, and a substrate attaching/detaching mechanism that attaches and detaches the substrate to and from the substrate holder held in the second substrate holder conveying mechanism.

公开(公告)号：US20150357213A1

公开(公告)日：2015-12-10

申请号：US14734983

申请日：2015-06-09

Applicant: EBARA CORPORATION

Inventor： Toshio YOKOYAMA ,  Masahiko SEKIMOTO ,  Kenichi KOBAYASHI

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/02 ,  H01L21/687 ,  H01L21/311 ,  B25J11/00 ,  H01L21/68

CPC classification number: H01L21/67086 ,  H01L21/67718 ,  H01L21/67742 ,  H01L21/67751 ,  H01L21/68707 ,  H01L21/68721

Abstract: A substrate attaching/detaching unit includes a stocker accommodating a plurality of substrate holders 80 and adapted so that the substrate holders 80 are aligned in a vertical direction with one another in a horizontal posture, a first substrate holder conveying mechanism that takes the substrate holders 80 into and out of the stocker, an elevating mechanism that raises and lowers the first substrate holder conveying mechanism in the vertical direction, a second substrate holder conveying mechanism that transfers the substrate holder to and from the first substrate holder conveying mechanism, and a substrate attaching/detaching mechanism that attaches and detaches the substrate to and from the substrate holder held in the second substrate holder conveying mechanism.

Abstract translation: 基板安装/拆卸单元包括容纳多个基板保持件80的储料器，并且适于使基板保持件80在垂直方向上以水平姿势彼此对准;第一基板保持器输送机构，其将基板保持件80 进出储存器的方法，是使第一基板保持架输送机构沿垂直方向升高并降低的升降机构，将基板保持件向第一基板保持架输送机构转移的第二基板保持架输送机构， /分离机构，其将基板附接到保持在第二基板保持架输送机构中的基板保持件和从基板保持器分离。

公开(公告)号：US20150270147A1

公开(公告)日：2015-09-24

申请号：US14666215

申请日：2015-03-23

Applicant: EBARA CORPORATION

Inventor： Kenichi KOBAYASHI ,  Masahiko SEKIMOTO ,  Toshio YOKOYAMA ,  Kenichi AKAZAWA ,  Keiichi KURASHINA ,  Takashi MITSUYA

IPC: H01L21/67 ,  B25J11/00 ,  H01L21/687

CPC classification number: H01L21/67057 ,  B25J11/0095 ,  H01L21/67034 ,  H01L21/67173 ,  H01L21/67276 ,  H01L21/68721 ,  H01L21/68742

Abstract: A substrate processing apparatus capable of inhibiting diffusion of a chemical solution atmosphere around a processing bath. The substrate processing apparatus has a processing bath for storing a substrate holder holding a substrate and for processing the substrate, a lifter configured to support the substrate holder, store the substrate holder in the processing bath, and take out the substrate holder from the processing bath, and a cover configured to cover the periphery of the substrate holder taken out from the processing bath by the lifter.

Abstract translation: 能够抑制处理槽周围的化学溶液气氛扩散的基板处理装置。 基板处理装置具有用于存储保持基板并用于处理基板的基板保持件的处理槽，构造成支撑基板保持器的升降器，将基板保持器存储在处理槽中，并从处理槽取出基板保持件 以及盖，其构造成覆盖由所述升降机从所述处理槽取出的所述基板保持器的周边。