公开(公告)号：US20190318917A1

公开(公告)日：2019-10-17

申请号：US16457138

申请日：2019-06-28

Applicant: ELEMENT SIX TECHNOLOGIES LIMITED

Inventor： JOHN ROBERT BRANDON ,  ALEXANDER LAMB CULLEN ,  STEPHEN DAVID WILLIAMS ,  JOSEPH MICHAEL DODSON ,  JONATHAN JAMES WILMAN ,  CHRISTOPHER JOHN HOWARD WORT ,  HELEN WILMAN

IPC: H01J37/32 ,  C23C16/27 ,  C23C16/511

Abstract: A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition includes a microwave generator configured to generate microwaves at a frequency f, a plasma chamber that defines a resonance cavity for supporting a microwave resonance mode, a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber, a gas flow system for feeding process gases into the plasma chamber and removing them therefrom, and a substrate holder disposed in the plasma chamber and having a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use. The resonance cavity is configured to have a height that supports a TM011 resonant mode at the frequency f and is further configured to have a diameter that satisfies the condition that a ratio of the resonance cavity height/the resonance cavity diameter is in the range 0.3 to 1.0.